The invention provides a BCD device and a preparation method thereof, the BCD device comprises a substrate, an epitaxial layer, a super junction VDMOS unit and a plurality of planar
transistor units, the epitaxial layer is located on a first surface of the substrate, the epitaxial layer is internally provided with a first region and at least one second region, and the second region is internally provided with at least one first medium
voltage well; the super-junction VDMOS unit comprises at least two second medium-
voltage traps and a back
metal layer, the second medium-
voltage traps are transversely arranged in the first region at intervals, and the back
metal layer is located on the second surface of the substrate and electrically connected with the substrate; part of composition structures of the planar
transistor units are located in the first medium-voltage traps in the corresponding second regions. The super-junction VDMOS unit is integrated in the BCD device, compared with a conventional
LDMOS unit, the super-junction VDMOS unit has better current capacity, smaller area occupation and higher reliability, the performance and reliability of the BCD device are improved, the first medium-voltage well and the second medium-voltage well are prepared synchronously, and the BCD device has the advantages of being simple in manufacturing method, low in cost, high in reliability and the like.