The embodiment of the invention provides a
semiconductor structure and a preparation method thereof, a functional
chip and
electronic equipment, and relates to the technical field of
semiconductor structures. The preparation method of the
semiconductor structure comprises the following steps: providing a semiconductor
layer group, wherein the semiconductor
layer group comprises a first
dielectric layer, a semiconductor layer, a conductive structure and an electronic element; and removing part of the semiconductor layer from one side of the second surface of the semiconductor layer along the first direction, and exposing the end face of one side, far away from the electronic element, of the conductive structure. And forming a protection structure on one side, far away from the first
dielectric layer, of the conductive structure, and enabling the
orthographic projection of the protection structure on the semiconductor layer to cover the
orthographic projection of the exposed end surface of the conductive structure on the semiconductor layer. And
etching a part of the semiconductor layer from one side of the second surface of the semiconductor layer along the first direction by taking the protection structure as a
mask. According to the embodiment of the invention, the protection structure is arranged, so that the residual conductive
metal particles can be reduced, and the electrical reliability of the semiconductor layer is improved.