40results about How to "Achieving Measurement Accuracy" patented technology

The present invention relates to a device (10), a method and an application thereof for optically measuring the surface of a tested product (5), especially a PCB-product for reflow soldering paste inspection. The device comprises at least one white light source (1) for emitting a beam of white light, at least one collimation unit (4) for collimating said beam of white light (30), at least one spectrometer unit, preferably an optical prism (2) or an optical diffraction grading (51), for splitting said beam of white light (30) into a beam of multichromatic light (31) being directed onto said tested product (5) under a predetermined incident angle γ, and at least one camera (3) for recording a reflected beam of monochromatic light (32) of said tested product (5). Z-axis surface height information of said tested product (5) can be extracted from a hue value of said reflected beam of mono chromatic light (32) while relatively moving said tested product (5) in a x-axis scanning direction (9).

The invention relates to a measuring device for measuring the magnetic properties of the surroundings of the measuring device by means of a sensor line having at least one magnetoresistive sensor element extending in a line direction, which can measure the magnetic properties in the surroundings thereof, wherein the sensor element has a width and a length as well as a height, wherein the height is smaller than the width, and the height is smaller than the length, and the line direction points in the direction of the width or in the direction of the length of the sensor element, and having a support field device which generates a magnetic support field in the area over which the sensor line extends, having a premagnetization device which comprises a premagnetization magnet or several premagnetization magnets, wherein at least one premagnetization magnet is arranged in a direction which is perpendicular to the line direction, spaced from the sensor line, and extends in a direction parallel to the line direction, characterized in that magnetoresistive sensor element can measure the magnetic properties of the surroundings thereof substantially in only one direction, referred to as the measurement direction, of an orthogonal coordinate system, or substantially in only one plane, referred to as the sensor measurement plane, which is defined by two perpendicular measurement directions of an orthogonal coordinate system, in that, in the case of a premagnetization device which consists of only one premagnetization magnet, the properties of the premagnetization magnet, which influence the magnetic field generated by said magnet and the arrangement of said magnet relative to the sensor cell as well as the support field generated by the support field device are selected in such a manner that an overlap magnetic field forms due to the overlap of the magnetic field generated by the premagnetization device and of the support field, wherein the strength of the field component of said overlap magnetic field, which points in the line direction is, at least at one site on the sensor line, greater than the strength of the field component which is perpendicular to the line direction and does not point in the direction of the height of the sensor element, or in the case of a premagnetization device consisting of several premagnetization magnets, the properties of the premagnetization magnet, which influence the magnetic field generated by said magnets, and the arrangement of the premagnetization magnets relative to the sensor cell as well as the support field generated by the support field device are selected in such a manner that an overlap magnetic field forms due to the overlap of the magnetic field generated by the premagnetization device and of the support field, wherein the strength of the field component of said overlap magnetic field, which points in the line direction is, at least at one site on the sensor line, greater than the strength of the field component which is perpendicular to the line direction and does not point in the direction of the height of the sensor element.

A piezoelectric device includes an element substrate that includes a first surface (operating surface) and a second surface (back surface) on a side opposite to the first surface, and includes a recessed opening provided on the first surface and a supporting portion surrounding the recessed opening, a piezoelectric body that is provided on the second surface of the recessed opening, a plurality of connection electrodes (lower connection electrode and upper connection electrode) that are connected to the piezoelectric body and are drawn to the second surface of the supporting portion from the piezoelectric body, a reinforcement plate that is bonded to the second surface side of the element substrate, and a plurality of through electrodes that are provided at a position of the reinforcement plate which faces the supporting portion, pass through the reinforcement plate in a thickness direction, and are respectively connected to the plurality of connection electrodes.

The invention discloses a workpiece platform system of a photoetching machine. The workpiece platform system comprises a rack, a base platform, two silicon-chip platforms, a measuring grating, a dual-frequency laser, three-freedom-degree heterodyne grating interferometers and a signal receiving and processing part, wherein the two silicon-chip platforms operate at an exposure station and a preprocessing station; the four corners of each silicon-chip platform are provided with one three-freedom-degree heterodyne grating interferometer respectively, and the measuring grating is arranged on the rack above the silicon-chip platform. Dual-frequency orthogonal-polarization laser emitted by the dual-frequency laser is transmitted to the three-freedom-degree heterodyne grating interferometers and the measuring grating by optical fiber, four beams of diffraction light of the measuring grating irradiate back to the three-freedom-degree heterodyne grating interferometers, and finally the four beams of measuring light signals are emitted to the signal receiving and processing part. When the silicon-chip platforms move relatively to the measuring grating, the reading in the signal receiving and processing part is utilized for acquiring six-freedom displacement of the silicon-chip platforms by calculation. The workpiece platform system disclosed by the invention has the advantages that the indexes such as measuring accuracy and dynamic performance of the silicon-chip platforms can be improved, and further the whole performance of the workpiece platform system is further improved.

