The invention is notably directed to a method of obtaining a multilayer metasurface structure (1). The method comprises forming (S10 – S40) a layer structure (1) including two or more sub-stacks (10) of
layers, wherein all of the sub-stacks of
layers are stacked on a substrate (11). Each sub-stack (10) is obtained by: depositing (S20) a
metal film (12) on a previous
dielectric material layer (16) of the layer structure (1) obtained so far; obtaining (S30) an essentially two-dimensional arrangement of nanoparticles (14) through a controlled
solid-state
dewetting of the deposited
metal film (12); and conformally covering (S40) the nanoparticles (14) with a
dielectric material layer (15) for the latter to form a
dielectric spacer. The method is simple (it does not require any structured substrate, structured support
layers, or patterned
metal film, and does not require complex lithographic steps), cost-effective, eco-friendly, and makes it possible to obtain ultra-clean nanoparticles. Clean interfaces are obtained, not only between the nanoparticles and the lower support layer (e.g., the dielectric material layer of the lower sub-stack) but also between the nanoparticles and the upper dielectric material, with a high level of conformality. This helps eliminate unwanted scattering centres such as surface defects and internal voids. The above method can be used to easily tune electro-optical properties of the layer structure, e.g., to enhance a
visual appearance of a luxury item. The invention is further directed to related multilayer metasurface structures as obtained thanks to the above method.