19 results about "Ruthenium Compounds" patented technology

The invention discloses a method for in-situ rapid growth of a dual-network hydrogel coating on the surface of a base material by a one-step method, which comprises the following steps: putting the base material with an adhesion initiation layer on the surface into a hydrogel precursor solution, and carrying out in-situ polymerization for 0.1-10 minutes under light irradiation, wherein the adhesion initiation layer comprises an adhesive compound based on a catechol group and a first photoinitiator, and the hydrogel precursor solution comprises a natural polymer containing tyrosine, an acrylic monomer, a cross-linking agent and a second photoinitiator, and wherein the first photoinitiator and the second photoinitiator are different from each other and are independently selected from a divalent ruthenium compound and a persulfate. Compared with the prior art, the natural / synthetic polymer double-network gel coating with biological activity and mechanical property can grow on the surfaces of different substrates more quickly and efficiently through a one-step method; and the base material, the surface of which is modified by the in-situ grown double-network hydrogel coating, obtained by the method can be applied to in-vivo medical apparatuses and instruments.

Provided is a one-pot process for preparing propionic acid, which comprises (i) treating ethylene with a C1-C6 alkanol, water, and carbon monoxide in the presence of a catalyst system comprising the reaction product of (a) a Group 8 to 10 transition metal compound such as a palladium or ruthenium compound; and (b) an activating anion, at elevated temperature and pressure. The process also provides a facile, continuous process for the preparation of propionic acid via the alkoxycarbonylation of ethylene at elevated temperature and pressure followed by hydrolysis, in one reaction vessel.

Provided is a method for producing a catalyst that makes it easier to produce a supported metal catalyst for ammonia synthesis, which has limitations in production methods or production facilities, particularly, has large limitations in industrial-scale production, and that can produce the catalyst with high activity. This method for producing a catalyst for ammonia synthesis is characterized by comprising a first step for preparing 12CaO. 7Al2O3 having a specific surface area of 5 m2 / g or more, a second step for supporting a ruthenium compound on the 12CaO. 7Al2O3, and a third step for reducing the ruthenium compound-supported 12CaO. 7Al2O3 obtained in the second step. The reduction treatment is performed until the average particle diameter of the ruthenium after the reduction treatment is increased by at least 15% relative to the average particle diameter of the ruthenium before the reduction treatment.

The Invention relates to a method Method for making a ruthenium catalyst comprising the steps of - Providing an aromatic dithiol substituted on adjacent aromatic carbon atoms with thiol groups, wherein in a first step an aromatic compound substituted with two leaving groups on adjacent aromatic carbon atoms are reacted with alkali trithiocarbonate to obtain an aromatic benzodithiole-thione, which in a subsequent step is reacted / hydrolysed with a base; - providing a zinc dithiolate compound by reacting the aromatic dithiol with a zinc carboxylate in an organic solvent; Reacting the zinc dithiolate compound with a ruthenium compound wherein X1 and X2 are, independently of each other, are anionic ligands and are the same or different; L and L2 are, independently of each other, neutral electron donor ligands and are the same or different; Ar is an aromatic group which may be substituted and that can be bridged with L, if L is an alkoxy group; - Obtaining a ruthenium catalyst of formula 4 or 4a, wherein R1 to R4 are, independently of each other, are selected from hydrogen, halogen, alkyl, aryl, or R.1 with R3, R3 with R4 or R2 with R4 are forming together an aliphatic or aromatic ring.

The invention discloses a preparation method and application of a tetragonal biconical titanium dioxide supported ruthenium catalyst, and the tetragonal biconical titanium dioxide supported ruthenium catalyst is obtained by preparing a tetragonal biconical anatase TiO2 carrier through combination of a hydrothermal method and calcination and then carrying out hydrothermal in-situ loading and reduction of a ruthenium compound solution by using glucose. The core advantage of the catalyst is the dual synergistic effect of the carrier and the electronic state: the tetragonal bipyramid structure endows the catalyst with high stability, and the deactivation of the catalyst can be greatly reduced; the electron transfer of Ru to the carrier weakens the adsorption energy of cyclohexene, a high-proportion special electronic state Ru beta / Ru alpha is obtained, the surface hydrophilicity is optimized, and the rapid desorption of the target product cyclohexene is promoted. In addition, the cost is reduced by utilizing biomass reduction, the high dispersity of Ru is realized, and under the Ru loading capacity of 10wt.%, when the benzene conversion rate of the catalyst reaches 48.67%, the cyclohexene selectivity reaches up to 82.25%, and the cyclohexene yield reaches 53.22%.

