31results about How to "Guaranteed annealing effect" patented technology

The invention discloses a conveying walking device for the annealing processing of semiconductor electronic devices and belongs to the technical field of electronic product processing. The conveying walking device for the annealing processing of the semiconductor electronic device comprises a furnace body shell; supporting plates are fixed to the inner walls of the front side and the rear side ofthe furnace body shell; toothed plates are slidably connected to the supporting plates; a plurality of teeth are integrally formed on the lower surfaces of the toothed plates; a plurality of semicircular grooves are formed in semiconductor tube placement grooves; a rotating shaft is inserted into the inner walls of the front side and the rear side of the furnace body shell; an outer gear is rotationally connected to the outer wall of the rotating shaft and is located below the teeth; the outer gear is meshed with the teeth; an inner edge ratchet wheel is coaxially fixed to the front side wallof the outer gear; the one-way intermittent conveying of to-be-machined semiconductor tubes can be achieved; manual operation is not needed for conveying the semiconductor tubes; due to the fact thatintermittent conveying can be achieved, the annealing treatment effect of the semiconductor tubes is guaranteed; and in addition, the stability of the whole device is high, and a deflection phenomenonis avoided.

The invention discloses laser pulse annealing equipment and an annealing method applied to the laser pulse annealing equipment. A disk in which multiple wafers can be simultaneously placed is arranged in a reaction cavity of the laser pulse annealing equipment and is made to rotate and linearly move in the annealing treatment process, so that the wafers in wafer placement grooves in the disk sequentially and circularly pass through laser radiation points to be uniformly radiated by laser under driving of continuous rotation and linear reciprocating motion of the disk, and bulk annealing treatment on the wafers is achieved. According to the laser pulse annealing equipment and the annealing method, compared with traditional laser pulse annealing equipment which can only carry out annealing treatment on a single wafer, the laser pulse annealing equipment has the same annealing effect, annealing efficiency is remarkably improved, and the equipment and the method can well meet the process demands for annealing quality and efficiency in the high-end advanced process.

The present invention discloses a laser annealing device and method. The device comprises a laser radiation system, a wafer carrying system and a reflection light detection system which are arranged in order along an optical path, and a host connected with the laser radiation system, the wafer carrying system and the reflection light detection system. The laser radiation system comprises a laser light source, a light beam regulation module, a light intensity distribution formation module, a beam splitting module and a focusing module which are arranged in order along the optical path; and optical elements on the light intensity distribution formation module are selected to form incident light intensity distribution required by a silicon wafer to allow a temperature field on the silicon wafer to achieve an effect of consistent temperature of a middle portion and an edge of the temperature field so as to ensure uniformity of an annealing temperature and improve uniformity of an annealingeffect. Since patterns at the same position are the same for the same batch of silicon wafers, optical elements used in an annealing process can be selected offline in advance, and the selected optical elements are written into an exposure flow according to a sequence; and monitoring is only performed in the exposure process, and the exposure process does not need regulation so as to improve efficiency and improve a productivity while ensuring an annealing performance.

The invention discloses a preparation method of a FeSe-based superconducting wire. The method comprises the following steps: 1, assembling an iron tube, an iron rod and an iron plug to obtain a tubingcomplex; 2, sealing the two ends of the tubing complex, and then obtaining a single-core FeSe-based wire through rotary swaging and drawing in sequence; 3, sintering the single-core FeSe-based wire to obtain a FeSe-based wire; and 4, annealing the FeSe-based wire to obtain a FeSe-based superconducting wire. According to the invention, the single-core FeSe-based wire is formed through powder charging by adopting a vibration tubing method and cold processing, and the iron rod diffuses into the molten Se powder in the subsequent sintering process to generate a compact FeSe layer and form a central hole, so that the intergranular connectivity is improved; and the oxidizing atmosphere is introduced through the central hole to be in full contact with the FeSe-based superconducting phase for annealing, so that the precipitation of interstitial iron is promoted, the superconductivity of the FeSe-based superconducting wire is improved, and the current-carrying performance of the FeSe-based superconducting wire is further improved.

