The utility model relates to the technical field of PVD (
Physical Vapor Deposition)
coating, in particular to a vacuum breaking device for a film outlet chamber of a vacuum
system, which comprises a
vacuum chamber, upper inflating components, lower inflating components and an inflating pipeline, a
vacuum chamber cover is arranged on the
vacuum chamber, the upper inflating components are arranged on the front, back, left and right sides of the vacuum chamber cover, and the lower inflating components are arranged on the upper inflating components. A lower inflation
assembly and an inflation pipeline are arranged at the position, opposite to the upper inflation
assembly, of the bottom wall of the vacuum cavity, and the inflation pipeline is communicated with the vacuum cavity through the upper inflation
assembly and the lower inflation assembly. According to the vacuum breaking device, the paired upper and lower air inflation assemblies are correspondingly arranged, so that the air inflation efficiency is improved, the instantaneous air
pressure difference of the vacuum chamber is reduced, and the air inflation smoothness and uniformity are improved; according to the magnetron
sputtering coating device, rapid vacuum breaking of a
wafer outlet chamber in a magnetron
sputtering coating system is achieved, meanwhile, intense
impact of
airflow on a battery piece on a carrier plate in a vacuum cavity can be eliminated, the phenomena of
silicon wafer deviation, fragmentation and the like of the battery piece on the carrier plate are avoided, and
continuous production of the magnetron
sputtering coating device is achieved.