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232results about How to "Occurrence can be suppressed" patented technology
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Method of manufacturing electronic component built-in substrate
ActiveUS20090215231A1Occurrence can be suppressedEasily level differenceFinal product manufactureSemiconductor/solid-state device detailsElectronic componentMetal
In a method of manufacturing an electronic component built-in substrate of the present invention, a mounted body including a first insulating layer, a stopper metal layer formed under the first insulating layer of a portion corresponding to a component mounting region and a second insulating layer formed on a lower surface of the first insulating layer and covering the stopper metal layer is prepared, and a concave portion is obtained by penetration-processing a portion of the first insulating layer, which corresponds to the component mounting region to form an opening portion, while using the stopper metal layer as a stopper. Also, the stopper metal layer in the concave portion is removed, then an electronic component is mounted on the concave portion, and then a third insulating layer is formed on the electronic component.
Owner:SHINKO ELECTRIC IND CO LTD
Solid-state imaging device and camera module
ActiveUS20090002531A1High quality imagingOccurrence can be suppressedTransistorTelevision system detailsForming facePhotoelectric conversion
A solid-state imaging device is provided. The solid-state imaging device includes a plurality of arrayed pixels, an optical inner filter layer, and a light-blocking side wall. The plurality of arrayed pixels each includes a photoelectric conversion portion and a pixel transistor. The optical inner filter layer is provided for blocking infrared light and formed facing toward a light-receiving surface of the photoelectric conversion portion of a desired pixel among the arrayed pixels. The light-blocking side wall is formed on a lateral wall of the optical inner filter layer.
Owner:SONY CORP
Image heating apparatus
InactiveUS7457576B2Occurrence can be suppressedLittle strengthElectrographic process apparatusSurface roughnessEngineering
Owner:CANON KK
Solar cell and a manufacturing method of the solar cell
InactiveUS20090139570A1Increase etch rateIncrease concentrationSemiconductor/solid-state device manufacturingPhotovoltaic energy generationHigh concentrationMetallurgy
The manufacturing method of the solar cell according to the present invention includes: 1) a first etching process in which an anisotropic etching is performed on an inner wall of each of a plurality of through holes, and 2) a second etching process in which an anisotropic etching is performed on a light-receiving surface. In the first etching process, a high concentration NaOH water solution (about 5% by weight) is used. Meanwhile, in the second etching process, a low concentration (about 1.5% by weight) NaOH water solution is used.
Owner:PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO LTD
Machine Tool
ActiveUS20140102268A1Improve vibrationReduce vibrationProgramme controlLathesMachine toolTool holder
A machine tool for machining a workpiece is provided with a cutting tool holder for holding a cutting tool and a rotation mechanism for holding the workpiece. One or both of the cutting tool holder and the rotation mechanism are movable on multiple axes so that the cutting tool is movable relative to the workpiece in multiple axial directions. A control device is provided for controlling the movement of one or both of the cutting tool holder and the rotation mechanism to synchronously vibrate the workpiece and the cutting tool relative to each other at a low frequency in multiple axial directions.
Owner:CITIZEN WATCH CO LTD
Power generating and propelling system of vessel
InactiveUS7147523B2Reduce usageEasy to usePropulsion based emission reductionAuxillariesInternal combustion engineElectric power
An electric power generating equipment (10) is provided between an internal combustion engine (2) and a power transmission device (3), and an electric motor (9) is disposed at an area of the power transmission device. An output shaft (9a) of the electric motor (9) is disposed coaxially to any of rotary shafts of the power transmission device (3).
Owner:YANMAR CO LTD
Light-emitting device and method for manufacturing the same
ActiveUS20140103385A1InhibitionWide process marginSolid-state devicesSemiconductor/solid-state device manufacturingLight emitting deviceMaterials science
Occurrence of a crosstalk phenomenon in a light-emitting device including a tandem element is suppressed. A light-emitting device includes: lower electrodes over an insulating layer; a partition over a portion between the lower electrodes, which includes an overhang portion over an end portion of each of the lower electrodes; a first light-emitting unit over each of the lower electrodes and the partition; an intermediate layer over the first light-emitting unit; a second light-emitting unit over the intermediate layer; and an upper electrode over the second light-emitting unit. The distance between the overhang portion and each of the lower electrodes is larger than the total thickness of the first light-emitting unit and the intermediate layer over the lower electrode.
