33results about How to "Eliminate the annealing process" patented technology

The invention relates to a laser strengthening process of a piercing plug. The laser strengthening process is characterized by firstly carrying out laser cladding on a transition alloy layer on the surface of a piercing plug matrix and then carrying out laser cladding on the high-strength alloy layer on the transition alloy layer, wherein the alloy powder adopted by the transition alloy layer is the nickel base alloy; the alloy powder adopted by the high-strength alloy layer is the cobalt base alloy. The laser strengthening process has the advantages that the transition alloy layer in the process has lower hardness than the high-strength alloy layer, plays a role in transition for the high-strength alloy layer with high hardness and high wear resistance and can well relieve the surfacing stress, so that even if the plug is not preheated or annealed, the residual surfacing stress can not have great impacts on the tissues of a laser cladding layer, thus effectively avoiding impacting the properties of the cladding layer by annealing, substantially improving the surface hardness and wear resistance of the piercing plug, simultaneously omitting the processes of preheating and annealing and also improving the production efficiency.

The invention relates to a laser strengthening process of a piercing plug. The laser strengthening process is characterized by firstly carrying out laser cladding on a transition alloy layer on the surface of a piercing plug matrix and then carrying out laser cladding on a high-strength alloy layer on the transition alloy layer, wherein the alloy powder adopted by the transition alloy layer is the nickel base alloy; the alloy powder adopted by the high-strength alloy layer is the cobalt base alloy. The laser strengthening process has the advantages that the transition alloy layer in the process has lower hardness than the high-strength alloy layer, plays a role in transition for the high-strength alloy layer with high hardness and high wear resistance and can well relieve the surfacing stress, so that even if the plug is not preheated or annealed, the residual surfacing stress can not have great impacts on the tissues of a laser cladding layer, thus effectively avoiding impacting the properties of the cladding layer by annealing, substantially improving the surface hardness and wear resistance of the piercing plug, simultaneously omitting the processes of preheating and annealing and also improving the production efficiency.

The invention relates to a laser strengthening process of a piercing plug. The laser strengthening process is characterized by firstly carrying out laser cladding on a transition alloy layer on the surface of a piercing plug matrix and then carrying out laser cladding on the high-strength alloy layer on the transition alloy layer, wherein the alloy powder adopted by the transition alloy layer is the nickel base alloy; the alloy powder adopted by the high-strength alloy layer is the cobalt base alloy. The laser strengthening process has the advantages that the transition alloy layer in the process has lower hardness than the high-strength alloy layer, plays a role in transition for the high-strength alloy layer with high hardness and high wear resistance and can well relieve the surfacing stress, so that even if the plug is not preheated or annealed, the residual surfacing stress can not have great impacts on the tissues of a laser cladding layer, thus effectively avoiding impacting the properties of the cladding layer by annealing, substantially improving the surface hardness and wear resistance of the piercing plug, simultaneously omitting the processes of preheating and annealing and also improving the production efficiency.

Production of medium-carbon steel deformation induced ferrite by excess precipitation is carried out by heating medium-carbon steel deformation at 1190-1230degree, 1-body frame first pressing by high-speed wire-rod production line, 12-body frame medium pressing and 4 / 8 body frame pre-fine pressing, controlled cooling at 0.2-15degree / s, fast phase changing at 660-700degree, isothermal or slow-cooling treating and naturally cooling to normal temperature. Accumulation draft is 50-80%, deformation speed-ration is 10-30 / s, precipitation content reaches to 60-65%. It saves energy resources and has less environmental pollution.

A manufacturing method of a stress NMOS device comprises the followings: semiconductor substrates with grid structures are offered; a source electrode and a drain electrode are formed in the semiconductor substrates at two sides of the grid structures; wherein after the grid structures are formed and before the source electrode and the drain electrode are formed, or after the source electrode andthe drain electrode are formed, the method further comprises the following steps: ions are implanted, and carbon impurities are doped in the semiconductor substrates at two side of the grid structures; solid phase epitaxy process is carried out to facilitate the carbon impurities react with silicon to form a strain silicon carbide layer. The invention also provides a manufacturing method of the stress CMOS device. Carbon in the strain silicon carbide layer in the stress MOS device formed by the invention has comparatively high content, the stress applied to an NMOS conducting channel by an epitaxial layer of a silicon carbide material is greatly increased; the mobility of carriers can be effectively improved, thus enlarging the drive current and improving the performance of the NMOS device.

