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197 results about "Pressure sensitive film" patented technology

Fujifilm's Prescale Film is a single-use, pressure sensitive film that measures pressure ranging from 0.05 to 300 Mpa (about 7 to 43,500 psi) through peak pressure snapshots. It captures a pressure profile via a color scale and reveals pressure distribution.

Silicon-glass-silicon structure surface acoustic wave temperature and pressure integrated sensor and preparation thereof

The invention provides a silicon-glass-silicon structure surface acoustic wave temperature and pressure integrated sensor and preparation thereof, and relates to a sensor. The sensor has a silicon-glass-silicon sandwich structure. A pressure sensor is integrated on a silicon-based pressure-sensitive film of the upper layer. A temperature sensor is integrated on a silicon substrate of the bottom part. The silicon substrate and the upper layer are isolated by a glass framework. The manufacturing method comprises the steps that the silicon substrate is prepared; the silicon-based pressure-sensitive film is prepared; a sandwich structure cavity is formed by the silicon substrate, the silicon-based pressure-sensitive film and the glass framework through bonding; the substrate layer of an SOI wafer is etched with the buried silicon oxide layer in the SOI wafer acting as a corrosion auto-stop layer so that the device layer of the SOI wafer is remained to act as the silicon-based pressure-sensitive film of the pressure sensor; four electrode regions are formed on the silicon-based pressure-sensitive film through etching, and the etching regions are arranged above the electrode regions of the temperature sensor and the pressure sensor with the bonding interface of the glass framework and the silicon-based pressure-sensitive film and the inlaid electrodes in the silicon-based pressure-sensitive film acting as the etching stop layer respectively; and array devices are split and then single devices are obtained.
Owner:厦门纵能电子科技有限公司

Piezoelectric excitation pulled silicon micro-resonant pressure sensor chip and preparation method thereof

The invention provides a piezoelectric excitation pulled silicon micro-resonant pressure sensor chip and a preparation method thereof. The pressure sensor chip mainly comprises a sealed glass cover, aresonator layer, a pressure sensitive film layer, a stress isolation pad, a piezoelectric excitation element and a resistance vibration pick-up element. A composite structure of a pressure sensitivediaphragm and a resonator is adopted. For a second sensitive mode, the resonator layer comprises a resonant beam and a torsion beam. An extension part at one end of two adjacent resonant beams is connected to the same suspended torsion beam, and the other end is connected to a mass block. A coupling beam is arranged in the middle of the mass block. The resonator is connected to an anchor point through a connection point. A pressure guide hole is formed in the stress isolation pad, and the pressure is delivered to the rectangular pressure sensitive diaphragm under the guidance of the pressure guide hole to cause deformation. The deformation is amplified by the anchor point, and delivered to the resonator layer. Piezoelectric actuators and resistive vibration pick-up elements are respectively arranged on the outer surface of the resonant beam and the coupling beam. The piezoelectric actuators and the resistive vibration pick-up elements are connected with an external circuit through leads respectively.
Owner:XI AN JIAOTONG UNIV

SOI (silicon on insulator) pressure sensor with self- temperature drift compensation

The invention relates to an SOI (silicon on insulator) pressure sensor with self- temperature drift compensation, which comprises an SOI substrate, wherein the SOI substrate is provided with a bridge resistance configured into a wheatstone bridge; the surface of the bridge resistance, corresponding to the SOI substrate, is provided with a compensating resistance for carrying out temperature compensation on the wheatstone bridge; leads electrically connected mutually are arranged on the compensating resistance and the bridge resistance; the bridge resistance is separated from the compensating resistance through an isolation layer and a passivation layer; the isolation layer is covered on the SOI substrate; the passivation layer is covered on the isolation layer; the other side of the SOI substrate, corresponding to the side on which the bridge resistance is arranged, is etched to form a pressure cavity and a pressure sensitive film; and the pressure cavity and the pressure sensitive film are located right below the bridge resistance. The SOI pressure sensor with self- temperature drift compensation has a compact structure, realizes self- temperature drift compensation, has reduced cost, high stability, good consistency, wide application range, is suitable for batch production, and is safe and reliable.
Owner:无锡芯感智半导体有限公司

Quasi-differential-capacitor type MEMS pressure sensor and manufacturing method thereof

