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43results about How to "Many limitation" patented technology

Release surfaces, particularly for use in nanoimprint lithography

The addition of thin coatings (less than and approaching monomolecular coatings) of persistent release materials comprising preferred compounds of the formula:
RELEASE-M(X)n-1
RELEASE-M(X)n-m-1Qm,
Or
RELEASE-M(OR)n-1—, wherein
    • RELEASE is a molecular chain of from 4 to 20 atoms in length, preferably from 6 to 16 atoms in length, which molecule has either polar or non-polar properties;
    • M is a metal atom, semiconductor atom, or semimetal atom;
    • X is a halogen or cyano, especially Cl, F, or Br;
    • Q is hydrogen or alkyl group;
    • M is the number Q represents
    • R is hydrogen, alkyl or phenyl, preferably hydrogen or alkyl of 1 to 4 carbon atoms; and
    • N is the valence −1 of M,
    • and n-m-1 is at least 1
provides good release properties. The coated substrates are particularly good for a lithographic method and apparatus for creating ultra-fine (sub-25 nm) patters in a thin film coated on a substrate is provided, in which a mold having at least one protruding feature is pressed into a thin film carried on a substrate. The protruding feature in the mold creates a recess of the thin film. The mold is removed from the film. The thin film then is processed such that the thin film in the recess is removed exposing the underlying substrate. Thus, the patterns in the mold is replaced in the thin film, completing the lithography. The patterns in the thin film will be, in subsequent process, reproduced in the substrate or in another material which is added onto the substrate.
Owner:CHOU

Release Surfaces, Particularly For Use In Nanoimprint Lithography

The addition of thin coatings (less than and approaching monomolecular coatings) of persistent release materials comprising preferred compounds of the formula:
RELEASE-M(X)n−1
RELEASE-M(X)n−m−1 Qm,
or
RELEASE-M(OR)n'1, wherein
RELEASE is a molecular chain of from 4 to 20 atoms in length, preferably from 6 to 16 atoms in length, which molecule has either polar or non-polar properties; M is a metal atom, semiconductor atom, or atom; X is halogen or cyano, especially Cl, F, or Br; Q is hydrogen or alkyl group; m is the number of Q groups; R is hydrogen, alkyl or phenyl, preferably hydrogen or alkyl of 1 to 4 carbon atoms; and n is the valence−1 of M; and n−m−1 is at least 1 provides good release properties. The coated substrates are particularly good for a lithographic method and apparatus for creating ultra-fine (sub-25 nm) patterns in a thin film coated on a substrate is provided, in which a mold having at least one protruding feature is pressed into a thin film carried on a substrate. The protruding feature in the mold creates a recess of the thin film. The mold is removed from the film. The thin film then is processed such that the thin film in the recess is removed exposing the underlying substrate. Thus, the patterns in the mold is replaced in the thin film, completing the lithography. The patterns in the thin film will be, in subsequent processes, reproduced in the substrate or in another material which is added onto the substrate.
Owner:RGT UNIV OF MINNESOTA

Device for dispensing fluids

The invention is a fluid dispensing device suited to be connected, by means of a connection element (220), to a container (C) holding the fluid that can be dispensed from the inside to the outside of the container through an actuator element (400), comprising: a suction duct (240) suited to communicate with the fluid held inside the container (C), a dispenser duct (440) in communication with the outer space with respect to the volume (V) enclosed by the container (C), a suction/compression chamber (300) that can communicate with the suction duct (240) and the dispenser duct (440), a suction valve (260) suited to alternatively allow and prevent the passage of a fluid between the suction duct (240) and the suction/compression chamber (300) when, respectively, the suction valve is closed and open, a dispensing valve (460) suited to alternatively allow and prevent the passage of a fluid between the dispenser duct (440) and the suction/compression chamber (300) when, respectively, the suction valve is closed and open, a tight membrane (500) slidingly coupled with the walls of the suction/compression chamber (300) so that it can be translated in a predetermined direction; both the suction valve (260) and the dispensing valve (460) comprise the membrane (500). The invention concerns also a system for containing and dispensing fluids (F).
Owner:TAPLAST
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