Owner:SEMICON ENERGY LAB CO LTD +1
Ink set and image recording method
ActiveUS20100203247A1Save heatScratch resistantDuplicating/marking methodsInksOrganic solventImage recording
There is provided an ink set including an aqueous ink composition and a maintenance liquid. The aqueous ink composition includes water; a pigment; resin particles having a minimum film-forming temperature MFT0, which is a minimum film-forming temperature obtained when the resin particles are dispersed in water, of 60° C. or higher; and a water-soluble organic solvent, wherein a minimum film-forming temperature MFT25 of the resin particles, which is a minimum film-forming temperature obtained when the resin particles are mixed with the water-soluble organic solvent in an amount of 25% by mass relative to the solid content of the resin particles, and water, is at least 40° C. lower than MFT0. The maintenance liquid includes an organic solvent and water. There is also provided an image recording method.
Owner:FUJIFILM CORP
Chemical mechanical polishing method and method of manufacturing semiconductor device
InactiveUS20070128874A1Reduce capacitanceReduce resistance of metalOther chemical processesSemiconductor/solid-state device manufacturingOrganic filmPolymer science
A chemical mechanical polishing method comprises polishing an organic film using a slurry including polymer particles having a surface functional group and a water-soluble polymer.
Owner:JSR CORPORATIOON +1
Hybrid vehicle
ActiveUS20130116078A1Suppression problemPrevent speedingEngine controllersPlural diverse prime-mover propulsion mountingPower splitDrive wheel
A power split mechanism of a hybrid vehicle includes a sun gear that is coupled to a electric power generator, a ring gear that is coupled to a electric motor and a driving wheel, a pinion gear that meshes with the sun gear and the ring gear, and a carrier that supports the pinion gear and is coupled to a engine. Each of the arms of a inverter includes a first switching element that is provided on an upper arm thereof, and a second switching element that is provided on a lower arm thereof. A control device turns on one of the first switching element and the second switching element and turns off the other if an operation of stopping a vehicle system is performed during running.
Owner:TOYOTA JIDOSHA KK
Light-emitting device
ActiveUS20140103368A1InhibitionReduce the driving voltageSemiconductor devicesInter layerEngineering
Occurrence of a crosstalk phenomenon is suppressed in a light-emitting device including a tandem element. A light-emitting device includes a first lower electrode and a second lower electrode over an insulating layer; a partition which is formed over the insulating layer and positioned between the first lower electrode and the second lower electrode; a projecting object formed over the partition; a first light-emitting unit over each of the first lower electrode, the partition, the projecting object, and the second lower electrode; an intermediate layer over the first light-emitting unit; a second light-emitting unit over the intermediate layer; and an upper electrode over the second light-emitting unit. A recess is formed by a side surface of the projecting object and a side surface of the partition.
Owner:SEMICON ENERGY LAB CO LTD +1
Method of producing liquid crystal display device
ActiveUS20130196565A1Drop in display qualityImage stickingVessels or leading-in conductors manufactureNon-linear opticsLiquid crystallineLiquid-crystal display
The present invention provides a method of producing a liquid crystal display device which enables suppression of the occurrence of an electric double layer on a horizontal photo-alignment film before a polymer is formed, and exhibits reduced deterioration of display quality such as image sticking, or reduced display unevenness. The present invention is a method of producing a liquid crystal display device including the steps of (1) forming a liquid crystal layer containing a polymerizable monomer between a first substrate and a second substrate; (2) thermally annealing the liquid crystal layer at a temperature higher by 10° C. or more than the liquid crystalline phase-isotropic phase transition temperature of the liquid crystal layer; (3) forming horizontal alignment films to which the alignment treatment is performed by light irradiation on the first substrate and the second substrate by the time of the step (2); and (4) polymerizing the polymerizable monomer after the step (2).
