Patents
Literature
Patsnap Copilot is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Patsnap Copilot

50results about How to "The equipment is bulky" patented technology

Plating apparatus and method

An apparatus for plating a conductive film directly on a substrate with a barrier layer on top includes anode rod (1) placed in tube (109), and anode rings (2), and (3) placed between cylindrical walls (107) and (105), (103) and (101), respectively. Anodes (1), (2), and (3) are powered by power supplies (13), (12), and (11), respectively. Electrolyte (34) is pumped by pump (33) to pass through filter (32) and reach inlets of liquid mass flow controllers (LMFCs) (21), (22), and (23). Then LMFCs (21), (22) and (23) deliver electrolyte at a set flow rate to sub-plating baths containing anodes (3), (2) and (1), respectively. After flowing through the gap between wafer (31) and the top of the cylindrical walls (101), (103), (105), (107) and (109), electrolyte flows back to tank (36) through spaces between cylindrical walls (100) and (101), (103) and (105), and (107) and (109), respectively. A pressure leak valve (38) is placed between the outlet of pump (33) and electrolyte tank (36) to leak electrolyte back to tank (36) when LMFCs (21), (22), (23) are closed. A wafer (31) held by wafer chuck (29) is connected to power supplies (11), (12) and (13). A drive mechanism (30) is used to rotate wafer (31) around the z axis, and oscillate the wafer in the x, y, and z directions shown. Filter (32) filters particles larger than 0.1 or 0.2 mum in order to obtain a low particle added plating process.
Owner:ACM RES

Plating apparatus and method

An apparatus for plating a conductive film directly on a substrate with a barrier layer on top includes anode rod (1) placed in tube (109), and anode rings (2), and (3) placed between cylindrical walls (107) and (105), (103) and (101), respectively. Anodes (1), (2), and (3) are powered by power supplies (13), (12), and (11), respectively. Electrolyte (34) is pumped by pump (33) to pass through filter (32) and reach inlets of liquid mass flow controllers (LMFCs) (21), (22), and (23). Then LMFCs (21), (22) and (23) deliver electrolyte at a set flow rate to sub-plating baths containing anodes (3), (2) and (1), respectively. After flowing through the gap between wafer (31) and the top of the cylindrical walls (101), (103), (105), (107) and (109), electrolyte flows back to tank (36) through spaces between cylindrical walls (100) and (101), (103) and (105), and (107) and (109), respectively. A pressure leak valve (38) is placed between the outlet of pump (33) and electrolyte tank (36) to leak electrolyte back to tank (36) when LMFCs (21), (22), (23) are closed. A wafer (31) held by wafer chuck (29) is connected to power supplies (11), (12) and (13). A drive mechanism (30) is used to rotate wafer (31) around the z axis, and oscillate the wafer in the x, y, and z directions shown. Filter (32) filters particles larger than 0.1 or 0.2 mum in order to obtain a low particle added plating process.
Owner:ACM RES

Continuously working magnetic stimulation device and method

The invention discloses a continuously working magnetic stimulation device and method. The device comprises a magnetic stimulation coil formed by winding a hollow wire and a refrigerant circulation unit; a low-temperature refrigerant preparation flows at the hollow part of the wire, and the low-temperature refrigerant preparation flows in the hollow part of the wire to take away Joule heat generated during working of the magnetic stimulation coil; and the refrigerant circulation unit is used to circulate the low-temperature refrigerant preparation to absorb the Joule heat absorbed by the low-temperature refrigerant preparation from the magnetic stimulation coil, so that the Joule heat generated during the working of the magnetic stimulation coil is absorbed circularly to ensure that the magnetic stimulation coil can work continuously. The device realizes the integration of equipment, does not need to immerse the stimulation coil in cold oil, does not increase the volume of the equipment, and easily realizes flexible movement of the stimulation coil; and compared with a traditional air cooling method, the method provided by the invention has the following advantages: the refrigerantis in full contact with a heated copper wire from the interior, so that the method has a good cooling effect and no noise, and does not increase the discomfort of a stimulated object.
Owner:HUAZHONG UNIV OF SCI & TECH

Movable type impregnating agent supply circulating tank

PendingCN109180024AReduce complex layoutEquipment is smallMovable typeInlet valve
The invention discloses a movable type impregnating agent supply circulating tank. The movable type impregnating agent supply circulating tank comprises a frame, a tank body, a stirring device, a diaphragm pump and a material reflowing box, wherein a top cover is arranged at the upper part of the tank body; the top cover is provided with a material reflowing opening and a circulating material returning opening; the tank body is provided with a steam inlet which is communicated with a hollow structure; a feeding opening of the diaphragm pump is communicated with the tank body through a feedingpipe; a discharging opening of the diaphragm pump is connected with a discharging pipe; the discharging pipe is provided with a discharging branch pipe; the discharging branch pipe is communicated with an impregnating agent feeding pipe of a glass fiber wiredrawing device; the end part of the discharging pipe is communicated with the circulating material returning opening; a gas inlet of the diaphragm pump is communicated with a gas inlet pipe of a gas inlet valve; the material reflowing box is provided with a material returning connector and a discharging opening; an impregnating agent discharging pipe is communicated with the material returning connector; and the discharging opening of the material reflowing box is communicated with the material reflowing opening. By adopting the movabletype impregnating agent supply circulating tank, a complicated layout of an impregnating agent pipeline in a plant area can be reduced; and furthermore, a relatively large equipment volume needed forarranging fixed impregnating agent supply equipment is also reduced.
Owner:重庆天泽新材料有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products