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Method for forming thin film

Method for forming a thin film at low temperature by using plasma pulses is disclosed. While a purge gas or a reactant purge gas activated by plasma is continuously supplied into a reactor, a source gas is supplied intermittently into the reactor during which period plasma is generated in the reactor so that the source gas and the purge gas activated by plasma reacts, so that a thin film is formed according to the method. Also, a method for forming a thin layer of film containing a plural of metallic elements, a method for forming a thin metallic film containing varied contents by amount of the metallic elements by using a supercycle Tsupercycle comprising a combination of simple gas supply cycles Tcycle, . . . , and a method for forming a thin film containing continuously varying compositions of the constituent elements by using a supercycle Tsupercycle comprising a combination of simple gas supply cycles Tcycle, . . . , are disclosed. The methods for forming thin films disclosed here allows to shorten the purge cycle duration even if the reactivity between the source gases is high, to reduce the contaminants caused by the gas remaining in the reactor, to form a thin film at low temperature even if the reactivity between the source gases is low, and also to increase the rate of thin film formation.
Owner:ASM GENITECH KOREA

Mist spraying apparatus and method, and image forming apparatus

InactiveUS20060209129A1Suppressing amount of chargeImprove the deposition effectPrintingElectricityAcceleration voltage
The mist spraying apparatus comprises: a pressure chamber into which liquid is filled; a charging electrode which is in contact with the liquid and charges the liquid; a vibration generating device which converts the liquid into droplets by applying vibrational energy to the liquid inside the liquid chamber, thereby generating a charged mist; a rear surface electrode which is disposed so as to oppose an ejection surface including an ejection port ejecting the charged mist, and holds an liquid receiving medium onto which the charged mist is deposited from the ejection port; an acceleration electrode which is disposed at a position separated by a prescribed distance in an outward radial direction from an edge of the ejection port, and generates an electric field for acceleration between the acceleration electrode and the opposing rear surface electrode; a charging voltage application device which applies a charging voltage to the charging electrode; and an acceleration voltage application device which applies an acceleration voltage that is higher than the charging voltage to the acceleration electrode, thereby generating, between the acceleration electrode and the rear surface electrode, the electric field for acceleration having an electric field intensity which is greater than an electric field intensity generated between the charging electrode and the rear surface electrode by the voltage applied from the charging voltage application device.
Owner:FUJIFILM CORP
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