Owner:MERCK PATENT GMBH
Control apparatus and control method for automatic transmission
InactiveUS20100222974A1Occurrence can be suppressedIncrease changeDigital data processing detailsGearing controlDrive wheelAutomatic transmission
An ECU executes a program including the step (S130) of inhibiting, in a traveling state where a one-way clutch F may engage as in driven state in first gear (YES in S100, YES in S110), normal gear-shifting control under which a gear to be implemented is determined based on the output shaft revolution number NO, in the case where the degree of change ΔNO by which the output shaft revolution number NO changes in a predetermined time period is larger than a threshold value Δ NO (1) (YES in S120) and thus it is regarded that popping could occur due to free turning of drive wheels, and the step (S140) of forcing the gear to be shifted to a gear except for first gear implemented by engagement of the one-way clutch F.
Owner:TOYOTA JIDOSHA KK
Liquid crystal display device and manufacturing method of the same
InactiveUS20060209222A1Small sizeHigh densitySolid-state devicesNon-linear opticsHigh densityLiquid-crystal display
An active matrix substrate or TFT substrate is provided with a lower layer wiring with a groove wiring structure covering surroundings of a copper layer with a barrier metal film is formed by forming a groove at an insulating substrate and depositing the barrier metal film and the copper layer in this groove. This groove wiring structure is used for a TFT substrate of a liquid crystal display (LCD) device. It is possible to manufacture an LCD device with large size, high density, a large aperture ratio and in which the disclination defects originating from a different in level of the lower layer wiring and an occurrence of disconnection failures in an upper layer wiring are suppressed.
Owner:VISTA PEAK VENTURES LLC
Display device, program, and information storage medium
ActiveUS20090284544A1Occurrence can be suppressedTelevision system detailsTelevision system scanning detailsDisplay devicePeak value
A display device includes: a brightness histogram information producing unit that produces brightness histogram information on the basis of an image signal; an APL calculating unit that calculates an APL on the basis of the brightness histogram information; a highest class determining unit that determines a highest class, which is a class with a highest brightness, on the basis of the brightness histogram information; an APL difference value calculating unit that calculates an APL difference value which is a difference value between an APL of a previous frame and an APL of a current frame; and a white peak value determining unit that determines a white peak value of a current frame by adding a predetermined value to a white peak value of a previous frame when a highest class difference absolute value, which is an absolute value of a difference value between a highest class of the previous frame and a highest class of the current frame, is less than a threshold value and that determines a white peak value of the current frame by performing a predetermined operation regardless of a white peak value of the previous frame when the highest class difference absolute value is equal to or larger than the threshold value.
Owner:SEIKO EPSON CORP
Water jet processing method
ActiveUS7585201B2Avoid damageInsufficient processing areaMetal working apparatusAbrasive blasting machinesFront edgeWater jet
Owner:DISCO CORP
Method for producing a wet-laid nonwoven fabric
ActiveUS10443167B2Occurrence can be suppressedEasy to confirmSemi-permeable membranesPaper/cardboardPapermakingSlurry
A method for producing a wet-laid nonwoven fabric for a semipermeable membrane supporting body, the method comprising: performing papermaking according to a wet papermaking method by using a fiber slurry containing a synthetic fiber as a main constituent fiber; drying the fiber slurry; subsequently subjecting the dried sheet to hot press processing two times by using a heat calender apparatus, wherein the hot press process temperature in the second treatments is adjusted to be higher by 10° C. or more than the hot press processing temperature in the first treatment, while treating the dried sheet by using a hard nip heat calender apparatus equipped with a combination of a metal roll and a metal roll for at least one time of the hot press processing; and thereby obtaining a wet-laid nonwoven fabric for a semipermeable membrane supporting body.
Owner:HOKUETSU KK
Polishing pad
ActiveUS20090093200A1Raise densitySuppress occurrenceLayered productsAbrasion apparatusEngineeringPore diameter
The present invention provides a polishing pad whose unevenness in thickness hardly occurs and whose life can be improved. A polishing pad 1 is provided with a polyurethane sheet 2. Foams 3 having lengths of about ½ of the length of the polyurethane sheet 2 in its thickness direction and elongated foams 4 having lengths of at least 70% of the length of the polyurethane sheet 2 in the thickness direction are formed in the polyurethane sheet 2. The foams 3 and the elongated foams 4 are opened by buffing processing so that opened pores 5 and opened pores 6 are formed at a polishing face P, respectively. Regarding the opened pores 5, 6, the total number of opened pores having opened pore diameters falling in a range of from 30 to 50 μm occupies at least 50% of the number of all opened pores. The total number of the opened pores 5, 6 per 1 mm2 of the polishing face P is set in a range of from 50 to 100. An average value of ratio of an opened pore diameter D1 of the opened pore 6 of the elongated foam 4 to an opened pore diameter D2 of the opened pore 6 at a depth position of at least 200 μm from the polishing face P is set in a range of from 0.65 to 0.95.
