39 results about "Cyclopentadienyl complex" patented technology

Catalyst compositions comprising a first metallocene compound, a second metallocene compound, an activator-support, and an organoaluminum compound are provided. An improved method for preparing cyclopentadienyl complexes used to produce polyolefins is also provided.

Catalyst compositions comprising a first metallocene compound, a second metallocene compound, an activator-support, and an organoaluminum compound are provided. An improved method for preparing cyclopentadienyl complexes used to produce polyolefins is also provided.

Metal source containing precursor liquid solutions for chemical vapor deposition processes, including atomic layer deposition, for fabricating conformal metal-containing films on substrates are described. More specifically, the metal source precursor liquid solutions are comprised of (i) at least one metal complex selected from β-diketonates, β-ketoiminates, β-diiminates, alkyl metal, metal carbonyl, alkyl metal carbonyl, aryl metal, aryl metal carbonyl, cyclopentadienyl metal, cyclopentadienyl metal isonitrile, cyclopentadienyl metal nitrile, cyclopentadienyl metal carbonyl, metal alkoxide, metal ether alkoxide, and metal amides wherein the ligand can be monodentate, bidentate and multidentate coordinating to the metal atom and the metal is selected from group 2 to 14 elements, and (ii) a solvent selected from organic amides including linear amides and cyclic amides for such metal source containing precursors.

The invention provides a positive resist composition, wherein a polymer compound having the weight-average molecular weight in the range of 1,000 to 500,000 and comprising a repeating unit having a hydrogen atom in a carboxyl group and / or in a phenolic hydroxy group therein been substituted by an acid-labile group and a repeating unit “a” having a cyclopentadienyl complex shown by the following general formula (1) is used as a base resin therein. There can be a positive resist composition having not only small edge roughness (LER and LWR) while having a higher resolution than conventional positive resist compositions, but also a good pattern form after exposure and an extremely high etching resistance, especially a positive resist composition using a polymer compound suitable as a base resin for a chemically amplifying resist composition; and a patterning process.

The present invention describes a metal precursor solution and metal source containing precursor liquid solutions for chemical vapor deposition processes, including atomic layer deposition, for fabricating conformal metal-containing films on substrates. More specifically, the metal source precursor liquid solutions are comprised of (i) at least one metal complex selected from -diketonates, -ketoiminates, -diiminates, alkyl metal, metal carbonyl, alkyl metal carbonyl, aryl metal, aryl metal carbonyl, cyclopentadienyl metal, cyclopentadienyl metal isonitrile, cyclopentadienyl metal nitrile, cyclopentadienyl metal carbonyl, metal alkoxide, metal ether alkoxide, and metal amides wherein the ligand can be monodentate, bidentate and multidentate coordinating to the metal atom and the metal is selected from group 2 to 14 elements, and (ii) a solvent selected from organic amides including linear amides and cyclic amides for such metal source containing precursors.

Catalysts useful for polymerizing olefins are disclosed. The catalysts comprise an activator and a bridged cyclopentadienyl complex that incorporates a monoanionic hydroxylamido or hydrazido ligand fragment. Suitable complexes have the structure:wherein M is a Group 4 metal; Z is a divalent linking group; X is N or O; each of R1 and R2 is independently C1-C4 alkyl or C6-C10 aryl; R1 and R2 can be joined together; n is 0 when X is O, and n is 1 when X is N; each Y is independently halide, alkyl, dialkylamido, aryl, or aralkyl. A modeling approach is used to identify particular valuable complexes, each of which incorporates a readily synthesized cyclopentadienyl precursor.

The present invention relates to a new optically active rare earth complex (1) represented by a general formula (1); (in the formula, X1 and X2 each independently represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 4 carbon atoms or an alkoxyl group having 1 to 4 carbon atoms; Y1, Y2, Y3, and Y4, each independently represents a hydrogen atom, a halogen atom, or an alkyl group having 1 to 4 carbon atoms; R1 represents an alkyl group having 1 to 8 carbon atoms, a fluorine-substituted alkyl group having 1 to 8 carbon atoms, or a phenyl group: R2 is a group selected from the group consisting of (a) cyclopentadienyl groups, (b) phenyl groups, and (c) naphthyl groups).

A process for preparing bis-cyclopentadienyl compounds bridged by a methylene group is reported, said process comprising reacting formaldehyde with a cyclopentadienyl compound in the presence of a base and of a solvent having a dielectric constant ( epsilon ), measured at 25 DEG C., higher than 7. The bridged compounds, obtainable in high yields with this simple single-step process, can be used to prepare ansa-metallocenes, active as catalyst components in the polymerization of olefins.

