30results about How to "Improve treatment uniformity" patented technology

The invention discloses an airflow balancing assembly, a chamber device and a substrate processing device. The airflow balancing assembly comprises a first annular plate and a second annular plate, wherein the first annular plate is provided with a first opening; a plurality of through holes are formed in the first annular plate; the second annular plate is provided with a second opening and is arranged on the first annular plate in an adjustable manner for partially shielding the plurality of the through holes in the first annular plate; the radial width of the second annular plate is changed along the circumferential direction of the second annular plate, so that the areas of the plurality of the through holes shielded by the second annular plate are changed along the circumferential direction of the first annular plate. The air balancing assembly provided by the embodiment of the invention is beneficial to improving the air distribution uniformity, and can improve the processing uniformity of the substrate. Besides, the airflow balancing assembly with the structure has a simple structure, is easy to manufacture, and low in cost. Besides, the adjustment can be flexibly implemented for different chamber structures, processes or chamber pressures.

The invention relates to a preparation method for coating of nano-silica through miniemulsion polymerization, which relates to the technical field of atom transfer radical polymerization and miniemulsion polymerization. The preparation method comprises the following steps: preparing a macroinitiator to modify the surface of a monomer, removing a solvent and a catalyst and then preparing a graft copolymer from the brominated monomer and a silane coupling agent through the ATRP method; and individually using the copolymer prepared above as a co-stablizer or a silane coupling agent for miniemulsion polymerization so as to finally prepare a stable emulsion particle with narrow particle size distribution and to meet requirements for coating of nano-silica. The preparation method provided by the invention has the advantages of safe process, simple operation and improvement of the characteristic of great possibility of agglomeration of nano-silica caused by a great specific surface area and high surface energy of nano-silica; and with the preparation method, the nano-silica particle with uniform particle size distribution and uniform dispersion is obtained, and the nano-silica particle is better compatible with a polymer.

A substrate processing apparatus includes a cavity having a substrate processing space and a coil portion having a plurality of inductance coils each of which has a shape winding the outer circumference of the cavity and is arranged at the extending direction of the cavity. The plurality of inductance coils include margin type inductance coils forming plasma in the cavity, with the density of theplasma in a zone corresponding to a margin zone of the substrate being higher than the density of the plasma in a zone corresponding to the central zone of the substrate; and central type inductance coils forming plasma in the cavity, with the density of the plasma in the zone corresponding to a central zone of the substrate being higher than the density of the plasma in a zone corresponding to the margin zone of the substrate. Effects of increasing plasma spatial uniformity and increasing substrate processing uniformity are achieved in embodiments. Through stacking and mounting the pluralityof inductance coils at the vertical direction, a capacity of plasma formed corresponding to a substrate processing surface is increased, and the plasma density changing along with processing zones isincreased.

The invention discloses a molten steel calcium treatment process and equipment thereof. The process comprises the following steps: 1) heating up and vacuuming; 2) alloying; 3) calcium treatment. The equipment includes a vacuum induction furnace, the vacuum induction furnace includes a vacuum chamber, a swing arm is arranged on the side wall of the vacuum chamber, an induction furnace is arranged in the vacuum chamber, the induction furnace is fixedly connected with the swing arm, the The top of the vacuum chamber is provided with a sealed furnace cover, and the sealed furnace cover is provided with a motor and a stirring rod. The bottom end of the stirring rod extends into the induction furnace, and the bottom end of the stirring rod is connected with a stirring head. The power input end of the stirring rod is connected with the motor. The smelting process of the present invention is sealed in a vacuum chamber, which can effectively prevent the oxidation and burning of the alloy, and has a high yield; the mechanical stirring method creates good dynamic conditions for the uniformity of calcium treatment, and significantly improves the calcium treatment of molten steel Effect; the whole operation process is completed in the vacuum chamber, which is isolated from the test operators, and the safety is better.