Owner:FUJIBO HLDG
Color imaging element and imaging apparatus
InactiveUS20140009647A1Big ratioGood reproducibilitySolid-state devicesSignal generator with single pick-up deviceComputer scienceBrightness perception
According to an aspect of the present invention, the first filters, which correspond to the two or more first colors that contribute to obtaining a brightness signal more than the second colors, are disposed within each pixel line in first direction to the fourth direction of the color filter arrangement, and it is configured so that the ratio of the number of pixels of the first colors corresponding to the first filters is larger than the ratio of the number of pixels of each color of the second colors corresponding to the second filters of two or more colors other than the first colors. Accordingly, the degree of reproducibility of the synchronization processing in a high-frequency wave area can be increased and the aliasing can be suppressed.
Owner:FUJIFILM CORP
Polishing pad
Owner:FUJIBO HLDG
Vehicle power transmission device
InactiveUS20130345009A1Suppression of generation of vibratory forceAvoid reaction forceHybrid vehiclesToothed gearingsEngineeringDistributed power
A vehicle power transmission device includes: a first planetary gear device distributing power from an engine to a first electric motor and a cylindrical output member having an output gear disposed on a portion in an axial center line direction on an outer circumferential side; and a second planetary gear device having a second sun gear coupled to a second electric motor, a second carrier fixed to a case, and a second ring gear coupled to an inner circumference of the cylindrical output member to reduce and transmit output rotation of the second electric motor to the cylindrical output member, the cylindrical output member being supported via a bearing disposed on an inner circumferential side of the cylindrical output member by the second carrier fixed to the case.
Owner:TOYOTA JIDOSHA KK
Control device
ActiveUS20110246009A1Reduce the amount requiredReduce the ratioDigital data processing detailsGas pressure propulsion mountingLow speedChange control
A control device for controlling a transmission configured such that when the speed change mechanism performs switching to a shift speed with a lower speed ratio in a negative torque prediction established state in which predicted input torque is negative, the predicted input torque being a predicted value of input torque input to the input member a predetermined determination reference time later, and being derived on the basis of variations in the input torque, special speed change control is executed in which a disengagement hydraulic pressure is lowered to cause a disengagement element to slip, and the disengagement element is maintained in a slipping state over an entire speed change process, which extends from a time point when the disengagement element starts slipping to a time point when a rotational speed is synchronized with a rotational speed of the input member.
Owner:AISIN AW CO LTD
Solid state imaging device and method for manufacturing the same
ActiveUS20090289282A1High yieldOccurrence can be suppressedTransistorSolid-state devicesPhotoelectric conversionEngineering
A solid state imaging device includes a transfer transistor for transferring signal charges generated by photoelectric conversion to a floating diffusion layer, a reset transistor for resetting a potential of the floating diffusion layer, and an amplifying transistor for outputting a signal corresponding to the potential of the floating diffusion layer. A low concentration impurity region having an impurity concentration lower than that of the first conductivity type semiconductor region is formed in part of a surface portion of the first conductivity type semiconductor region which is located below a gate electrode of the amplifying transistor and serves as a well region of the amplifying transistor.
Owner:PANASONIC SEMICON SOLUTIONS CO LTD
Display device and driving method of the same
InactiveUS20120242723A1Reduce displayOccurrence can be suppressedCathode-ray tube indicatorsSteroscopic systemsComputer graphics (images)Parallax barrier
In a display device in which a shape of a parallax barrier is changed depending on the relative positional relation to the viewer, the occurrence of crosstalk is suppressed. Images are displayed in a part of a plurality of sub-pixels included in each pixel, and images are not displayed in the other sub-pixels. That is, a display area in the pixel is reduced. Thus, the occurrence of crosstalk can be suppressed. Further, sub-pixels have a square shape or a substantially square shape. Thus, even when sub-pixels which display images are selected depending on the relative positional relation to the viewer, the shape of the display area in the pixel does not change greatly. Therefore, even in the case where the positional relationship is changed (in the case where the arranged parallax barrier is changed), the occurrence of crosstalk can be suppressed without respect to the positional relationship.
