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32results about How to "Reduce mass" patented technology

Rapid high-yield needle mushroom cultivation method

The invention belongs to the technical field of edible fungi cultivation, and particularly relates to a rapid high-yield needle mushroom cultivation method. The method comprises the steps that a needle mushroom variety which has no infectious microbe and is suitable for growing in the local weather is selected as a seed source, wherein mycelia of the needle mushroom variety grow strongly and just grow all over without aging; corncobs, wood bits and wheat bran and the like are selected to be used as raw materials, then mixing, bagging, sterilizing, inoculation and cultivation are conducted on the raw materials, and fungi bags for production are obtained; finally, the whole cultivation process is completed through open type fruiting, fruiting management, harvesting and final-period management. According to the method, the measures that excellent variety is selected and used, the best cultivation season is mastered, the excellent raw materials and the best formula are adopted, and the cultivation mode is improved are adopted, so that the yield and the quality of needle mushrooms are further improved, the production cycle is shortened, production cost is substantially reduced, and economic benefits are substantially increased. The rapid high-yield needle mushroom cultivation method is particularly suitable for industrial, large-scaled and intensive production of needle mushrooms.
Owner:许超群

Method for obtaining distribution of charges along channel in mos transistor

The present invention discloses a method for obtaining a distribution of charges along a channel of a MOS transistor, which is used for obtaining distributions of interface states charges and charges of a gate dielectric layer in the MOS transistor. The method includes: adding a MOS transistor into a test circuit; measuring two charge pumping current curves when a source terminal is open-circuited or when a drain terminal is open-circuited before and after a stress is applied by using a charge pumping current test method, where one of the two charge pumping current curves is an original curve and the other one is an post-stress curve; finding a point B corresponding to a point A on the original curve on the post-stress curve, and estimating amount of locally-generated interface states charges and charges of the gate dielectric layer by a variation of the charge pumping current and a variation in a voltage at a local point. As compared with a conventional method for obtaining a distribution, the method of the present invention can obtain a distribution of charges along a direction form the drain or source terminal to the channel more easily and rapidly, with an aid of a computer. A mass of complicated and repeated tests are reduced. Also, the method can provide an effective base for improving device reliability.
Owner:PEKING UNIV

Shutter device used for exposure in lithography machine, and method for use thereof

A shutter device for use in exposure by a photolithography machine and a method of using the shutter device are disclosed. The device includes a shutter blade (1); a rotating motor (2) for driving the shutter blade (1) to rotate; a controller in electric connection with the rotating motor (2); and a supporter (3) for supporting the rotating motor (2). The shutter blade (1) includes a rotation center (11) and, disposed in correspondence with the rotation center (11), at least one open portion (12) and at least one shielding portion (13). The rotation center (11) is coupled to the rotating motor (2) which drives the shutter blade (1) to rotate so that the shutter device opening and closure are accomplished to enable and disable exposure. The shielding portion (13) includes a hollow portion (131) which significantly reduces the mass of the shutter blade (1), thereby facilitating the control over the rotation of the shutter blade (1). Under the control of the controller, the opening and closing of the shutter is accomplished during rotation of the shutter blade (1) at a constant speed, while the acceleration and deceleration of the shutter blade (1) take place in the period when the shutter device is in a closed state, which is relatively long and allows a large stroke. This significantly reduces the required torque of the rotating motor (2) and effectively shortens the shutter opening and closing time.
Owner:SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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