35results about How to "Guaranteed to flow through" patented technology

A spacer (1) for a battery, said spacer comprising a frame (11), a wall (12) and at least one protruding element (13), wherein the wall (12) is disposed at least partially within the frame (11) and wherein the protruding element (13) is disposed on at least one side of the wall (12) and protrudes from the same. Recesses are thereby provided on at least two sides (111, 112) of the frame (11), whereby a fluid can flow along the wall (12) through the frame (11).

The invention discloses a flow-in control valve which consists of a valve seat, a lower valve body, a valve core and an upper valve body, wherein the valve seat is mounted on a production pipeline; a steplike hole is formed in the valve seat; the lower valve body is embedded into the steplike hole of the valve seat; the axial position is limited by a boss; a conical hole is formed in the lower valve body; a circular hole is formed in the upper part of the upper valve body, and a curved hole is formed in the lower part of the upper valve body; the upper valve body is screwed on the valve seat in a threaded connection manner; the valve core is arranged in a space formed by the conical hole of the lower valve body and the curved hole of the upper valve body; the valve core is an entity consisting of a valve core lower conical surface, a valve core upper curved surface and valve core lower runners; the slope of the valve core lower conical surface is greater than that of the conical hole of the valve body; and the valve core lower runners are long-strip slots uniformly formed in the lower end of the valve core lower conical surface. The flow-in control valve can automatically adjust the size of a runner space of the valve according to the type of fluid and components of the fluid in a hydrocarbon reservoir, increase the flow-in amount of oil, control flow-in of water and gas and prevent water layer penetration and gas layer penetration, so that the yield and the quality of an oil product can be effectively controlled.

The invention discloses a chemical vapor deposition device which comprises a reaction chamber and a gas inlet device. A substrate tray and a rotary shaft are arranged in the reaction chamber, the substrate tray is used for supporting a plurality of substrates, the gas inlet device is arranged above a substrate bearing device and used for providing reaction gas flowing to the surfaces of the substrates, and a reaction area is formed between the gas inlet device and the substrate bearing device. A central exhaust system is arranged in the center area of the substrate bearing device. An annular edge exhaust system is arranged around the substrate bearing device. The reaction gas and side reaction gas on the surface of each substrate are exhausted out of the reaction chamber through the central exhaust system and the edge exhaust system at the same time. The thin film deposition yield and uniformity of the surfaces of the substrates can be effectively adjusted.