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95results about How to "Less sensitivity" patented technology

Calibration structure for circuit breakers having bimetallic trip member

A thermally compensated circuit breaker has a movable contact assembly (24) which mounts a movable electrical contact (24m) for movement between open and closed contacts positions with a stationary electrical contact (26). The contacts are maintained in the closed circuits position by a latching mechanism (24b, 28g) which prevents opening of the contacts through an opening contacts force provided by a spring (24e). A current carrying trip arm (40a, 44a) deflects upon sufficient I.sup.2 R heating to transfer motion to the latch to separate the latch (24b) from the latch receiving catch (28g) to trip the circuit breaker. The trip arm (40a, 44a) is part of a pivotably mounted actuator assembly (40, 44) having a movable end portion spaced from the pivot disposed adjacent a motion transfer member (28c). A calibration screw (42a) is located so that the longitudinal axis is in line with a movable end portion of the actuator assembly and the motion transfer member. In one embodiment the head of the calibration screw is captured in a slot in the free end of a calibration base (42d) attached to the trip arm so that deflection of the trip arm directly transfers motion to the motion transfer member and in another embodiment the calibration screw head is captured in a slot in the free end of the trip arm so that a bowing deflection of the trip arm causes a calibration base (46) to which it is attached at an end thereof to rotate with the calibration base directly transferring motion to the motion transfer member.
Owner:SENSATA TECH MASSACHUSETTS INC

Diffraction order controlled overlay metrology

In one embodiment, a system for imaging an acquisition target or an overlay or alignment semiconductor target is disclosed. The system includes a beam generator for directing at least one incident beam having a wavelength λ towards a periodic target having structures with a specific pitch p. A plurality of output beams are scattered from the periodic target in response to the at least one incident beam. The system further includes an imaging lens system for passing only a first and a second output beam from the target. The imaging system is adapted such that the angular separation between the captured beams, λ, and the pitch are selected to cause the first and second output beams to form a sinusoidal image. The system also includes a sensor for imaging the sinusoidal image or images, and a controller for causing the beam generator to direct the at least one incident beam towards the periodic target or targets, and for analyzing the sinusoidal image or images. In one application the detector detects a sinusoidal image of an acquisition target with the same pitch as the designed target and the controller analyzes the pitch of the sinusoidal image compared to design data to determine whether the target has been successfully acquired. In a second application a first and second periodic target that each have a specific pitch p are imaged so that the detector detects a first sinusoidal image of the first target and a second sinusoidal image of the second target and the controller analyzes the first and second sinusoidal image to determine whether the first and second targets have an overlay or alignment error.
Owner:KLA TENCOR CORP
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