The invention discloses a preparation method of a high-activity bisphenol A hydrogenation catalyst, which comprises the following steps: weighing transition metal salt in the fourth period of the periodic table of elements, adding a mixed solvent of alcohol and deionized water, and uniformly stirring to prepare a uniformly mixed solution; weighing a ruthenium-containing compound, adding an accelerant, and adding deionized water to prepare a uniform solution; uniformly mixing the solutions, and reacting to obtain a reaction solution; weighing aluminum oxide, and adding the reaction liquid into the aluminum oxide to complete the impregnation process; then carrying out heat treatment to obtain a hydrogenation catalyst precursor; and reducing the hydrogenation catalyst precursor to obtain the reduced high-activity bisphenol A hydrogenation catalyst. According to the preparation method, the metal utilization rate of Ru is increased, and the catalytic activity of the catalyst is facilitated.

The invention discloses a composite ruthenium plating solution which comprises the following components in parts by weight: 1 part of a ruthenium-containing compound precursor, 8-15 parts of an organic solvent, 0.05-0.5 part of a nano conductive enhancer, 0.01-0.06 part of a binder and 0.01-0.06 part of a flatting agent, the ruthenium-containing compound precursor is any one of ruthenium trichloride hydrate, anhydrous ruthenium trichloride or ruthenium nitrate, the organic solvent is at least one of absolute ethyl alcohol, isopropanol, n-butyl alcohol and terpilenol, and the nano conductive enhancer is at least one of graphene, carbon nanotubes and acetylene black; the binder is at least one of PVDF (Polyvinylidene Fluoride), polyvinylpyrrolidone and ethyl cellulose; the flatting agent is polyether modified polysiloxane and modified acrylate. The composite ruthenium plating solution can effectively improve the conductivity and adhesive force of a plating layer and enhance the uniformity and wear resistance of the plating layer. And a ruthenium-plated product with large capacitance, low equivalent resistance and strong binding force between a plating layer and a tantalum substrate is obtained by acting on the tantalum substrate.

A ruthenium complex (A) having a compound (B) is used as a hydrosilylation catalyst. Alternatively, the compound (B) and a ruthenium compound (A′) that does not have the compound (B) as a ligand are mixed to form a hydrosilylation catalyst. The compound (B) contains at least one carbon-carbon double bond per molecule, and contains an electron-withdrawing group bonded to at least one of carbon atoms forming the carbon-carbon double bond.

[Problem] To provide a chlorine gas removal means capable of removing chlorine gas contained in exhaust gas and the like with high efficiency.[Solution to Problem] A method for decomposing chlorine gas, including a step of bringing a gas containing chlorine gas into contact with a chlorine gas decomposition catalyst in the presence of water, in which the chlorine gas decomposition catalyst includes a ruthenium material (X), and the ruthenium material (X) includes at least one selected from the group consisting of ruthenium and a ruthenium compound.

To provide a chemical vapor deposition process that makes it possible to form a high-quality ruthenium thin film or the like while suppressing the oxidation of a substrate.SOLUTION: The present invention relates to a method for producing a ruthenium thin film or a ruthenium compound thin film by a chemical vapor deposition process, where the ruthenium thin film or the ruthenium compound thin film is formed by reacting an organic ruthenium compound with a reaction gas on a substrate. According to the present invention, the chemical vapor deposition process comprises: a first film formation step for using a non-oxidizing gas as a reaction gas; and a second film formation step for forming a film by using an oxidizing gas as a reaction gas after forming the film in the first film formation step. In addition, as the organic ruthenium compound serving as a precursor, any one among predetermined organic ruthenium compounds α, β, and γ containing a carbonyl ligand is used.SELECTED DRAWING: Figure 1

The Invention relates to a method Method for making a ruthenium catalyst comprising the steps of - Providing an aromatic dithiol substituted on adjacent aromatic carbon atoms with thiol groups, wherein in a first step an aromatic compound substituted with two leaving groups on adjacent aromatic carbon atoms are reacted with alkali trithiocarbonate to obtain an aromatic benzodithiole-thione, which in a subsequent step is reacted / hydrolysed with a base; - providing a zinc dithiolate compound by reacting the aromatic dithiol with a zinc carboxylate in an organic solvent; Reacting the zinc dithiolate compound with a ruthenium compound wherein X1 and X2 are, independently of each other, are anionic ligands and are the same or different; L and L2 are, independently of each other, neutral electron donor ligands and are the same or different; Ar is an aromatic group which may be substituted and that can be bridged with L, if L is an alkoxy group; - Obtaining a ruthenium catalyst of formula 4 or 4a, wherein R1 to R4 are, independently of each other, are selected from hydrogen, halogen, alkyl, aryl, or R.1 with R3, R3 with R4 or R2 with R4 are forming together an aliphatic or aromatic ring.