Owner:SEMICON ENERGY LAB CO LTD
Semiconductor device and manufacturing method of the same
InactiveUS20100327318A1Occurrence can be suppressedSolid-state devicesSemiconductor/solid-state device manufacturingOhmic contactDevice material
A semiconductor device capable of suppressing the occurrence of a punch-through phenomenon is provided. A first n-type conductive layer (2′) is formed on a substrate (1′). A p-type conductive layer (3′) is formed thereon. A second n-type conductive layer (4′) is formed thereon. On the under surface of the substrate (1′), there is a drain electrode (13′) connected to the first n-type conductive layer (2′). On the upper surface of the substrate (1′), there is a source electrode (11′) in ohmic contact with the second n-type conductive layer (4′), and a gate electrode (12′) in contact with the first n-type conductive layer (2′), p-type conductive layer (3′), the second n-type conductive layer (4′) through an insulation film (21′). The gate electrode (12′) and the source electrode (11′) are alternately arranged. The p-type conductive layer (3′) includes In.
Owner:NEC CORP
Terminal structure of extreme-low temperature equipment
InactiveUS6888060B2Lower performance requirementsOccurrence can be suppressedInsulated cablesCable fittings for cryogenic cablesRoom temperatureEngineering
A terminal structure of cryogenic equipment for leading a terminal of cryogenic equipment 100 from a very low temperature portion to a room temperature portion through a bushing, having a feature in that a connecting / heat-insulating portion 300 adiabatically connected with the aforementioned very low temperature portion 200 and the aforementioned room temperature portion 400 is provided along the outer circumference of the aforementioned bushing 30 between the aforementioned very low temperature portion 200 and the aforementioned room temperature portion 400.
Owner:SUMITOMO ELECTRIC IND LTD
Silicon Wafer And Method For Manufacturing The Same
ActiveUS20080131679A1Occurrence can be suppressedProcess be suppressedPolycrystalline material growthAfter-treatment detailsOxygenDislocation
Owner:SILTRONIC AG
Multiple valve device
ActiveUS20150107712A1Suppress fluctuationsOccurrence can be suppressedServomotor componentsServometer circuitsSpool valveEngineering
A valve housing of a multiple valve device is formed by being split into two parts, that is, a first housing block and a second housing block abutting against and separated away from each other at positions of facing joining surfaces. Three or more spool sliding bores are provided on the first housing block forming a three-dimensional structure. The other spool sliding bores are provided on the second housing block forming a three-dimensional structure. A relief valve for suppressing maximum pressures in a plurality of oil passages to a predetermined set pressure or less is provided on one of the first and second housing blocks. This relief valve is arranged at a position closer to the joining surfaces than each of the spool sliding bores provided in the one of housing blocks.
Owner:HITACHI CONSTR MASCH CO LTD
Chemical mechanical polishing method and method of manufacturing semiconductor device
ActiveUS20090239373A1FlatnessOccurrence can be suppressedOther chemical processesSemiconductor/solid-state device manufacturingOrganic filmCompound (substance)
Owner:KIOXIA CORP
Control device
ActiveUS20110239804A1Improve energy efficiencyOccurrence can be suppressedGas pressure propulsion mountingElectric machinesChange controlEngineering
A control device for controlling a transmission device configured such that when the speed change mechanism performs switching to a shift speed with a different speed ratio, special speed change control is executed in which a disengagement hydraulic pressure, is lowered to cause a disengagement element to slip, and in which the disengagement element is maintained in a slipping state over an entire speed change process. In the case where slipping of the disengagement element is not detected within a predetermined time after the disengagement hydraulic pressure is lowered at start of the special speed change control, pressure increase correction is performed in which an engagement hydraulic pressure, which is a hydraulic pressure of hydraulic oil for an engagement element that is a friction engagement element to be engaged, is raised until slipping of the disengagement element is detected.
Owner:AISIN AW CO LTD
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