The invention discloses a heat-resisting anti-creep ultra-high molecular weight polyethylene fiber ultraviolet radiation crosslinking device which comprises a plurality of groups of transmission rollers and ultraviolet radiation devices, wherein the ultraviolet radiation devices are arranged on two optional adjacent groups of transmission rollers. The ultraviolet radiation devices comprise radiation shields with 'U'-shaped structures and ultraviolet light sources arranged inside the radiation shields. The heat-resisting anti-creep ultra-high molecular weight polyethylene fiber ultraviolet radiation crosslinking device can radiate ultra-high molecular weight polyethylene fibers by the ultraviolet radiation devices in the preparation process to finish the crosslinking process of the ultra-high molecular weight polyethylene fibers, and bonding tightness of molecular chains of the fibers is further improved, so that the operational performance of the formed ultra-high molecular weight polyethylene fibers in any environments can be guaranteed.

A heating processing method and a heat processing device capable guaranteeing the evenness and increasing the carrying block number of a substrate keeping component compared with the current are provided. The substrate holder (10) holds a plurality of substrates (w) at predetermined vertical intervals. The substrate holder (10) is carried into a heat treating furnace (3). A predetermined heat treatment is performed on the substrates. The substrate holder (10) has two holder constituting bodies (10a, 10b). Each of the holder (10a, 10b) constituting bodies has a plurality of columns (28) and substrate holding sections (30). The columns (28) are arranged on the circumference of the same imaginary circle. The substrate holding sections (30) hold circumferential portions of the respective substrates (w) and are mounted on each column (28). One of the holder constituting bodies (10) holds the substrates under the condition that front surfaces of the substrates face upward, while the other of the holder constituting bodies (10b) holds the substrates under the condition that back surfaces of the substrates face upward. The substrate (w) with the front surface facing upward and the substrate with the back surface facing upward are alternately arranged in a vertical direction.

An industrial plant for drying and / or conditioning (1) flexible laminar surfaces comprising an operating tunnel (2) mainly developing according to a linear direction (Z) and provided with air conditioning devices (3) and / or traction organs suitable to act on the flexible laminar surfaces so as to dry them and / or spread them according to predetermined treatment and / or tensioning cycles, a plurality of support frames (4), each of which suitable to receive at least one of the flexible laminar surfaces so as to keep it in a spread and vertical position, moving means (5), operatively connected with the support frames (4) in order to convey them along the linear direction (Z) according to a predefined speed within the operative tunnel (2), to allow drying and / or tensioning of the flexible laminar surfaces, and outside the operative tunnel (2) to allow discharging of the flexible laminar surfaces dried and / or tensioned in a working cycle and loading of the flexible laminar surfaces to be dried and / or tensioned in the following processing cycle. In particular, the industrial drying plant comprises a buffer loading station (6), arranged upstream the operative tunnel (2) with which it communicates, suitable to integrally receive a pre-established group (7) of the support frames (4) before the pre-established group (7) itself of support frames (4) is transferred in bulk within the operative tunnel (2) by the moving means (5), in such a way that the support frames (4) of the pre-established group (7) simultaneously reach the inside of the operating tunnel (2) and the flexible laminar surfaces supported by the support frames (4) of the pre-established group (7) are simultaneously subjected to the processing of the air conditioning devices.

A baffle plate, provided in a processing chamber for processing a substrate therein such that the baffle plate is disposed around a mounting table for mounting the substrate thereon, has a plurality of gas exhaust holes, through which a gas is exhausted from the processing chamber. The baffle plate has a stacked structure including a plurality of plate-shaped members. The baffle plate includes a pressure adjustment gas supply passageway to supply a pressure adjustment gas for adjusting a pressure in the processing chamber.

The invention provides efficient nitrogen and phosphorus removalaeration biological filter integrated equipment which comprises a sewage inlet pipe and a machine room; the end, away from a water collecting pipe network, of the sewage inlet pipe is communicated with an integrated grating pool, a water outlet of the integrated grating pool is communicated with an overflow pipe, and the right side ofthe bottom of an inner cavity of the integrated grating pool is in bolted connection with a first submersible sewage pump; a water outlet of the first submersible sewage pump is communicated with a water inlet pipe, and the end, away from the integrated grating pool, of the water inlet pipe is communicated with an integrated sewage treatment pool. A driving source is provided through an air blower, and then sewage in the integrated sewage treatment tank can be subjected to aeration treatment through cooperation of an aeration pipe, a backwashing main pipe, an aeration main pipe, aeration branch pipes and single-hole membrane aerators, so that the contact area between sewage particles and microorganism molecules is increased, so that the reaction rate between sewage and microorganisms is enhanced; a stainless steel filter screen, bamboo charcoal activated carbon and ceramsite are matched with one another, and accordingly, the sewage can be subjected to graded filtration and adsorption.

