In
wafer semiconductor manufacture, a method of
etching an
arsenic doped polysilicon layer down to a patterned boro-phospho-
silicate-glass (BPSG) layer provided with a plurality of openings with an uniform etch rate is disclosed. The method relies on a combination of both
system and process improvements. The
system improvement consists to hold the
wafer in the reactor during the etch process with an electrostatic chuck device to have a perfect
plasma environment around and above the
wafer. On the other hand, the
process improvement consists in the use of a non
dopant sensitive and not selective
chemistry. A NF3 / CHF3 / N2 gas mixture with a 11 / 8.6 / 80.4 ratio in percent is adequate in that respect. The etch
time duration is very accurately controlled by an optical etch endpoint detection
system adapted to detect the intensity
signal transition of a CO line at the BPSG layer
exposure. The process is continued by a slight overetching. When the above method is applied to the doped polysilicon strap formation in
DRAM chips, excessive or insufficient
etching of the polysilicon layer is avoided, so that the doped polysilicon strap thickness is thus much more uniform, opening to opening, within a wafer.