33 results about "Aggradation" patented technology

The invention discloses a fattening method for the cattle making snowflake beef. The nine month old stock calves of 270 plus or minus 30 kg weight are selected for fattening and breeding according to the following fattening and weighting procedure 1 or the fattening and weighting procedure 2, and the fattening degree value is calculated according to the following formula: the fattening degree value is equal to the (weight/stature) multiply 100. When the fattening degree value is more than or equal to the fattening degree critical value of the cattle variety in a fattening degree critical value table, then the cattle can be put into market, and then the cattle which can make snowflake beef is obtained. By giving the nutrition requirement value and the forage feeding value in each fattening stage, the invention integrates the deeper and difficult growth physiological rule of the bones, the muscles, and the adipose of the cattle, and the technologies of nutrition metabolizing and controlling organically, and simplifies into a forage prescription and the control of the forage taking value. The invention can naturally conduct regulating, and can ensure bones, muscles, and adipose to get maximum development and aggradation during the peak period of the growth. The forage prescription can be changed freely by the executor of the invention according to the classification of the forage material and the price change, and the cost of the forage is controllable.

A manufacturing method of measuring key size of scanning electronic microscope (CDSEM) calibration sample includes pre-cleanout of silicon underlay, forming underlay oxidizing layer, accumulating multi crystal silicon layer, forming photosensitive resist pattern, forming gate structure, forming a conducting layer. Gate structure sample gained restrains the aggradation of hydrocarbon induced by cumulation of surface charge for the abreaction effect of conducting layer, so the phenomenon of overloading of CD grown is eliminated to make service life of the calibration sample prolong apparently and guarantee the reliability of test of CDSEM.

The invention belongs to the field of elevation measurement methods and particularly relates to a coastal wetland surface elevation dynamic change and aggradation speed measurement method which is used for measuring a surface aggradation region or erosion region and includes the steps of: (1) fixing a surface elevation measuring instrument at a measurement point; (2) arranging a level mark layer on the measurement point; (3) arranging a vertical dyed sand rod at the measurement point, wherein the top of the sand rod is coincided with a depositional surface; and (4) after a certain time t, reading the surface elevation measuring instrument to acquire surface elevation change S. Compared with the prior art, the method is suitable for surface elevation measurement in a coastal wetland complex region and is not liable to lose in measurement capability just because erosion. The method can achieve the surface elevation measurement no matter how the surface elevation is changed in height, so that the method has a wider application range and more accurate data results. Preparation of the dyed sand rod is simple, economical and convenient.

A preparing method of compressibility nitride layer includes preceding a chemical gas phase aggradation to form a nitride layer on a base, it characterized in that definite gas is inlet into during the chemical gas phase aggradation, the definite gas is argon, nitrogen, krypton and xenon or their comnination. For adding said definite gas, the compress stress can be decreased, and the PMOS drive current plus is increased.

The present invention discloses an improved method with a ruthenium enveloped with super-micro and high-pure Si3N4 powder; because of the much less grain diameter of the super-micro and high-pure Si3N4 powder, the powder is easy to be reunited after being collected. The present invention is characterized in that: the method uses the super-micro powder to compose in the high-distributed situation in the lasting stage to make the chemical treatment on the surface directly; a ruthenium amorphism phase much inerter to oxidation is enveloped on the surface of the high-distributed one-off Si3N4 grain; the improved method on the surface of super-micro powder is with the especial advantage, which can not only improve the distribution character for the super-micro powder and avoid the hard solid reuniting, but also can change the physical and chemical performance for the powder surface. The material satisfies the requirement of the grain size for silicon nitride. The method can add the component separately and evenly in the farthest degree without needing other expensive device and establishment; the method has the advantages of simple technical and low cost; the method can enchance the density of the elementary blank and the baking activity; compared with the physical phase aggradation method, chemical phase aggradation, vacuum spraying and ion plating and so on, the method is with much lower cost.

The invention discloses a self-adaptive adjustment pollutant-discharge port device for entering the water body, comprising a float pool, a fixed pier, an anchoring bar, a floating drum, a flexible soft connection pipe, a connector, a sewage inlet pipe, and a sewage outlet pipe; the float pool is arranged beside a bank, the middle and the lower parts of one side of a pool wall that is near a riverbed is provided with a through groove, and the width of the groove is matched with the pipe diameter of the sewage outlet pipe; the number of the fixed piers is two, the piers are respectively arranged on the bottom of the pool; the anchoring bar is fixedly connected on the fixed pier and extends vertically onto the top of the float pool; the floating drum is actively connected on the anchoring bar via the casing rings at the two sides; the flexible soft connection pipe is connected between the sewage inlet pipe and the sewage outlet pipe; the sewage inlet pipe is connected with a pollutant-discharge pipe or is connected with an open channel via an aggradation pool; the sewage outlet pipe is connected with the floating drum via the connector, and the water outlet end is arranged in the flowing water body. The sewage outlet pipe of the invention can move upward and downward with the change of water level, thus making the discharged sewage be at the optimal waterpower intersection position, diffuse and transport rapidly, and avoiding the problem of re-pollution.

The invention discloses a flat active drive TFT matrix configuration that comprises: base board, grating line, and gate electrode and gate insulation layer, it characterized in that: said grating line and gate electrode are covered onto the base board by the gate insulation layer, the upper surface of the gate insulation layer is flat, semiconductor layer, source electrode and drain electrode and pixel electrode are all formed on the gate insulation layer. The invention also discloses method of producing the flat active drive TFT matrix configuration. The flat insulation surface formed in the invention is propitious to aggradation of later active layer, source and drain metal layer, passivation layer and pixel electrode layer, and reduces the generation of metal fault line. At the same time, flat gate electrode insulation surface can reduce the form of inner stress of the gate insulation layer, and increase the ratio of the finished product.

The invention relates to a plasma-strengthening chemical gas phase aggradation method and is used in depositting film on the surface of the semiconductor wafer. It includes: stabilization, inputting the premonitory gas into the reaction kettle; aggradation, inputting the radio frequency energy, premonitory gas and reacton gas into the reaction kettle; passivation, stopping inputting the reaction gas but still inputting the readio frequency energy; and air bleeding, turning off the radio frequency energy, stopping inputting the premonitory gas and pumping the remaining gas out of the reaction kettle. During the passivation, the radio frequency energy is same with or less than that in the aggradation and we still input the premonitory gas for 3 to 15 minutes. Because the invention adds the passivation to it makes the Si which does not react with other on the surface of the wafer continue reacting till the end, it can eliminate the incomplete surface reaction and hanging keys, thus avoids the protuberant block in the film, eliminates the disadvantage and increases the yield.

This invention provides a kind of method that using the physics gas phase aggradation process semiconductor crystal round, including laying underlayment in the pedestal of the reaction room. The surface of the underlayment draws near the target material that in the reaction room. Target material includes the first face and second face which are set to the surface of the underlayment. The method includes operating the magnet component which is fixed around the revolution component, the revolution component is coupled with the reaction room and coupled with the driving motor and the driving motor is coupled to the drive. The magnet component is put in the place with destine dimension from the centre area of the revolution component. The method includes the magnet component which moves around the centre area by making use of the revolution component. The magnet component rotates with the speed v and affects the space covered in the second surface of the target. The method includes gaining information which relates to the magnet component, the electromagnetic field is relevant to the moving magnet component. The method includes handling information to ascertain if the electromagnetic field is in the preconcert parameter. It transmits the signal to drive to adjust magnet component speed and then to change the electromagnetic field.