The invention provides a preparation method of a bisphenol A hydrogenation catalyst and the bisphenol A hydrogenation catalyst, and relates to the technical field of preparation of catalysts. The method comprises the following steps: adding organic ferric salt and organic acid into deionized water to form a first solution; aluminum oxide is added into the first solution for first dipping treatment, and a first sample is obtained; carrying out first drying treatment on the first sample, and then roasting the first sample in an air atmosphere to obtain a magnetic carrier; adding a ruthenium-containing compound into deionized water to form a second solution; adding the magnetic carrier into a second solution for second dipping treatment to obtain a second sample; carrying out second drying treatment on the second sample and then carrying out heat treatment to obtain a third sample; the third sample is subjected to a reduction reaction in the hydrogen atmosphere, and the bisphenol A hydrogenation catalyst is obtained. According to the preparation method of the bisphenol A hydrogenation catalyst, the Fe3O4 nanoparticles can be uniformly distributed on the carrier while the Fe3O4 nanoparticles are generated, so that the preparation process of the magnetic bisphenol A hydrogenation catalyst is simplified.

To provide a biosensor. And to avoid the generation of precipitates in the production of a composition for a sensor using a ruthenium compound.SOLUTION: There is provided a method for manufacturing a biosensor containing an oxidoreductase, a ruthenium compound, and an electron transfer accelerator. The present invention also provides a method for producing a composition for a biosensor by first adding and dissolving an oxidoreductase in powder form in a solution, and then mixing a ruthenium compound in powder form into the solution in which the oxidoreductase is dissolved.SELECTED DRAWING: None

The purpose of the present invention is to provide an electroless ruthenium plating bath in which hydrazine is used as a reducing agent, said electroless ruthenium plating bath being capable of improving bath stability, having excellent ruthenium deposition properties, and being capable of suppressing shrinkage of a coating film during annealing treatment. The electroless ruthenium plating bath at least contains a ruthenium compound, a reducing agent and a stabilizing agent, the reducing agent is hydrazine, the stabilizing agent is composed of a hydroxylamine compound and an organic compound with hydroxyl, and the hydroxylamine compound is at least one of hydroxylamine sulfate and hydroxylamine chloride; the organic compound having a hydroxyl group is at least one selected from the group consisting of gluconolactone, sorbitol, mannitol, and citric acid monohydrate.

A production method of producing a fluorine-containing olefin by allowing a first olefin represented by the following Formula (1) and a second olefin to react with each other in the presence of a ruthenium compound represented by the following Formula (X) is provided.

The invention belongs to the technical field of electronic paste, and particularly discloses thick-film resistor paste and a preparation method thereof. The resistance paste comprises the following components in percentage by mass: 45-75% of an inorganic component, 20-50% of an organic component and 0.1-10% of an organic ruthenium compound, wherein the inorganic component comprises ruthenium oxide, glass powder and an inorganic filler; the organic component comprises resin, a curing agent and a solvent. According to the invention, the organic ruthenium compound is added into the resistor paste, so that in the sintering process of the resistor paste, the organic ruthenium compound is gradually subjected to in-situ chemical reaction and is converted into ruthenium oxide to continuously fill pores generated by sintering decomposition of organic components, thereby effectively improving the sintering uniformity and density of the resistor layer; therefore, the resistance discreteness of the resistive layer can meet the use requirement.

The invention relates to the technical field of ruthenium coordination compound synthesis, in particular to a preparation method of tris (4, 4 '-dimethyl-2, 2'-dipyridyl) ruthenium hexafluorophosphate (II). According to the preparation method provided by the invention, a trivalent ruthenium source, 4, 4 '-dimethyl-2, 2'-dipyridyl and water-soluble hexafluorophosphate are taken as raw materials, water is taken as a solvent, monobasic acid and / or monobasic aldehyde with the carbon atom number of 1-2 are / is taken as a reducing agent, and tris (4, 4 '-dimethyl-2, 2'-dipyridyl) ruthenium hexafluorophosphate (II) is prepared with high yield through a one-pot method. According to the method, ruthenium (III) in a trivalent ruthenium source is reduced into ruthenium (II) by a reducing agent, meanwhile, the reduced ruthenium compound (II) is coordinated with 4, 4 '-dimethyl-2, 2'-dipyridyl to form tri (4, 4 '-dimethyl-2, 2'-dipyridyl) ruthenium (II) ions, and finally, the tri (4, 4 '-dimethyl-2, 2'-dipyridyl) ruthenium (II) ions react with water-soluble hexafluorophosphate to obtain a target product.

The present invention reduces the difference in embedment height of ruthenium when embedding ruthenium in a recess formed in a substrate by repeating film formation and etching of ruthenium. This method for embedding ruthenium in a substrate that has a recess includes: (a) a step for forming a ruthenium layer in the recess by supplying a starting material gas that contains a ruthenium compound into a processing chamber in which the substrate is housed; (b) a step for performing a pretreatment of the ruthenium layer by supplying a pretreatment gas, which contains an oxygen gas or an ozone gas and has an ozone concentration of not less than 0 g / m3 but less than 150 g / m3, into the processing chamber; and (c) a step for etching a part of the ruthenium layer by supplying an etching gas, which contains an ozone gas and has an ozone concentration of 150 g / m3 to 400 g / m3 inclusive, into the processing chamber. In the method, a cycle in which the steps (a) to (c) are executed in this order is repeated.