Provided is a vapor phase decomposition (VPD) device for a semiconductor wafer pollutant measurement apparatus and a door opening and closing device thereof. The VPD device includes: a rectangular vessel-shaped main body of the VPD device and a door which covers in a sealed form or opens the wafer inlet of the VPD device. Here, a predetermined space is formed in the inner portion of the rectangular vessel-shaped main body, support plates are formed on the bottom of the rectangular vessel-shaped main body and gas discharge and suction nozzles are located therein. In addition, a transparent see-through window is formed on the upper surface of the rectangular vessel-shaped main body, a detection electrode for controlling an inner atmosphere is formed at the center of the transparent see-through window, and one side surface of the rectangular vessel-shaped main body is opened to thus form a wafer inlet for introducing a wafer. The door opening and closing device includes: a forward and backward movement unit having cylinder loads, air cylinders, and plates, to make the door move forward and backward in order to open and close the wafer inlet of the main body of the VPD device; and an ascent and descent movement unit having a fixed plate, guide bars, a slide block, and a cylinder.