The invention discloses a lateral composite position guide device for a three-layer composite material. The lateral composite position guide device comprises a composite body, wherein a cavity is formed in the composite body; a wire guide nozzle is arranged on one side of the composite body, and a plurality of wire feeding rails are arranged on the other side of the composite body; a cavity penetrates through a wire guide channel of the wire guide nozzle and wire feeding channels of the wire feeding rails; a plurality of guide arrangement assemblies are arranged in the wire guide channel of the wire guide nozzle; and a composite rolling part is arranged on one side of the wire discharging end of the wire guide nozzle. The lateral composite position guide device is reasonable in design and compact in structure, can quickly enable three strips to be laterally and closely attached together, and can provide a basis for subsequent machining.

The invention discloses laser pulse annealing equipment and an annealing method applied to the laser pulse annealing equipment. A disk in which multiple wafers can be simultaneously placed is arranged in a reaction cavity of the laser pulse annealing equipment and is made to rotate and linearly move in the annealing treatment process, so that the wafers in wafer placement grooves in the disk sequentially and circularly pass through laser radiation points to be uniformly radiated by laser under driving of continuous rotation and linear reciprocating motion of the disk, and bulk annealing treatment on the wafers is achieved. According to the laser pulse annealing equipment and the annealing method, compared with traditional laser pulse annealing equipment which can only carry out annealing treatment on a single wafer, the laser pulse annealing equipment has the same annealing effect, annealing efficiency is remarkably improved, and the equipment and the method can well meet the process demands for annealing quality and efficiency in the high-end advanced process.

The invention discloses an isothermal spheroidizing annealing furnace for bearing steels, which can be used for treating the bearing steels in a mode of double layers and double directions. Length ratio of a waste heat recovery heat-exchanging chamber to an isothermal chamber to an intercooling chamber to a heating preservation chamber in a hearth is 1:(2-5):(0.2-0.5):(2-5) along with the front and rear directions, thus annealing treatment effect of the bearing steels in double layers and double directions can be ensured. In the waste heat recovery heat-exchanging chamber, if one layer of driving roller group in the upper and lower layers of driving roller groups is used for conveying high-temperature bearing steels to be sent out of a furnace mouth, and the other layer of driving roller group is used for conveying room-temperature bearing steels (called cold metals) which are input into a furnace mouth, the high-temperature bearing steels and the room-temperature bearing steels can exchange the heat mutually, thus the room-temperature bearing steels are heated so as to recover heat (to be wasted) of the high-temperature bearing steels, reduce subsequent heat which enters into the isothermal chamber, and reach energy-saving effect. In the intercooling chamber, a cooler can be used for cooling the high-temperature bearing steels which are sent out of the heating preservation chamber, while the high-temperature bearing steels and the room-temperature bearing steels on the upper and lower layers of driving roller groups exchange heat mutually, thus recovering the heat of the high-temperature bearing steels, heating the low-temperature bearing steels, reducing the subsequent heat which enters into the heating preservation chamber and is required by the low-temperature bearing steels, further saving energy, and lowering the waste of the heat.

The disclosure relates to a glass substrate cutting machine, comprising a heating device (1) and a driving device (2), the heating device (1) is used for heating the cutting area of ​​the glass substrate (5), and the driving device (2) is used for The heating device (1) is driven to move towards the cutting area or away from the cutting area. Through the above technical solution, the driving device (2) drives the heating device (1) to approach or stay away from the glass substrate (5) to heat the cutting area, so that the overall temperature of the cutting area can be kept uniform, and dust can be prevented from being caused by the cutting area during cutting. The temperature is uneven and aggregated to prevent dust from adhering to the surface of the glass substrate (5), thereby improving the quality of the glass substrate (5), reducing the wear of the cutting knife (6), and prolonging the service life of the cutting knife (6) .

