The invention relates to the technical field of
photovoltaics and semiconductors, in particular to a gas uniformizing device and a
film coating device, and solves the problem that the
film coating uniformity of the
film coating device on sheet materials is poor. The gas uniformizing device comprises a gas uniformizing
assembly and a plurality of spraying assemblies, the gas uniformizing
assembly can be arranged in a containing cavity of the
coating device, the gas uniformizing
assembly is provided with a plurality of gas uniformizing parts which are sequentially arranged in the first direction, and the gas uniformizing parts can receive
coating gas. And the multiple spraying assemblies are arranged on one side of the gas uniformizing assembly and communicate with the multiple gas uniformizing parts in a one-to-one correspondence mode, each spraying assembly is provided with multiple spraying holes, and the spraying holes face or deviate from the adjacent spraying assemblies. At least one side, in the first direction, of the spraying assembly can be provided with a flaky material. The spraying holes of the multiple spraying assemblies can spray the
coating gas to the corresponding flaky materials, the gas
distribution uniformity in the coating device is improved, and the coating uniformity of the coating device on the multiple flaky materials is improved.