36 results about "Cyclopentadienyl complex" patented technology

A rare earth metal complex which is a tris-s-butylcyclopentadienyl rare earth metal complex represented by the following general formula (I). It is a liquid rare earth metal complex excellent in heat resistance and volatility and suitable for use as a material for thin-film formation. (In the formula, M represents a rare earth metal.)

A hydrosilylation iron catalyst prepared from a two-electron ligand (L) and a mononuclear, binuclear, or trinuclear complex of iron indicated by formula (1), Fe having bonds with carbon atoms included in X and the total number of Fe-carbon bonds being 2-10. As a result of using iron, the hydrosilylation iron catalyst is advantageous from a cost perspective as well as being easily synthesized. Hydrosilylation reactions can be promoted under mild conditions by using this catalyst.Fe(X)a  (1)(in the formula, each X independently indicates a C2-30 ligand that may include an unsaturated group excluding carbonyl groups (CO groups) and cyclopentadienyl groups, however at least one X includes an unsaturated group, a indicates an integer of 2-4 per Fe atom.)

Substituted ferrocenium compounds comprising at least one pendant oleophilic substituent on at least one of the cyclopentadienyl groups and an inert, compatible, noncoordinating, anion and processes for use thereof as catalyst activators for addition polymerizations or as oxidizing agents for metal complex syntheses.

Atomic layer deposition (ALD) type processes for producing metal containing thin films comprise feeding into a reaction space vapor phase pulses of metal containing cyclopentadienyl precursors as a metal source material. In preferred embodiments the metal containing cyclopentadienyl reactant comprises a metal atom that is not directly bonded to an oxygen or halide atom. In other embodiments the metal atom is bonded to a cyclopentadienyl compound and separately bonded to at least one ligand via a nitrogen atom. In still other embodiments the metal containing cyclopentadienyl compound comprises a nitrogen-bridged ligand.

Disclosed are novel cyclopentadienyl transition metal compounds that are stable under a wide variety of conditions, particularly under conditions that include exposure to water and oxygen containing media. These novel compounds can be utilized in preparing novel catalyst systems useful in polymerizing olefins. The cyclopentadienyl compound can specifically be [(C5H4CH2CH2N[H]Me2)TiCl3]+B[C6F5]4-. Also disclosed are processes for preparing the novel cyclopentadienyl transition metal compounds.

The invention provides a positive resist composition, wherein a polymer compound having the weight-average molecular weight in the range of 1,000 to 500,000 and comprising a repeating unit having a hydrogen atom in a carboxyl group and / or in a phenolic hydroxy group therein been substituted by an acid-labile group and a repeating unit “a” having a cyclopentadienyl complex shown by the following general formula (1) is used as a base resin therein. There can be a positive resist composition having not only small edge roughness (LER and LWR) while having a higher resolution than conventional positive resist compositions, but also a good pattern form after exposure and an extremely high etching resistance, especially a positive resist composition using a polymer compound suitable as a base resin for a chemically amplifying resist composition; and a patterning process.

An antireflective film including: a support base, and a pattern composed of a photoresist material formed on the support base, the pattern having a larger size at a point closer to the support base. The photoresist material contains a polymer compound having an aromatic group, and the polymer compound includes at least one of: (i) a repeating unit having a cyclopentadienyl complex structure, (ii) a repeating unit having a naphthalene structure, and (iii) a repeating unit having a naphthalene structure and / or a fluorene structure. The repeating units having a naphthalene structure may include one of the following units:The disclosed antireflective film shows an antireflection effect to decrease the reflection of light. A method of producing the antireflective film, and an eyeglass type display including the antireflective film are disclosed.

The invention provides a negative resist composition including, as a base resin, a polymer that contains at least a repeating unit “a” having a cyclopentadienyl complex and is represented by the following general formula (1). There can be a negative resist composition, especially a chemically amplified negative resist composition that has a higher resolution than conventional hydroxystyrene-based and novolak-based negative resist compositions, a good pattern configuration after exposure, and further excellent etching resistance, and a patterning process using the same.

This invention provides a metallocene complex and the preparation method thereof and a catalyst composition. This catalyst composition comprises a metallocene complex represented by formula (I) and an organic boron salt. Compared to the prior art, the catalyst used in this invention, which is the metallocene complex represented by formula (I), does not contain a group bonding between the heterocyclic fused cyclopentadienyl ring and the transition metal, and the coordination space of the central metal has a large opening degree. Therefore, the catalytic activity for more sterically hindered monomers is higher, and the comonomer incorporation is also higher. Furthermore, the metallocene complex represented by formula (I) used in this invention is a heterocyclic ring fused cyclopentadienyl ligand. Heterocyclic rings have relatively strong electron-donating capacity. By fusing a cyclopentadienyl group using heterocyclic rings, it is possible to change the electronic effect of the metal center and in turn increase the activity of catalyst. Therefore, by using the metallocene complex represented by formula (I), it is possible to prepare copolymers of ethylene with other olefins at high activity and high comonomer incorporation, and it is also possible to catalyze the polymerization of styrene and substituted styrene at high syndiotacticity and high activity.