The invention discloses a quasi-differential-capacitor type MEMS pressure sensor and a manufacturing method thereof. The quasi-differential-capacitor type MEMS pressure sensor comprises a first lower electrode (3a), a second lower electrode (3b), a first upper electrode (4a), and a second upper electrode (4b), wherein the first upper electrode (4a) and the second upper electrode (4b) are supported corresponding above the first lower electrode (3a) and the second lower electrode (3b). The first upper electrode (4a) is a pressure sensitive film. A cavity formed between the first upper electrode (4a) and the first lower electrode (3a) is a sealed cavity (9a), so that the first upper electrode (4a) and the first lower electrode (3a) form an air-pressure-sensitive capacitor and the second upper electrode (4b) and the second lower electrode (3b) form a reference capacitor with the electric capacity not changing with the external air pressure. According to the invention, with the pressure capacitor, a common-mode interference signal in an output signal of the air-pressure-sensitive capacitor can be at least filtered partially, thereby improving the stability and resolution of the output signal of the air-pressure-sensitive capacitor.
Owner:GOERTEK MICROELECTRONICS CO LTD

Thinned flexible pressure sensor sensitive unit based on flatfish type electrode structure

The invention relates to a thinned flexible pressure sensor sensitive unit based on a flatfish type electrode structure, belonging to the technical field of sensors. The sensitive unit comprises a top packaging film, a bottom packaging film and a pressure-sensitive film arranged in the middle, wherein the top packaging film is made of polyimide material, the pressure-sensitive film is made of nano conductive polymer composite material, the bottom packaging film is a polyimide film with a pair of electrodes/leads, the two electrodes/leads are both arranged at the same side of the pressure-sensitive film so as to form a flatfish type electrode structure. The pressure-sensitive unit developed by using the method provided by the invention has the advantages of slight thickness, simple structure, low cost and the like; moreover, since signals are led out from the same side of a sensitive material, time dependence of the pressure-sensitive unit during signal output is reduced, and adverse effect of time dependence on the measurement accuracy is reduced further; therefore, the sensitive unit is especially applicable to the fields of interlayer pressure monitoring of narrow and small curved surfaces of national defense and industrial equipment, artificial electronic skin research and development and the like.
Owner:NORTHEASTERN UNIV

Built-in high-temperature wireless pressure sensor

The invention relates to a pressure sensor, in particular to a built-in high-temperature wireless pressure sensor. The built-in high-temperature wireless pressure sensor is provided with a pressure sensitive film, a sensor upper covering plate, a capacitor upper counter electrode, a capacitor lower counter electrode, an inductance coil, a sensor base and a pressure reference cavity, wherein a square groove is formed in the sensor upper covering plate to form the pressure sensitive film, the capacitor upper counter electrode is manufactured on the back surface of the sensor upper covering plate, a groove shaped like a Chinese character 'hui' is formed in the sensor base, the capacitor lower counter electrode and the inductance coil are manufactured on the sensor base, the upper surface of the capacitor lower counter electrode is flush with the upper surface of the inductance coil, and the inductance coil is manufactured in the groove shaped like the Chinese character 'hui'. The capacitor upper counter electrode, the capacitor lower counter electrode and the inductance coil are all made of silicon doped with metal, the capacitor upper counter electrode and the capacitor lower counter electrode form a parallel plate capacitor, the capacitor upper counter electrode and the inductance coil lead out wires at the upper layer and wires at the lower layer respectively, the sensor upper covering plate and the sensor base are bonded, the wires at the upper layer make tight contact with the wires at the lower layer, the capacitor upper counter electrode, the inductance coil and the capacitor lower counter electrode are connected in series to form a standard RLC loop, and the pressure reference cavity is formed.
Owner:XIAMEN UNIV

Surface acoustic wave high-temperature pressure sensor chip based on silicon wafer and piezoelectric thin film and preparation method of surface acoustic wave high-temperature pressure sensor chip

