The invention relates to the manufacturing method of a metal nanostructure array based on interface induction growth. The method comprises the following steps of 1, cleaning a substrate; 2, transferring a template, and transferring an ultrathin porous alumina template to the cleaned substrate; adjusting an adhesive force, standing a sample acquired from the step2 for several hours so that an adhesive force portion between the template and the substrate is relaxed, or through low temperature annealing, strengthening the adhesive force between the template and the substrate; 4, depositing metal,and depositing the metal on the surface of the sample obtained from the step3 by using a physical vapor deposition method; and 5, peeling the template, after the deposition is completed, using an adhesive tape to peel the template so that an ordered metal nanostructure array is left on the surface of the substrate, wherein under an adhesive force relaxation condition, an ordered nano-pore array is acquired, and under an adhesive force strengthening condition, an ordered nano-ring array is acquired. The technology of the method is simple, cost is low, and the method can be expanded to a waferscale.