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This invention discloses a two-step pulse electrodeposition method for preparing a nickel-tungsten-cobalt ternary metal oxygen evolution electrode and its application. Specifically, it addresses the Ni... 2+ Co 2+ With W 6+ The large differences in reduction potential and the mismatch in reduction kinetics lead to elemental segregation in single-step deposition. This invention addresses this problem by employing a two-step pulsed electrodeposition strategy: first depositing a Ni-W metal layer, then depositing a Ni-Co metal layer. This strategy optimizes the plating bath composition and pulse parameters step-by-step to accommodate the reduction requirements of different metal ions. The method includes: pretreatment of the nickel-based substrate; performing a first-step pulsed electrodeposition in a solution containing nickel and tungsten salts; and then performing a second-step pulsed electrodeposition in a solution containing nickel and cobalt salts, followed by drying. This invention, through specific two-step deposition and the periodic regulation of the pulsed current, effectively optimizes the loading and dispersion of nickel, tungsten, and cobalt, resulting in a high-performance oxygen evolution electrode with stable and reliable performance, meeting the application requirements of large-scale industrial production.