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32results about How to "Step of become large" patented technology

Layered microelectronic contact and method for fabricating same

A microelectronic spring contact for making electrical contact between a device and a mating substrate and method of making the same are disclosed. The spring contact has a compliant pad adhered to a substrate of the device and spaced apart from a terminal of the device. The compliant pad has a base adhered to the substrate, and side surfaces extending away from the substrate and tapering to a smaller end area distal from the substrate. A trace extends from the terminal of the device over the compliant pad to its end area. At least a portion of the compliant pad end area is covered by the trace, and a portion of the trace that is over the compliant pad is supported by the compliant pad. A horizontal microelectronic spring contact and method of making the same are also disclosed. The horizontal spring contact has a rigid trace attached at a first end to a terminal of a substrate. The trace is free from attachment at its second end, and extends from the terminal in a direction substantially parallel to a surface of the substrate to the second end. At least a distal portion of the trace extending to the second end is spaced apart from the surface of the substrate. The spaced-apart distal portion is flexible in a plane parallel to the substrate.
Owner:FORMFACTOR INC

Layered microelectronic contact and method for fabricating same

A microelectronic spring contact for making electrical contact between a device and a mating substrate and method of making the same are disclosed. The spring contact has a compliant pad adhered to a substrate of the device and spaced apart from a terminal of the device. The compliant pad has a base adhered to the substrate, and side surfaces extending away from the substrate and tapering to a smaller end area distal from the substrate. A trace extends from the terminal of the device over the compliant pad to its end area. At least a portion of the compliant pad end area is covered by the trace, and a portion of the trace that is over the compliant pad is supported by the compliant pad. A horizontal microelectronic spring contact and method of making the same are also disclosed. The horizontal spring contact has a rigid trace attached at a first end to a terminal of a substrate. The trace is free from attachment at its second end, and extends from the terminal in a direction substantially parallel to a surface of the substrate to the second end. At least a distal portion of the trace extending to the second end is spaced apart from the surface of the substrate. The spaced-apart distal portion is flexible in a plane parallel to the substrate.
Owner:FORMFACTOR INC

Size exclusion chromatography-combined nitrogen detector and application method

Disclosed are a size exclusion chromatography-combined nitrogen detector and an application method thereof, which belong to the field of detection and analysis of water quality. The detector comprises an oxidation system (1), a nitrate detection system (2), a power supply system (3), and a signal processing and control system (4), wherein after being separated by size exclusion chromatography, a sample to be detected enters into the oxidation system (1) to undergo oxidation treatment, and after nitrogenous compound in the sample is converted into nitrate, the sample is detected in the nitrate detection system (2) by ultraviolet (UV) absorbance method. The power supply system (3) supplies power to the detector, and the signal processing and control system (4) is responsible for processing and controlling signals of the oxidation system (1) and the nitrate detection system (2). The detector can achieve quantitative analyses of total nitrogen, organic nitrogen, nitrate nitrogen, and ammonia nitrogen, has the advantages of easiness in operation, being rich in information, etc. and thereby effectively prevents the problems of relatively large error and negative value resulting from the subtraction calculation in conventional organic nitrogen analysis methods.
Owner:NANJING UNIV +1
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