The application discloses a kind of
chip surface submicron dirty spot half-supervised automatic positioning method, comprising: S1,
chip surface image is shot;S2, rough positioning: construct double
memory bank driven semi-supervised AE defect positioning network, quickly resolve the two-dimensional center coordinates and
radius of dirty spot;S3, fine positioning: the rough positioning area of dirty spot is carried out high-density depth
data acquisition;S4, dirty spot three-dimensional model construction: the accurate depth value of each dirty spot is fused with the two-dimensional coordinate in rough positioning, and the high-precision
point cloud model of micro dirty is generated.The method constructs double
memory bank driven semi-supervised AE defect positioning network and based on
galvanometer scanning
image field telecentric spectral
confocal detection
system, effectively solve the detection problem caused by the scarcity of micro dirty sample in industrial scene, break through the
bottleneck of low efficiency of traditional full-field scanning, realize the efficient, accurate three-dimensional reconstruction and quantitative analysis to the geometry appearance of
chip surface submicron dirty.