The invention discloses a controllable preparation method of a carboxyl functionalized carbon nanotube. The highest carboxyl concentration can reach 3.45nmol / cm<2> and can be randomly adjusted by changing the proportion of reactants. The method comprises the following concrete steps: weighing a cyclopentadienyl complex and carboxyl derivatives of the cyclopentadienyl complex; dissolving in an organic solvent; hermetically heating; filtering; washing; drying in vacuum and the like. The carboxyl modified carbon nanotube prepared by adopting the method is relatively high in purity and uniform in tube diameter distribution, and both the specific surface area and the carbon nanotube surface carboxyl concentration of the carboxyl modified carbon nanotube greatly exceed those of a carbon nanotube treated with a strong oxidant. The method for preparing the carboxyl modified carbon nanotube is low in energy consumption, high in efficiency, free of an additional catalyst and easy and feasible; raw materials are simple and easily available; the carboxyl modified carbon nanotube can be subjected to large-scale continuous production and is easy for large-scale production and suitable for industrialized production.

Disclosed are novel cyclopentadienyl transition metal compounds that are stable under a wide variety of conditions, particularly under conditions that include exposure to water and oxygen containing media. These novel compounds can be utilized in preparing novel catalyst systems useful in polymerizing olefins. The cyclopentadienyl compound can specifically be [(C5H4CH2CH2N[H]Me2)TiCl3]+B[C6F5]4-. Also disclosed are processes for preparing the novel cyclopentadienyl transition metal compounds.

A rare earth metal complex which is a tris-s-butylcyclopentadienyl rare earth metal complex represented by the following general formula (I). It is a liquid rare earth metal complex excellent in heat resistance and volatility and suitable for use as a material for thin-film formation. (In the formula, M represents a rare earth metal.)

Catalysts useful for polymerizing olefins are disclosed. The catalysts comprise an activator and a bridged cyclopentadienyl complex that incorporates a monoanionic hydroxylamido or hydrazido ligand fragment. Suitable complexes have the structure:wherein M is a Group 4 metal; Z is a divalent linking group; X is N or O; each of R1 and R2 is independently C1-C4 alkyl or C6-C10 aryl; R1 and R2 can be joined together; n is 0 when X is O, and n is 1 when X is N; each Y is independently halide, alkyl, dialkylamido, aryl, or aralkyl. A modeling approach is used to identify particular valuable complexes, each of which incorporates a readily synthesized cyclopentadienyl precursor.

A catalytic system based at least on a preformation monomer selected from the group consisting of 1,3-dienes, ethylene, α-monoolefins and their mixtures, on a metallocene of formula {P(Cp)(Flu)LnG} and on an organometallic compound as cocatalyst is provided. In the formula, Ln denotes a metal atom which is a rare earth metal, G denotes a group comprising the borohydride BH4 unit or denotes a halogen atom X selected from the group consisting of chlorine, fluorine, bromine and iodine, Cp denotes a cyclopentadienyl group of formula C5H4, Flu denotes a fluorenyl group of formula C13H8, P being a group bridging the two Cp and Flu groups and comprising a silicon or carbon atom. Such a catalytic system exhibits an improved stability of the catalytic activity over time, in particular on storage.

A hydrosilylation iron catalyst prepared from a two-electron ligand (L) and a mononuclear, binuclear, or trinuclear complex of iron indicated by formula (1), Fe having bonds with carbon atoms included in X and the total number of Fe-carbon bonds being 2-10. As a result of using iron, the hydrosilylation iron catalyst is advantageous from a cost perspective as well as being easily synthesized. Hydrosilylation reactions can be promoted under mild conditions by using this catalyst.Fe(X)a  (1)(in the formula, each X independently indicates a C2-30 ligand that may include an unsaturated group excluding carbonyl groups (CO groups) and cyclopentadienyl groups, however at least one X includes an unsaturated group, a indicates an integer of 2-4 per Fe atom.)

A hydrosilylation iron catalyst prepared from a two-electron ligand (L) and a mononuclear, binuclear, or trinuclear complex of iron indicated by formula (1), Fe having bonds with carbon atoms included in X and the total number of Fe-carbon bonds being 2-10. As a result of using iron, the hydrosilylation iron catalyst is advantageous from a cost perspective as well as being easily synthesized. Hydrosilylation reactions can be promoted under mild conditions by using this catalyst.Fe(X)a  (1)(in the formula, each X independently indicates a C2-30 ligand that may include an unsaturated group excluding carbonyl groups (CO groups) and cyclopentadienyl groups, however at least one X includes an unsaturated group, a indicates an integer of 2-4 per Fe atom.)