The present invention provides a surface acoustic wave high-temperature pressure sensor chip based on a silicon wafer and a piezoelectric thin film and a preparation method of the surface acoustic wave high-temperature pressure sensor chip. The surface acoustic wave high-temperature pressure sensor chip comprises a silicon wafer chip substrate; the silicon wafer chip substrate includes a first surface and a second surface; a chamber is disposed inside the silicon wafer chip substrate; an opening at the second surface of the silicon wafer chip substrate is formed in the chamber, or the chamberis sealed by a second chip substrate bonded on the silicon wafer chip substrate so as to form a sealed chamber; the silicon wafer chip substrate above the chamber is a pressure-sensitive film; the piezoelectric thin film is formed on the pressure-sensitive film; and an interdigital transducer and a reflection grid are formed on the piezoelectric thin film. The surface acoustic wave high-temperature pressure sensor chip based on the silicon wafer and the piezoelectric thin film is small in size, can realize wireless receiving and transmitting when working at a radio frequency band, is flexiblein measurement mode and has a great potential application in the high-temperature pressure measurement field.
Owner:CHONGQING UNIV

Resonant pressure sensor based on piezoresistive detection and preparation method thereof

The invention relates to a resonant pressure sensor based on piezoresistive detection and a preparation method thereof. The resonant pressure sensor comprises a pressure sensitive film, a resonator located on the pressure sensitive film and six anchor points, wherein the resonator comprises a double-end fixed support beam and two driving electrodes arranged on the two sides of the double-end fixedsupport beam, wherein the double-end fixed support beam comprises two end parts and two single beams connected to the two end parts; etching is carried out on root regions of the two single beams symmetrically; body pressure resistance is formed at the root parts of the two single beams; the same three-electrode structures are arranged at the two end parts, one three-electrode structure is suspended, and the other three-electrode structure takes an electrode in the middle position as a grounding end and the electrodes at the two sides as detection electrodes; the six anchor points are arranged under the two three-electrode structures respectively; and the double-end fixed support beam is fixedly supported on the pressure sensitive film. According to the resonant pressure sensor and the preparation method, a piezoresistive detection and resonator tuning fork vibration mode is adopted, so that the output signal strength is improved, and the anti-interference capability and the stabilityare enhanced.
Owner:INST OF ELECTRONICS CHINESE ACAD OF SCI

Flexible multi-range capacitive-type pressure sensor and preparation method and application thereof

The invention belongs to the field of pressure sensor design and manufacturing, and specifically discloses a flexible multi-range capacitive-type pressure sensor and a preparation method and an application thereof. The sensor comprises a flexible substrate, a multi-stage support island and a pressure sensitive film, which are sequentially arranged from bottom to top. The multi-stage support islandis composed of a central circular boss located at the middle of the pressure sensitive film, and n-stage annular bosses which are disposed on the pressure sensitive film and are concentrically arranged with the central circular boss. A top electrode is disposed between the central circular boss and the pressure sensitive film, and the heights of the n-stage annular bosses sequentially increase from the inside to the outside, wherein the outermost annular boss is attached to the flexible substrate. The bottom portion of the flexible substrate is provided with a bottom electrode directly belowthe central circular boss. The sensor provided by the invention has a wide range of pressure measurement while maintaining high sensitivity, and solves the contradiction between the range and sensitivity of the pressure sensor, and can meet the requirements of the pressure range and sensitivity of different wind tunnel tests.
Owner:HUAZHONG UNIV OF SCI & TECH

Differential silicon micro-resonant pressure sensor based on electrostatic excitation piezoresistance detection

The invention discloses a differential silicon micro-resonance type pressure sensor based on electrostatic excitation piezoresistance detection. The differential silicon micro-resonance type pressuresensor comprises a resonance beam, a coupling beam, a vibration pickup beam, a fixed electrode, a movable electrode, a mass block, a movable anchor point, a fixed anchor point and a silicon island, wherein the movable anchor point is fixedly connected with the pressure sensitive film through using the silicon island; when the pressure sensitive film is deformed by a load, the movable anchor pointconnected with the pressure sensitive film is driven, then the movable anchor point drives the resonance beam to deform, such that the internal stress of the resonance beam is changed, the vibration frequency of the resonator is changed, the vibration frequency of the resonance beam is measured by means of a piezoresistor on the vibration pickup beam, and the vibration pickup beam and the couplingbeam adopt a special design method, so that the vibration pickup beam generates straight pulling and straight pressing acting force when the resonator is in a working mode, and the amplitude of the resonance beam can be linearly output through using a Wheatstone bridge.
Owner:XI AN JIAOTONG UNIV
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