The invention relates to a large-beam diameter ion source. The large-beam diameter ion source comprises a gas ionization device, an ion optical system and a neutralization device, wherein the gas ionization device is used for generating plasma, the ion optical system is used for extracting an ion beam from the plasma and accelerating the ion beam, the neutralization device is used for emitting electrons to the ion beam so as to generate a neutralization ion beam, the emission aperture of the large-beam diameter ion source is 100-200 millimeters, the ion optical system comprises a screen grid and an acceleration grid which are axially arranged on the same central line at intervals, a grid hole region with a grid hole is arranged at the middle part of the screen grid, and the aperture of the grid hole of the grid hole region is gradually increased towards the outside from a circle center of the grid hole region along a radial direction. In the large-beam diameter ion source, the screen grid with variable aperture is designed, so that the aperture of the screen grid is matched with plasma concentration distribution extracted by the screen grid, the same beam density is further extracted through different apertures to achieve the purpose of improving the beam uniformity, and the ion beam with wide beam and high directivity can be generated; and moreover, the effective beam diameter and the uniformity are large, and the beam stability is high.