2results about "Endless core furnaces" patented technology

This invention provides a cooking device, relating to the field of household appliance technology. The cooking device includes a control panel; a coil for generating an alternating magnetic field; and a non-magnetic conductor, which is disposed on the side of the control panel facing the coil, or on the side of the control panel away from the coil, and is configured to generate heat in the alternating magnetic field. The cooking device provided by this invention is applicable to cookware made of different materials, exhibiting high applicability.

The present invention relates to silicon wafers and epitaxial silicon wafers. Silicon wafers are provided in which the dopant is phosphorus, the resistivity is 1.2 mΩ-cm or less, and the carbon concentration is 3.5 x 10 15 atoms / cm 3 or more. The carbon concentration near the surface of the silicon wafer is reduced by 10% or more compared to the center depth of the silicon wafer.