Provided is a photosensitive
conductive paste which is capable of suppressing / preventing the occurrence of
delamination between a conductor layer and an insulating layer even in cases where this photosensitive
conductive paste is used for the formation of the conductor layer if a multilayer
electronic component having a conductor layer and an internal conductor layer is produced by an integral firing process, and which enables fine patterning. This photosensitive
conductive paste contains (a) a conductive
powder in an amount of from 70.3% by
mass to 85.6% by
mass (inclusive) of the total
mass of the paste, (b) a photosensitive resin composition containing an alkali-
soluble polymer, a photosensitive
monomer, a photopolymerization initiator and a
solvent, and (c) a glass
frit, and this photosensitive conductive paste is configured so as to satisfy such requirements that the
mass ratio of the glass
frit to the conductive paste, namely (glass
frit / conductive paste) is from 0.020 to 0.054 (inclusive) and the
softening point of the glass frit is not lower than the
sintering initiation temperature of the conductive
powder. As the glass frit, one having a
softening point of 560 DEG C or more is used.