The present application relates to a
semiconductor packaging structure and a preparation method therefor. The
semiconductor packaging structure comprises: a
DRAM wafer, the
DRAM wafer comprising a plurality of
DRAM chips and a plurality of first through-
silicon vias penetrating the DRAM
wafer; a BEOL layer, which is located on one side of the DRAM wafer; a DTC layer, which is located on the side surface of the BEOL layer facing away from the DRAM wafer, the DTC layer comprising a plurality of DTC chips, and each DTC
chip being provided with a plurality of second through-
silicon vias; and a processor layer, which is located on the side surface of the DTC layer facing away from the BEOL layer, the processor layer comprising a plurality of processor chips, wherein the DRAM wafer and the DTC layer are connected together by means of
hybrid bonding, and the DTC layer and the processor layer are connected together by means of
hybrid bonding. The
semiconductor packaging structure provided in the present application can improve the integration density of a
system, improve the stability and strength of an SoW packaging structure, reduce the transmission distance and transmission
power consumption for stored data, mitigate
crosstalk and
return loss by means of a DTC, and reduce power network impedance, thereby further improving the
signal integrity of a DRAM and the overall
power integrity of the
system.