12 results about "Dewetting" patented technology

The present invention provides a calculation method for the soil-water characteristic curve of unsaturated soil, which includes: 1) collecting dewetting test data points and fitting them to obtain a continuous "initial dewetting curve"; 2) dividing the "initial dewetting curve" into N intervals equally within the soil suction range, and calculating the water content of each interval taking into account the hysteresis effect; 3) collecting test data points on the "main infiltration curve", fitting them with the calculated value in step 2, and determining the correction parameter k; 4) calculating the "infiltration scanning curve" or "dewetting scanning curve" under any initial state. The calculation results of this method are highly accurate and can effectively meet the engineering precision requirements. Compared with the use of experimental methods to obtain data throughout the process, this calculation method only requires part of the test data to calculate the "infiltration scanning curve" or "dewetting scanning curve" starting from any initial soil suction, which is relatively low in cost.

A chemical sensor including: (a) a first electrode; (b) a second electrode spatially separated from the first electrode by an electrode gap; (c) metal nanoparticles disposed within the electrode gap between the first electrode and the second electrode, the metal nanoparticles separated from each other by nanoparticle gaps; and (d) a semiconductor material disposed within the electrode gap and the nanoparticle gaps. Additionally disclosed is a method of making the chemical sensor including a metal layer forming step, which can include a dewetting step that forms the metal nanoparticles from the metal layer formed during the metal layer forming step. Further disclosed is method for sensing a target substance with the chemical sensor.

The invention relates to an optical thin film, in particular to a method for removing Sn pollutants on the surface of a multilayer film based on wetting-stress removal, which comprises the following steps of: firstly depositing a layer of continuous Sn thin film on the multilayer film of which the surface is polluted by Sn, and then depositing a layer of Al2O3 thin film of which the thickness is greater than 100nm to form a layer to be removed; heating treatment is carried out in a vacuum environment, so that the to-be-removed layer has cracks under the action of dewetting-stress, and the binding force between the to-be-removed layer and the multi-layer film is reduced; and polishing the sample, and removing the to-be-removed layer on the surface of the multilayer film. According to the method for removing the Sn pollutants on the surface of the multilayer film, the Sn pollutants on the surface of the multilayer film can be efficiently removed on the premise that the structure of the multilayer film is not obviously affected, and then the optical function of the multilayer film is recovered.

The invention relates to a method for producing a filter membrane with a perforated structure consisting of multiple holes. The invention further relates to a filter membrane produced by this method. The object of the invention is therefore to propose a method for producing filter membranes that enables the formation of filter membranes with uniformly sized holes in the micrometer / nanometer range and a high perforation density within an industrially acceptable process time. This object is achieved by first filling a mold with an inverted perforation structure with a liquid filter membrane material.The filling mold is then rotated around an axis of rotation which is parallel to a surface normal of the liquid level of the liquid filter membrane material filled into the filling mold, whereby a rotational speed is set such that a layer of liquid filter membrane material remaining on the end surfaces after filling the filling mold is thinned to the point of dewetting.

The invention is notably directed to a method of obtaining a multilayer metasurface structure (1). The method comprises forming (S10 – S40) a layer structure (1) including two or more sub-stacks (10) of layers, wherein all of the sub-stacks of layers are stacked on a substrate (11). Each sub-stack (10) is obtained by: depositing (S20) a metal film (12) on a previous dielectric material layer (16) of the layer structure (1) obtained so far; obtaining (S30) an essentially two-dimensional arrangement of nanoparticles (14) through a controlled solid-state dewetting of the deposited metal film (12); and conformally covering (S40) the nanoparticles (14) with a dielectric material layer (15) for the latter to form a dielectric spacer. The method is simple (it does not require any structured substrate, structured support layers, or patterned metal film, and does not require complex lithographic steps), cost-effective, eco-friendly, and makes it possible to obtain ultra-clean nanoparticles. Clean interfaces are obtained, not only between the nanoparticles and the lower support layer (e.g., the dielectric material layer of the lower sub-stack) but also between the nanoparticles and the upper dielectric material, with a high level of conformality. This helps eliminate unwanted scattering centres such as surface defects and internal voids. The above method can be used to easily tune electro-optical properties of the layer structure, e.g., to enhance a visual appearance of a luxury item. The invention is further directed to related multilayer metasurface structures as obtained thanks to the above method.