Provided is a cobalt complex which is useful for the production of a cobalt-containing thin film under conditions where no oxidizing gas is used. A cobalt complex represented by general formula (1) (wherein R1 represents a silyloxy group represented by general formula (2) (wherein R6, R7 and R8 independently represent an alkyl group having 1 to 6 carbon atoms); R2 represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a silyloxy group represented by general formula (2); R3, R4 and R5 independently represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; and L represents a diene having 4 to 10 carbon atoms) is used.

Substituted ferrocenium compounds comprising at least one pendant oleophilic substituent on at least one of the cyclopentadienyl groups and an inert, compatible, noncoordinating, anion and processes for use thereof as catalyst activators for addition polymerizations or as oxidizing agents for metal complex syntheses.

Catalytic composition effective in the hydrogenation of olefinic double bonds prepared by reaction between:(A) at least one cyclopentadienyl complex of a transition metal having general formula (I) (R)(R1)M1(R2)(R3) wherein R is an anion containing an eta5-cyclopentadienyl ring coordinated to M1; M1 is selected from titanium, zirconium and hafnium; R2 and R3, the same or different, are organic or inorganic anion groups bound to M1; R1 is selected from cyclopentadienyl and R2;(B) an alkylating composition essentially consisting of:(b1) an organometallic compound having general formula (II) M2 (R4)(R5), wherein M2 is selected from Zn and Mg;(b2) an organoderivative of aluminum having general formula (III) Al(R6)3.

Atomic layer deposition (ALD) type processes for producing metal containing thin films comprise feeding into a reaction space vapor phase pulses of metal containing cyclopentadienyl precursors as a metal source material. In preferred embodiments the metal containing cyclopentadienyl reactant comprises a metal atom that is not directly bonded to an oxygen or halide atom. In other embodiments the metal atom is bonded to a cyclopentadienyl compound and separately bonded to at least one ligand via a nitrogen atom. In still other embodiments the metal containing cyclopentadienyl compound comprises a nitrogen-bridged ligand.

The invention relates to a bridged cyclopentadienyl bimetallic catalyst and a use thereof. A main catalyst is represented by the structural formula. In the main catalyst structural formula, M represents Ti, Zr or Hf, X represents Cl or Br, Rn represents 1-3H or 1-3Me, A1 and A2 represent the same or different bridge groups such as alkylene, silicyl group, siloxy group or germane group, and R1 and R2 represent the same or different groups such as substituted cyclopentadienyl group and halogen atoms. A cocatalyst comprises alkylaluminoxane or alkylaluminium. A mole ratio Al / M of the main catalyst to the cocatalyst is 200-10000: 1. In the catalytic polymerization reaction, the bridged cyclopentadienyl bimetallic catalyst has the characteristic of active center diversification. Polyethylene resin obtained by the catalytic ethylene polymerization has wide molecular weight distribution and even forms bimodal distribution. The bridged cyclopentadienyl bimetallic catalyst has good stability and a large structure adjustment range. The polymer obtained by the bridged cyclopentadienyl bimetallic catalyst has unique performances.

The invention relates to an asymmetrical iridium (III) phosphorescent complex containing a dibenzo-phosphorus mixed with cyclopentadienyl group, and a synthesis method of the asymmetrical iridium (III) phosphorescent complex. The synthesis method comprises the steps of synthesizing a ligand L-PO by taking 2-phenylpyridine and p-bromophenyl boronic acid as raw materials, and carrying out a Suzuki coupling reaction to synthesize 2-(4-bromophenyl) pyridine; enabling the 2-(4-bromophenyl) pyridine to have a reaction with n-butyl lithium and trimethyl borate to generate 4-(2-pyridyl) phenyl boronic acid; enabling the 4-(2-pyridyl) phenyl boronic acid to have a reaction with o-dibromobenzene for carrying out Suzuki coupling to generate a pyridine derivative having a 2-bromobiphenyl structure; enabling a Grignard reagent of the compound to have a reaction with dichlorophenyl phosphine, and carrying out a ring closing reaction under a catalytic condition of palladium acetate to obtain the ligand L-PO containing the dibenzo-phosphorus mixed with cyclopentadienyl group. The asymmetrical iridium (III) phosphorescent complex containing the dibenzo-phosphorus mixed with cyclopentadienyl group has excellent electron injection / transmission performance, and can remarkably improve the electroluminescence efficiency of an organic electroluminescence device based on the materials.

A semiconductor device containing a dielectric capacitor having an excellent step coverage for a device structure of high aspect ratio corresponding to high integration degree, as well as a manufacturing method therefor are provided. A dielectric capacitor of high integration degree is manufactured by forming a bottom electrode 46 and a top-electrode 48 comprising a homogeneous thin Ru film with 100% step coverage while putting a dielectric 47 therebetween on substrates 44, 45 having a three-dimensional structure with an aspect ratio of 3 or more by a MOCVD process using a cyclopentadienyl complex within a temperature range from 180° C. or higher to 250° C. or lower.

