The invention refers to a photometric
process measurement arrangement (10) with a photometric immersion probe (20). The photometric immersion probe (20) comprises a
photometer flashlight source (61) for providing photometric light impulses, a photometric
detector arrangement (70) comprising at least two separate
wavelength-selective detection elements (71, 72, 73), and a
photometer control (80) controlling the
photometer flashlight source (61) and the
detector arrangement (70). The photometer control (80) comprises several impulse
signal integrators (819, 829, 839) for integrating the electric impulses generated by the detection elements (71, 72, 73), several A / D-
converters (81, 82, 83) for converting the voltages of the impulse
signal integrators (819, 829, 839) when high-precision-converting trigger ports (H) of the A / D-
converters (81, 82, 83) are triggered, and a measuring
cycle control (90) with an integration target memory (94) memorizing an integration target
voltage value (Ut). The photometer control (80) is provided with a high-precision-request port (93) for synchronously triggering the high-precision-converting trigger ports (H) of all A / D-
converters (81, 82, 83) after the
voltage of the first of all impulse
signal integrators (819, 829, 839) has exceeded the memorized integration target
voltage value (Ut).