A substrate support assembly arranged in a chamber includes a support plate including a first surface on which a substrate is seated; a driver configured to tilt the support plate such that the firstsurface is inclined with respect to a reference surface by a lower inclination angle; and a controller configured to control the driver such that the lower inclination angle is adjusted based on an upper inclination angle formed by the inclination of the gas supplier coupled to the upper surface of the chamber with respect to the reference surface.

The invention discloses a method for controlling rock slope collapse by utilizing microbial film and MICP technology, and belongs to the technical field of collapse prevention and control. In the present invention, a number of grouting pipes and grouting pipes are first inserted along the extension direction of rock mass fissures, and then grouting is carried out with the bacterial solution containing flocculent biofilm, and the grouting pipes and grouting pipes are removed after the grouting is completed. And seal the grouting port and the grouting port with cement mortar. The invention greatly reduces the construction cost by introducing microbial film and circulating grouting, and improves the uniformity of crack surface treatment by introducing dredging liquid.

The invention relates to a yarn hanging device, which is characterized in that the device comprises a hollow column, more than one layer of hollow beams communicated with the hollow column are correspondingly arranged on the two sides of the hollow column, a plurality of extension bars communicated with the hollow beam are arranged on each hollow beam at intervals and a plurality of holes are arranged on each extension bar; and the external ends of the hollow beams on each side are connected into a whole body through one same support column, the bottom part of the support column and the bottom part of the hollow column are connected with a yarn frame chassis with meshes, and a pipeline connector is arranged at the end of the hollow column. The invention has the advantages that the labor intensity in process of yarn hanging is low, the fiber treatment evenness is high, the treated fiber is smooth and straight, and the device can be widely used in the processing field of all kinds of phloem fiber and can also be used for yarn treatment such as yarn dyeing, bleaching, softening, washing and the like.

The invention discloses a plasma processing system with an airflow limiting mechanism, and belongs to the technical field of plasma processing. The plasma processing system comprises an outer frame, electrode plates, gas transmission pipelines, a vacuumizing system and material placement fixtures. The electrode plates, the material placement fixtures and vent holes in the gas transmission pipelines are positioned in a vacuum cavity body formed by the outer frame. Each material placement fixture has a frame-shaped structure, and is positioned between two opposite electrode plates. The gas transmission pipelines are positioned between the material placement fixtures and the electrode plates, and the vent holes of the gas transmission pipelines are opposite to frames of the material placement fixtures. The invention also discloses a plasma processing method. By the plasma processing system with the airflow limiting mechanism, a gas is uniformly distributed between the electrode plates, and is completely ionized to generate uniform a plasma gas, and a processed sample is subjected to plasma processing. The processed sample can be subjected to uniform plasma processing, so that the problem of non-uniformity of the plasma processing is solved, and plasma processing efficiency also can be improved.

The invention discloses an airflow balancing assembly, a chamber device and a substrate processing device. The airflow balancing assembly comprises a first annular plate and a second annular plate, wherein the first annular plate is provided with a first opening; a plurality of through holes are formed in the first annular plate; the second annular plate is provided with a second opening and is arranged on the first annular plate in an adjustable manner for partially shielding the plurality of the through holes in the first annular plate; the radial width of the second annular plate is changed along the circumferential direction of the second annular plate, so that the areas of the plurality of the through holes shielded by the second annular plate are changed along the circumferential direction of the first annular plate. The air balancing assembly provided by the embodiment of the invention is beneficial to improving the air distribution uniformity, and can improve the processing uniformity of the substrate. Besides, the airflow balancing assembly with the structure has a simple structure, is easy to manufacture, and low in cost. Besides, the adjustment can be flexibly implemented for different chamber structures, processes or chamber pressures.