The invention provides a random broadband optical filter for a micro spectrometer. The random broadband optical filter is characterized by being a random broadband optical filter based on a plasmon absorption effect formed by metal rapid annealing. The preparation method comprises the following steps that a baffle is placed on a transparent substrate, a gold-silver composite film is formed through sputtering, then solid-state dehumidification is conducted through a rapid annealing furnace, nano islands in different shapes are formed, and therefore different colors are formed. In order to enhance the response within the range of 500-600 nm, a single layer of gold with the size of 20-30 nm is independently plated on the substrate, and the structure can form green after plasma resonance. And then, a half of the quartz plate is covered with a layer of polymethyl methacrylate (PMMA), and the PMMA can enable the obtained transmittance curve of the optical filter to perform blue shift to a certain extent, so that the broadband optical filter with richer colors is obtained. The optical filter prepared through the method has the advantages of being low in cost, simple in manufacturing process, easy to manufacture through a large-area structure and rich in color.

The present disclosure relates generally to the field of nanotechnology. Particularly, the present disclosure provides a confined-dewetting method for synthesis of metal nanoparticles comprising: a) depositing a thin metal film on a substrate to form a metal film coated substrate; b) placing the metal film coated substrate in a thermal conducting container followed by adding a liquid form of polymer to obtain a polymer containing metal film coated substrate; c) heating the polymer containing metal film coated substrate under condition to grow nanoparticle and converts the liquid form of polymer to solid polymer film; and d) removing the solid polymer film to obtain a metal nanoparticle. The present disclosure provides a high-density and low-dispersity metal nanoparticles.

Methods and apparatus comprising a dewetting material and a polymerization liquid that are immiscible and dewetting, and can be used for the formation of three-dimensional objects, wherein the method does not require a dead zone. Additionally, methods and apparatus that employ the use of a flowing dewetting material to provide a shearing interface to reduce interfacial adhesive forces.

The present invention relates to a method for fabricating microparticles by using a degassed gas-permeable micro-mold and discontinuous dewetting. The method for fabricating microparticles according to the present invention comprises the steps of: depressurizing and degassing a porous micro-mold including a plurality of micro-wells concavely recessed in a predetermined shape and size from one surface thereof (S100); loading a microparticle precursor solution on which the micro-wells are formed, and covering the microparticle precursor solution with a cover substrate (S200); moving the cover substrate to the side (S300); and curing the microparticle precursor solution filled in the micro-wells, thereby synthesizing microparticles (S400).

This invention discloses a method for preparing superhydrophobic glass with a dense array nanostructure. The method comprises: performing a first vapor deposition on a pretreated glass substrate to form a metal film on the surface of the glass substrate; followed by heat treatment to form a metal nanoparticle mask on the surface of the glass substrate; performing a second vapor deposition and subsequent heat treatment on the glass substrate under the same conditions to form a dense metal nanoparticle mask on the surface of the glass substrate; and finally performing reactive ion etching, acid washing, and hydrophobic modification treatments on the glass substrate to obtain superhydrophobic glass with a dense array nanostructure. This invention significantly increases the particle size and density of the metal nanoparticles on the glass substrate surface through two solid-state dewetting processes, thereby giving the final glass with a dense array nanostructure excellent dustproof, anti-condensation, anti-frost, anti-icing, and antibacterial properties.

A cleaning method (100) for a transport enclosure (2) for the conveying and atmospheric storage of semiconductor substrates comprising the following succession of steps: - a first wetting step (101) during which the internal walls of a shell (3) of the transport enclosure (2) are wetted with a predetermined quantity of liquid water less than 200ml / m2 (0.0002m3 / m2), such as less than 100ml / m2 (0.0001m3 / m2), - a subsequent second dewetting step (102) by projection of a pressurized gas jet, during which the piloting of an articulated arm (23) is controlled to move the gas projection device (26) in the shell (3) along a trajectory and orientation of the gas jet so that the pressurized gas jet carries the liquid deposited on the internal walls out of the shell (3). Abbreviated figure: Figure 1

A method for transferring a component comprises providing a transfer assembly having the component, a carrier substrate and a connecting structure. The carrier substrate is transparent to laser radiation. The component is connected to the carrier substrate via the connecting structure. The connecting structure has at least one layer stack with a meltable layer composed of a meltable metal and a dewetting layer adjoining the meltable layer. The method further comprises positioning the transfer assembly over a target substrate. Furthermore, laser radiation is emitted in the direction of the at least one layer stack through the carrier substrate, such that melting of the meltable metal of the meltable layer and dewetting of the melted meltable metal from the dewetting layer are brought about, and the component is thereby separated from the carrier substrate and transferred to the target substrate.