The invention relates to the technical field of electrical
engineering, and discloses a multi-layer
dielectric film charge uniform distribution high-
voltage environment collaborative anti-breakdown optimization design method, which comprises the following steps: S1,
material system design: selecting a
polymer with polarization intensity greater than 30mC / m < 2 > and
dielectric loss less than 0.015 as a basic
dielectric material, and introducing a nano filler to construct a composite
dielectric layer; s2, structural design: designing an asymmetric multilayer
film structure with gradient dielectric constant distribution, and regulating and controlling a charge transmission path through an
interface layer; and S3,
process optimization is conducted, specifically, a nanoscale
interface layer is prepared through the
atomic layer deposition technology, and gradient structure forming is achieved in combination with the additive
manufacturing technology. According to the method, the steps of
material system design, structure design and the like are integrated to form a complete collaborative optimization method, so that the problems of local
electric field concentration, low breakdown threshold and difficulty in reliability evaluation caused by charge accumulation due to the fact that most of traditional high-
voltage dielectric film designs adopt single-dimension optimization are solved.