The invention provides a preparation method of a
light reflection device and the
light reflection device, and relates to the technical field of semiconductors, and the preparation method comprises the steps: providing a substrate with a
control circuit, patterning a first
metal layer to form a
metal interconnection layer, patterning a second
metal layer to form a
light reflection array, and enabling the metal
interconnection layer to be electrically connected with the
control circuit, and at least one light reflection structure of the light reflection array is electrically connected. According to the preparation method, the first metal layer and the second metal layer are sequentially deposited on the substrate and are patterned to obtain the metal
interconnection layer and the light reflection array, so that the preparation of the light reflection device can be completed by adopting the MEMS technology based on the preparation method, the process is simple, the cost is low, and the reliability of the device can be ensured. The patterning of the metal interconnection layer and the patterning of the light reflection array do not influence each other, diversification of light reflection structures can be achieved, meanwhile, the number of the light reflection structures of the light reflection array is not limited, the size can be very small, and the size of the light reflection device is reduced.