The invention discloses a conveying device in a hollow glass product annealing furnace which is capable of evenly heating the hollow glass products in the annealing process. The conveying device comprises a conveying rack and a conveying transmission device, wherein the conveying rack comprises two pairs of conveying bars; placement grooves are evenly formed on the conveying bars; the conveying transmission device comprises two conveying transmission mechanisms with the same structure; each conveying transmission mechanism comprises four driving discs which are orderly arranged in parallel to each other along a straight line; the center line of the four driving discs is perpendicular to the conveying direction of the conveying rack; the two middle driving discs are connected through an eccentric transmission shaft; the two middle driving discs and the corresponding driving discs are connected through transmission shafts arranged symmetrical to the driving discs, respectively; each driving disc is provided with a driving shaft and a support shaft along the center line of the driving disc, respectively; and support rods are movably articulated between the end parts of the inner and outer conveying bars and the corresponding transmission shafts, respectively. The conveying device in the hollow glass product annealing furnace can be applied to the annealing furnaces for various hollow glass products.

The invention discloses an arranging structure of heaters on a bearing-steel isothermal spheroidized annealing furnace. Bearing steel on an upper layer of driving roller set and a lower layer of driving roller set respectively is made to enter a hearth from a front furnace mouth and a rear furnace mouth and is conveyed in opposite directions, and the diagonal symmetrical arrangement of the heaters ensures the heating, insulating and isothermal treatment of the bearing steel on the upper layer of driving roller set and the lower layer of driving roller set and ensures the annealing treatment effect of the two layers of the bearing steel in the two directions. Accordingly, if high-temperature bearing steel to be conveyed out of the furnace mouth is conveyed on one of the upper layer of driving roller set and the lower layer of driving roller set, i.e. the high-temperature bearing steel is conveyed out of an isothermal chamber and made to enter an afterheat recovery exchanger chamber, normal-temperature bearing steel (also called as cold burden) which is just made to enter the furnace mouth is conveyed on the other layer of driving roller set, and the high-temperature bearing steel and the normal-temperature bearing steel can exchange heat so that the temperature of the normal-temperature bearing steel rises, the heat of the high-temperature bearing steel is recovered, and the heat needed for subsequently entering the isothermal chamber is reduced and energy is saved. In an intercooling chamber, a cooler can cool the high-temperature bearing steel discharged from a heating and insulating chamber while the high-temperature bearing steel and the lower-temperature bearing steel on the upper layer of driving roller set and the lower layer of driving roller set can exchange heat so that heat needed by lower-temperature bearing steel to subsequently enter the heating and insulating chamber is lowered, the energy is saved and heat waste is reduced.

The invention discloses a laser annealing device and method. The device comprises a laser irradiation system, a slide system and a reflected light detection system sequentially arranged along the optical path, and a host computer connected with the laser irradiation system, the slide system and the reflected light detection system The laser irradiation system includes a laser light source, a beam adjustment component, a light intensity distribution forming component, a beam splitting component and a focusing component arranged in sequence along the optical path; the incident light intensity required for the silicon wafer is formed by selecting the optical elements on the light intensity distribution forming component distribution, so that the temperature field on the silicon wafer reaches the effect of consistent temperature between the middle and the edge, ensuring the uniformity of the annealing temperature, thereby improving the uniformity of the annealing effect; based on the same batch of silicon wafers, the patterns at the same position are the same, and the annealing The optical components used in the process are well selected, and the exposure process is written in order. During the exposure process, only monitoring is performed without adjustment, which can improve efficiency and increase productivity while ensuring annealing performance.

The invention discloses an annealing device for plastic products. The annealing device comprises a box body, wherein a work box is fixedly connected between the two opposite sides of an inner wall ofthe box body through a fixing plate, and a motor is fixedly connected with the bottom of the inner wall of the box body; the output shaft of the motor is fixedly connected with a shelf through a transmission and a rotating device, and the bottom of the outer wall of the box body is fixedly connected with a bearing plate; one side of the top of the bearing plate is fixedly connected with an oil tank, and one side, close to the oil tank, of the bottom of the inner wall of the box body is fixedly connected with an oil pump; one side of the top of a fixing plate is fixedly connected with a circulating air pump, and an air heater is fixedly connected between the two opposite sides of the outer wall of the work box and the inner wall of the box body through a supporting plate; the bottom of theinner wall of the work box is fixedly connected with a heating disc, and one side of the top of the inner wall of the box body is fixedly connected with a control box. The invention relates to the technical field of plastic product processing. The annealing device for the plastic products has the advantages of simple operation, optional annealing method, stable annealing temperature, ensuring of annealing quality and improvement on processing efficiency.