31results about How to "Full and efficient combustion" patented technology

The application relates to the technical field of waste gas purification, and relates to a semiconductor production waste gas treatment process, which comprises the following steps: pretreatment, introducing an object into a preposition mechanism to participate in preposition dust removal treatment; air mixing treatment, introducing the object output by the preposition mechanism into an air mixing mechanism to participate in slow flow speed reduction treatment; purification treatment, introducing the object output by the air mixing mechanism into a purification mechanism to participate in plasma combustion purification treatment; cooling treatment, introducing the object output by the purification treatment into a cooling mechanism to participate in cooling treatment; and discharge treatment, discharging the object output by the cooling mechanism through an external discharge mechanism. The application is favorable for solving the problems that some existing plasma purification equipment has difficulty in removing impurities and the purification effect is affected by the change of air flow when treating waste gas.