A second-order purification device and purification process for
ultrapure water. The device includes a first-
order system and a second-
order system connected in sequence. The first-
order system treats primary pure water to obtain secondary pure water, including a
desalination unit, a first
hybrid photolysis absorber, and a degassing unit. The second-order
system treats secondary pure water to obtain
ultrapure water, including a membrane absorber, a second
hybrid photolysis absorber, and a degassing
ultrafiltration unit. The first
hybrid photolysis absorber has a first photolysis zone and a first treatment zone downstream thereof, and the
radiation dose in the first photolysis zone is 300-800 mJ / cm<supgt;2< / supgt>. The membrane absorber includes a
hydrogen dissolution membrane and a
hydrogen supply pipeline, and provides hydrogenated water for the second hybrid photolysis absorber downstream. The second hybrid photolysis absorber has a second photolysis zone and a second treatment zone downstream thereof, and the
radiation dose in the second photolysis zone is 200-900 mJ / cm<supgt;2< / supgt>. The present invention effectively realizes the comprehensive control of various indexes of
ultrapure water, and provides guarantee for the nano-
semiconductor manufacturing process and
processing quality.