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Storage cell, formation method of storage cell and reading method of storage cell

The invention discloses a storage cell, a formation method of the storage cell and a reading method of the storage cell. The formation method of the storage cell comprises the steps that a semiconductor substrate is provided, wherein the semiconductor substrate comprises a first bit area and a second bit area, and a first dielectric layer, a floating gate material layer and a second dielectric layer are formed on the surface of the semiconductor substrate; a first doping area is formed in the first bit area; a second doping area is formed in the second bit area, wherein the dosage concentration of the second doping area is smaller than that of the first doping area; the second dielectric layer is etched to form an opening; a side wall is formed on the surface of the side wall of the opening; the floating gate material layer and the first dielectric layer are etched with the side wall as a mask to the surface of the semiconductor substrate; a source line is formed in the opening; the second dielectric layer and the floating gate material layer and the first dielectric layer below the second dielectric layer are removed, and a floating gate and a floating gate dielectric layer below the side wall are formed; a tunneling dielectric layer is formed; a word line located on the surface of the tunneling dielectric layer is formed; a first drain area and a second drain area are formed. The formation method of the storage cell can lower the cost of a storage.
Owner:SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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