The present invention is LCR measurement method of reception timing deviation in TD-SCDMA. LCR measurement of reception timing deviation is realized through calculating the difference between the starting time corresponding to the time slot of the user's equipment and the first received upwards multipath timing, and is used in providing the user's equipment with time preact information and location service. The starting time corresponding to the time slot is calculated with the timing GPS, the first received upwards multipath timing is obtained through processing the channel impact response peak the user's equipment receives in the time slot, and the impact response peak is extracted from the first upward time slot in the first upward frame the user's equipment receives in the time slot. The present invention can reach measurement accuracy of 1 / 8 chip.

The present application provides a method, device, device and system for detecting switching time of a power-down protection device. The method is executed by a tester, and the tester is connected to a switch. The method includes: sending a test data packet to the switch, and the switch is used to send the test data packet To the power-down protection device, the power-down protection device is used for power-down protection of the connected protected device; receiving the test data packet returned by the switch, and the switch is used to receive the test data packet returned by the power-down protection device; according to sending the test data packet to the switch The number of data packets and the number of test data packets returned by the receiving switch are used to calculate the number of packet loss; according to the packet sending rate and the number of packet loss sent by the tester to the switch, the switching time of the power-down protection device is determined, and the switching time is used for Indicates the state switching duration corresponding to the power-down protection device when the protected device switches its working state. Therefore, when the switching time of the power-down protection device is relatively long, the switching time can also be accurately detected.

The invention discloses a rotary encoder, which comprises a code disk with a ring code track, a reading head and a light source device; the ring code track includes two semicircular sub-code tracks, wherein each sub-code track is evenly distributed with The light and dark stripes of the two sub-code tracks have different widths; the number of reading heads is two, and the two reading heads are respectively set at the two ends of the diameter of the ring code track; the light source device is used to provide illumination for each reading head . In the present invention, multiple code tracks are combined on the same code track, so that one ring code track in the encoder can achieve the measurement accuracy of multiple ring code tracks in the prior art, and can meet the dual requirements of high precision and miniaturization of the encoder. need.

The invention provides an X-ray position measuring device capable of realizing high-precision position measurement without increasing the cost. The X-ray position measuring device 10 includes a first moving unit that moves the X-ray emitter 10a and the X-ray camera 10b to a position where the position measurement is performed on the measurement object; Measure the positional offset between the reference position and the position of the second X-ray projection image, and store the positional offset as a correction amount corresponding to the measurement position in the first measurement storage unit of the storage unit; The 2nd moving unit that X-ray emitter 10a and X-ray camera 10b move to the position that carries out position measurement; And the position that is used for carrying out position measurement, make the emission center of X-ray emitter 10a and X-ray according to the correction amount The optical axis of the camera 10b coincides with the first position measurement unit that simultaneously measures the position of the measurement object.

The invention mainly relates to the technical field of length measurement, and provides a step gauge calibration system based on laser interference that can eliminate Abbe errors, including: 3-way laser interference optical paths that can form any triangular prism in space, and set in space The fourth laser interference optical path used for wavelength compensation inside and parallel to the three laser interference optical paths. Part of the laser beam emitted by the laser is reflected to the interference mirror as a reference signal after passing through the beam splitter. The measurement signal is formed in the mirror, and when the measured step gauge is displaced, the displacement value of the measured step gauge that eliminates the Abbe error is obtained through the measurement signal and reference signal and calculated according to the measurement model, and the three laser light paths are synthesized into the measured step gauge. The measurement model on the step gauge measurement line, no matter where the step gauge is installed on the measuring platform of the coordinate measuring machine, can very conveniently realize the measurement accuracy of the laser interferometry step gauge based on Abbe's principle.