Disclosed are novel cyclopentadienyl transition metal compounds that are stable under a wide variety of conditions, particularly under conditions that include exposure to water and oxygen containing media. These novel compounds can be utilized in preparing novel catalyst systems useful in polymerizing olefins. The cyclopentadienyl compound can specifically be [(C5H4CH2CH2N[H]Me2)TiCl3]+B[C6F5]4-. Also disclosed are processes for preparing the novel cyclopentadienyl transition metal compounds.

Disclosed are methods for making partially hydrogenated annulated cyclopentadienyl complexes which can provide efficient synthesis of metallocene catalysts desired for olefin polymerization.

The invention provides a positive resist composition, wherein a polymer compound having the weight-average molecular weight in the range of 1,000 to 500,000 and comprising a repeating unit having a hydrogen atom in a carboxyl group and / or in a phenolic hydroxy group therein been substituted by an acid-labile group and a repeating unit “a” having a cyclopentadienyl complex shown by the following general formula (1) is used as a base resin therein. There can be a positive resist composition having not only small edge roughness (LER and LWR) while having a higher resolution than conventional positive resist compositions, but also a good pattern form after exposure and an extremely high etching resistance, especially a positive resist composition using a polymer compound suitable as a base resin for a chemically amplifying resist composition; and a patterning process.

Catalyst systems comprising a procatalyst having a structure according to Formula (I): [insert formula] where M is a metal chosen from titanium, zirconium, or hafnium, the metal having a formal oxidation state of +3 or +4; each X is a monodentate or bidentate ligand; n is 1 or 2; each of R8−R12 is independently selected from (C­1–C30)hydrocarbyl, (C1−C30)heterohydrocarbyl, (C6-C30)aryl, (C3-C30)heteroaryl,-Si(RC)3, −Ge(RC)3, and –H, wherein optionally, any of R8−R12 are covalently connected to form one or more ring or multi-ring structures; R1 is a (C­1−C50)hydrocarbyl, (C1−C50)heterohydrocarbyl, (C6-C30)aryl, or (C3-C30)heteroaryl; each R2 and R3 is independently selected from the group consisting of (C1−C30)hydrocarbyl, (C1−C30)heterohydrocarbyl, (C6-C30)aryl, (C3-C30)heteroaryl, −ORC, −Si(RC)3, −Ge(RC)3, halogen, and –H, wherein R2 and R3 are optionally covalently linked to form an aromatic ring or a non-aromatic ring; and each RC is independently selected from the group consisting of (C1−C30)hydrocarbyl, (C1−C30)heterohydrocarbyl, (C6-C30)aryl, (C3-C30)heteroaryl, and –H.

An antireflective film including: a support base, and a pattern composed of a photoresist material formed on the support base, the pattern having a larger size at a point closer to the support base. The photoresist material contains a polymer compound having an aromatic group, and the polymer compound includes at least one of: (i) a repeating unit having a cyclopentadienyl complex structure, (ii) a repeating unit having a naphthalene structure, and (iii) a repeating unit having a naphthalene structure and / or a fluorene structure. The repeating units having a naphthalene structure may include one of the following units:The disclosed antireflective film shows an antireflection effect to decrease the reflection of light. A method of producing the antireflective film, and an eyeglass type display including the antireflective film are disclosed.

The invention discloses a preparation method of a cycloolefin copolymer and the prepared cycloolefin copolymer. The preparation method comprises the following steps: carrying out a copolymerization reaction on an alpha olefin monomer and a cycloolefin monomer under the action of a phosphine-nitrogen ligand-containing mono-cycloolefin complex catalyst and a cocatalyst to obtain a cycloolefin copolymer, wherein the mono-cyclopentadienyl complex catalyst has a structure as shown in a formula (1); according to the invention, copolymerization of the alpha-olefin monomer and the cycloolefin monomer is catalyzed by the mono-cyclopentadienyl complex containing the phosphine-nitrogen ligand, so that the alpha-olefin monomer and cycloolefin copolymer with high cycloolefin content can be prepared.

The invention provides a negative resist composition including, as a base resin, a polymer that contains at least a repeating unit “a” having a cyclopentadienyl complex and is represented by the following general formula (1). There can be a negative resist composition, especially a chemically amplified negative resist composition that has a higher resolution than conventional hydroxystyrene-based and novolak-based negative resist compositions, a good pattern configuration after exposure, and further excellent etching resistance, and a patterning process using the same.