A semiconductor substrate processing apparatus can supply RF powers having the same frequency to upper and lower electrodes serving to generate different degrees of uniformity, and control a power ratio of the RF powers, thereby enhancing a processing uniformity of a semiconductor substrate. The apparatus includes a vacuum chamber to receive a semiconductor substrate, upper and lower electrodes disposed within the vacuum chamber, RF power suppliers to supply RF powers having the same frequency to the upper and lower electrodes, and a controller to control a power ratio of the RF powers supplied from the RF power suppliers to the upper and lower electrodes.

The present invention provides a method of manufacturing a semiconductor device and a substrate processing apparatus, and its technical subject is to improve the uniformity of processing for each substrate. The manufacturing method of a semiconductor device has: a step of operating a processing device based on a first processing setting to process a substrate; a step of acquiring device data of the processing device during processing; a step of generating first evaluation data of the processing device; a step of determining a recipe item executable in the processing device based on the first evaluation data; and a step of reporting the recipe item.

The invention discloses a test device and a test method compounding an EKG (electrokinetic geosynthetics) electro-osmosis method with a direct-discharge type vacuum pre-loading combination method. The device comprises an organic glass model slot, wherein holes are formed in the side wall of the model slot, and the holes are sealed by use of rubber plugs; micro pH meters are connected to a conductive plastic water draining board through guide wires and then are connected to a power supply through the rubber plugs; the water draining board is fixed to the inner surface of the bottom of the model slot; the water draining board is connected to a water draining main tube through a plate tube connector; the water draining main tube is sequentially connected to a vacuum tube and a suction flask; the suction flask is arranged on an electronic scale; the suction flask is connected to the vacuum pump; and a water pump controller is connected to the vacuum pump. According to the test device, a soil body is treated by combining an electrode transition cathode direct-discharge vacuum-electro-osmosis method with a no-transition electrode two-sided water-discharge vacuum-electro-osmosis method, so that the pH value changes, the voltage changes and the sedimentation changes in the soil body can be accurately monitored, and therefore, the condition that vacuum pre-loading and electro-osmosis are restrained with each other at an anode according to the conventional vacuum-electro-osmosis method is relieved, the test efficiency is improved, the soil body reinforcing effect is improved, and the reinforced soft soil foundation has relatively high bearing capacity.

The invention discloses a water treatment device based on a mechanism of a photocatalysis reaction of nano-crystalline titanium dioxide fiber. The water treatment device comprises photocatalysis reactors of the nanocrystalline titanium dioxide fiber, a water storage tank, a water pump, a first valve, a second valve, a flow meter, a spraying and aerating head, a water outlet pipe and a connecting pipe. The water treatment device has the advantages that multiple stages of square body type reactors are stacked together to realize equal-path parallel circulating water treatment, the number of thereactors can be conveniently increased and reduced, the efficiency of a photocatalysis circulating water treatment is high due to the adoption of a parallel mechanism, and the continuity is strong; ultraviolet lamps are horizontally placed above the reactors and parabola-shaped lampshades are adopted, so that light can be vertically incident into liquid levels to the maximal extent; as parallel clapboards are arranged, the flow rates of water flows in the reactions are obviously reduced, breakage and loss of the fiber, which are caused by overlarge impact of the water flows, are effectively avoided, and the strokes of the water flows in different time segments are uniform; and the water treatment device can be applied to large-flow dynamic continuous water treatment, makes large-scale treatment of industrial wastewater containing organic pollutants possible, has a simple structure, requires a low cost and has a broad prospect.

Systems and methods for using a transformer to achieve uniformity in substrate processing are described. One of the systems includes a primary winding having a first end and a second end. The first end is coupled to an output of an impedance matching circuit, and the second end is coupled to a capacitor. The system also includes a secondary winding associated with the primary winding, and the secondary winding is coupled to a first end and a second end of a transformer coupled plasma (TCP) coil of the plasma chamber. The primary winding receives a modified radio frequency (RF) signal from the impedance matching circuit to generate a magnetic flux to induce a voltage in the secondary winding. An RF signal generated by the voltage is transmitted from the secondary winding to the TCP coil.