The invention relates to an amorphous nanocrystalline magnetically soft alloy and a preparation method of the magnetically soft alloy. The amorphous nanocrystalline magnetically soft alloy comprises the following chemical components in percentage by atom: 39-44 of Fe, 39-44 of Co, 0-4 of Al, 0.6-1.5 of Mo, 5.5-7.4 of Zr, 3.6-5.5 of B and 0.5-1.4 of Cu. Compared with traditional iron-based amorphous, nanocrystalline magnetically soft alloys and the like, the amorphous nanocrystalline magnetically soft alloy has the advantages that a precious metal Nb is replaced by cheap Al, and simultaneously, a part of precious metal B is replaced by cheap Zr; an amorphous nanocrystalline ribbon in a quenching state is obtained by particularly adjusting the chemical components and optimizing a belt technology; a complicated annealing process is omitted, and the cost of amorphous nanocrystalline soft magnetic material is greatly reduced. The amorphous nanocrystalline magnetically soft alloy is simple in technology, low in cost and easy to industrialize; the obtained product has high saturation induction intensity, so that the magnetically soft alloy can be used for national defense and civilian industry products such as a distribution transformer, a motor magnetic core and a high-power switching power supply.

The invention provides an array substrate and a preparation method thereof. Through the array substrate, compared with the prior art, by forming a drain pattern layer in contact with the other end ofan active layer, and then forming a pixel electrode layer in contact with the drain pattern layer, conduction between the pixel electrode layer and the other end of the active layer is realized, in the embodiment, a pixel electrode layer in direct contact with the other end of the active layer is formed, the is, the drain pattern layer and the pixel electrode layer in the prior art are prepared atone time, As the contact resistance generate by the contact between the drain pattern layer and the pixel electrode lay in the prior art is avoided, the electrical conductivity is improved, and an annealing process carried out to increase the good contact between the drain pattern layer and the pixel electrode layer is omitted, thereby simplifying the process steps.

The invention relates to a high-sulfur alloy steel roll and a production method. The high-sulfur alloy steel roll comprises the following chemical components by weight percent: 0.4%-1.0% of C, 0.5%-1% of Si, 0.5%-1% of Mn, 1.5%-10% of S, less than 0.05% of P, 4%-6% of Cr, 0.05%-1.5% of V, 0.1%-0.4% of Mo, less than 2% of W, 0.05%-0.1% of Ti, 0.005%-0.1% of Ba, less than 0.05% of Re, and the balance of Fe. The acknowledged rule that sulfur cannot exceed 0.03% is broken by the high-sulfur alloy steel roll; harmful elements are converted into beneficial elements; the produced high-sulfur alloy steel roll has the advantages of high-temperature resistance, self-lubricating property, abrasion resistance, and the like; no lubrication or less lubrication is required by the roll during application process, so that the working strength of workers is relieved; the rare metal Co is not contained, so that the production cost is lowered; an intermediate frequency furnace is used for melting; a horizontal centrifuge is used for pouring; a common high-temperature resistance furnace is used for performing thermal treatment; the equipment investment is less; the processing technology is free from annealing process; the production technology is simple and reasonable; and the production efficiency is greatly increased.

In the manufacturing method of the MOS device provided by the present invention, by forming a first spacer layer, the first spacer layer covers the first gate structure, the second gate structure and the semiconductor substrate; performing an ion implantation process on the semiconductor substrate to form an ion implantation region; removing the first sidewall layer on the semiconductor substrate in the core device region to expose part of the semiconductor substrate; An epitaxial silicon layer is formed on the semiconductor substrate, heat is generated during the growth process of the epitaxial silicon layer, and ions in the ion implantation area can diffuse to the semiconductor substrate outside the ion implantation area. Therefore, the annealing process can be replaced, thereby suppressing the hot carrier injection effect and improving the performance of the device. In addition, because the subsequent annealing process is omitted, processing time can be saved.

The invention discloses a high-strength corrosion resistant high-tenacity steel which is used for mooring chain and a production process hereof; the chemical components (wt percent) are: 0.18 percent to 0.25 percent of C, 0.10 percent to 0.35 percent of Si, 1.40 percent to 1.80 percent of Mn, 0.80 percent to 1.40 percent of Cr, 0.60 percent to 1.20 percent of Ni, 0.40 percent to 0.70 percent of Mo, 0.02 percent to 0.06 percent of Nb, 0.02 percent to 0.06 percent of Al, S which is less than or equal to 0.010 percent, P which is less than or equal to 0.020 percent, B which is less than or equal to 0.005 percent, Cu which is less than or equal to 0.20 percent, Sb which is less than or equal to 0.010 percent, Sn which is less than or equal to 0.03 percent, As is less than or equal to 0.04 percent, [O] which is less than or equal to 0.0018 percent, [N] which is less than or equal to 0.0060 percent and the rest is Fe. The invention avoid producing martensite tissue with optimized design of components and in this way the material tissue can not be converted to produce central crack in a long-term placement under the situation that the parent metal does not adopt annealing process; at the same time the precious metal Ni is saved. The invention adopts RH / VD for desaeration and removing impurities and in this way, the purity of the steel can be obviously increased; the invention adopts converter for melting which reduces the energy consumption and saves cost.