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5 results about "Dewetting" patented technology

In fluid mechanics, dewetting is one of the processes that can occur at a solid–liquid, solid-solid or liquid–liquid interface. Generally, dewetting describes the process of retraction of a fluid from a non-wettable surface it was forced to cover. The opposite process—spreading of a liquid on a substrate—is called wetting. The factor determining the spontaneous spreading and dewetting for a drop of liquid placed on a solid substrate with ambient gas, is the so-called spreading coefficient S: S =γSG-γSL-γLG where γSG is the solid-gas surface tension, γSL is the solid-liquid surface tension and γLG is the liquid-gas surface tension (measured for the mediums before they are brought in contact with each other).

Chemical sensor with metal nanoparticles, method of making same, and method of using same to sense a target substance

A chemical sensor including: (a) a first electrode; (b) a second electrode spatially separated from the first electrode by an electrode gap; (c) metal nanoparticles disposed within the electrode gap between the first electrode and the second electrode, the metal nanoparticles separated from each other by nanoparticle gaps; and (d) a semiconductor material disposed within the electrode gap and the nanoparticle gaps. Additionally disclosed is a method of making the chemical sensor including a metal layer forming step, which can include a dewetting step that forms the metal nanoparticles from the metal layer formed during the metal layer forming step. Further disclosed is method for sensing a target substance with the chemical sensor.
Owner:CORNING INC

Method for producing a filter membrane with a hole structure consisting of several holes and a filter membrane produced using the method

PendingDE102024135833A1MembranesSemi-permeable membranesDewettingChemistry
The invention relates to a method for producing a filter membrane with a perforated structure consisting of multiple holes. The invention further relates to a filter membrane produced by this method. The object of the invention is therefore to propose a method for producing filter membranes that enables the formation of filter membranes with uniformly sized holes in the micrometer / nanometer range and a high perforation density within an industrially acceptable process time. This object is achieved by first filling a mold with an inverted perforation structure with a liquid filter membrane material.The filling mold is then rotated around an axis of rotation which is parallel to a surface normal of the liquid level of the liquid filter membrane material filled into the filling mold, whereby a rotational speed is set such that a layer of liquid filter membrane material remaining on the end surfaces after filling the filling mold is thinned to the point of dewetting.
Owner:INST FUR OBERFLACHENMODIFIZIERUNG EV +1

Multilayer metasurface structures and fabrication thereof

The invention is notably directed to a method of obtaining a multilayer metasurface structure (1). The method comprises forming (S10 – S40) a layer structure (1) including two or more sub-stacks (10) of layers, wherein all of the sub-stacks of layers are stacked on a substrate (11). Each sub-stack (10) is obtained by: depositing (S20) a metal film (12) on a previous dielectric material layer (16) of the layer structure (1) obtained so far; obtaining (S30) an essentially two-dimensional arrangement of nanoparticles (14) through a controlled solid-state dewetting of the deposited metal film (12); and conformally covering (S40) the nanoparticles (14) with a dielectric material layer (15) for the latter to form a dielectric spacer. The method is simple (it does not require any structured substrate, structured support layers, or patterned metal film, and does not require complex lithographic steps), cost-effective, eco-friendly, and makes it possible to obtain ultra-clean nanoparticles. Clean interfaces are obtained, not only between the nanoparticles and the lower support layer (e.g., the dielectric material layer of the lower sub-stack) but also between the nanoparticles and the upper dielectric material, with a high level of conformality. This helps eliminate unwanted scattering centres such as surface defects and internal voids. The above method can be used to easily tune electro-optical properties of the layer structure, e.g., to enhance a visual appearance of a luxury item. The invention is further directed to related multilayer metasurface structures as obtained thanks to the above method.
Owner:SWISS CLUSTER AG

Random broadband optical filter for micro spectrometer

The invention provides a random broadband optical filter for a micro spectrometer. The random broadband optical filter is characterized by being a random broadband optical filter based on a plasmon absorption effect formed by metal rapid annealing. The preparation method comprises the following steps that a baffle is placed on a transparent substrate, a gold-silver composite film is formed through sputtering, then solid-state dehumidification is conducted through a rapid annealing furnace, nano islands in different shapes are formed, and therefore different colors are formed. In order to enhance the response within the range of 500-600 nm, a single layer of gold with the size of 20-30 nm is independently plated on the substrate, and the structure can form green after plasma resonance. And then, a half of the quartz plate is covered with a layer of polymethyl methacrylate (PMMA), and the PMMA can enable the obtained transmittance curve of the optical filter to perform blue shift to a certain extent, so that the broadband optical filter with richer colors is obtained. The optical filter prepared through the method has the advantages of being low in cost, simple in manufacturing process, easy to manufacture through a large-area structure and rich in color.
Owner:SICHUAN UNIV

Method and cleaning station for a transport enclosure for the conveying and atmospheric storage of semiconductor substrates

A cleaning method (100) for a transport enclosure (2) for the conveying and atmospheric storage of semiconductor substrates comprising the following succession of steps: - a first wetting step (101) during which the internal walls of a shell (3) of the transport enclosure (2) are wetted with a predetermined quantity of liquid water less than 200ml / m2 (0.0002m3 / m2), such as less than 100ml / m2 (0.0001m3 / m2), - a subsequent second dewetting step (102) by projection of a pressurized gas jet, during which the piloting of an articulated arm (23) is controlled to move the gas projection device (26) in the shell (3) along a trajectory and orientation of the gas jet so that the pressurized gas jet carries the liquid deposited on the internal walls out of the shell (3). Abbreviated figure: Figure 1
Owner:PFEIFFER VACUUM SAS