The invention relates to an asymmetric-structure high-power laser with a Bragg reflector and a preparation method thereof, and belongs to the field of lasers. The laser comprises a GaAs substrate, wherein a GaAs buffer layer, a Ga<1-x>In<x>P transition layer, an Al<1-x>InxP lower limiting layer, an (Al<1-x>Gax)yIn<1-y>P lower waveguide layer, a Ga<1-x>InxP quantum well light emitting region, a (Al<1-x>Gax) yIn<1-y>P upper waveguide layer, an Al<1-x>GaxAs Bragg reflection layer, an Al<1-x>GaxAs upper limiting layer and a GaAs cap layer are sequentially deposited on the GaAs substrate from bottom to top. According to the invention, a narrower spectral line width can be obtained, the internal loss is effectively reduced, the generation of heat is reduced, the electro-optical conversion efficiency is improved, the stability of the device is improved, the service life of the device is prolonged, and thus the 630-710nm series high-power semiconductor laser can be widely applied in long distance, multiple paths and the like.