54results about How to "Excellent pattern formation" patented technology

A pattern is formed through positive/negative reversal by coating a chemically amplified positive resist composition comprising an acid labile group-bearing resin, a photoacid generator, and an organic solvent onto a substrate, prebaking the resist composition, exposing the resist film to high-energy radiation, post-exposure heating, and developing the exposed resist film with an alkaline developer to form a positive pattern; irradiating or heating the positive pattern to facilitate elimination of acid labile groups and crosslinking for improving alkali solubility and imparting solvent resistance; coating a reversal film-forming composition thereon to form a reversal film; and applying an alkaline wet etchant thereto for dissolving away the positive pattern.

A pattern forming method includes preparing a target object including silicon with an initial pattern formed thereon and having a first line width; performing a plasma oxidation process on the silicon surface inside a process chamber of a plasma processing apparatus and thereby forming a silicon oxide film on a surface of the initial pattern; and removing the silicon oxide film. The pattern forming method is arranged to repeatedly perform formation of the silicon oxide film and removal of the silicon oxide film so as to form an objective pattern having a second line width finer than the first line width on the target object.

There is provided an imprint material from which a film having a high hardness can be formed. An imprint material comprising a component (A), a component (B) and a component (C), the component (A) being a compound having, in the molecule thereof, five or more polymerizable groups, the component (B) being a compound having, in the molecule thereof, two polymerizable groups, and the component (C) being a photo-radical generator.

In a halftone phase shift mask blank comprising a transparent substrate and a halftone phase shift film thereon, the halftone phase shift film is composed of a silicon base material consisting of silicon, nitrogen and 0-6 at % of oxygen, has a refractive index n of at least 2.4, an extinction coefficient k of 0.4-0.7, and a thickness of 40-67 nm. The halftone phase shift film is thin enough to be advantageous for photomask pattern formation, has chemical resistance against chemical cleaning, and maintains a necessary phase shift for phase shift function and a necessary transmittance for halftone function.

A pattern 121 provided on a transparent substrate 100 as a mask pattern includes partial patterns 121A and 121B. Each of the partial patterns 121A and 121B has a mask enhancer structure including a phase shifter 102 for transmitting exposing light in an opposite phase with respect to a transparent portion and a shielding portion 101 surrounding the phase shifter 102. The partial pattern 121A is close to other patterns 122 and 123 at distances not larger than a given distance with the transparent portion sandwiched therebetween. The width of the phase shifter 102A of the partial pattern 121A is smaller than the width of the phase shifter 102B of the partial pattern 121B.

The invention discloses a photonasty resin composition, relating to the negative type photonasty resin composition. The photonasty comprises a first resin of the repeated unit which is expressed by a certain structure, a binder polymer of the second resin (A), a polymer compound (B), a Polyfunctional thiol compound with more than three functions (C), a photopolymerization initiator (D) and a solution (E). The first resin is mixed with the second resin according to a weight ratio of 50:50-90:10, so that the pattern having an excellent reaction and durance is formed under the low temperature curing condition.

A positive photosensitive resin composition includes: (A) a polybenzoxazole precursor; (B) a photosensitive diazoquinone compound; (C) a silane compound; (D) a polyamic acid ester compound; and (E) a solvent. The positive photosensitive resin composition can reduce film shrinkage, can have high sensitivity, high resolution, and excellent residue removal properties, and can provide good pattern shapes.

Disclosed is a colored curable composition for color filters, which contains (1) at least one alkali-soluble resin selected from (meth)acrylic copolymers having an alicyclic (meth)acryloyl group in aside chain and copolymers having 0.001-0.20 eq/g of a (meth)acryloyl group and an acid value of 10-150, (2) a photopolymerization initiator, (3) a polymerizable monomer or oligomer having a partial structure selected from a urethane, an amide and a urea, and an ethylenically unsaturated double bond, and (4) a coloring agent. Also disclosed is a colored curable resin composition containing (a) a coloring agent, (b) a compound having at least one ethylenically unsaturated double bond, (c) a binder resin containing a (meth)acrylic copolymer having an alicyclic (meth)acryloyl group in a side chain, (d) a photopolymerization initiator, and (e) a compound having at least one ethylenically unsaturated double bond and a partial structure selected from a urethane, an amide and a urea in a molecule.

The invention relates to a colored photosensitive resin composition and a color filter manufactured by the same, and specifically relates to the colored photosensitive resin composition comprising a coloring agent, alkali-soluble resin, a photo-polymerization compound, and a photo-polymerization initiator and a solvent. By the use of the green pigment, first resin and second resin in the colored photosensitive resin composition, the color filter has a wide color representation range, is high in contrast ratio and brightness, and is excellent in tinting strength, image definition performance, developing performance, sensitivity and sealing performance, wherein the green pigment includes pigment green 7 and is included in the coloring agent, the first resin includes an epoxy group and is included in the alkali-soluble resin, the second resin includes an acid group capable of reacting with the epoxy group, and the acid value of the acid group is 170-300 mgKOH/g.

The invention provides a photo-curing color composition, comprising a photopolymerization initiator with a specific chemical structure; more than ore black dye selected from (A) carbon black with a specific surface area less than 110m2 and pH of 2-9, (B) carbon black coated by the silica, and (C) carbon black coated by the resin; and a composition including the ethylenically unsaturated groups which can be additively polymerized. Moreover, the invention provides a color filter having the color patterns formed by the photo-curing color composition.

The invention provides a photo-curing color composition and a color filter thereby. The photo-curing color composition includes: a photopolymerization initiator containing the heterocycle of the composition represented by the general formula (I)-(V); a scattered colouring pigment used for an alkaline soluble branched macromolecular compound with the poly(methyl)acrylic ester chain at the side chain; and a polymerized compound. The photopolymerization initiator comprises the compound of the general formula (IV), hydrogen atom, alkyl represented by R1, R2, and groups represented by the general formula (IV-A) or (IV-B); R3, R4 represent halogen atom and alkyl; X, T represent chlorine atom or bromine atom. m, n are integers of 0-3.

The invention provides a colored photosensitive resin composition, a color filter containing the same and a liquid crystal display device with the color filter. The colored photosensitive resin composition contains a colorant (A), adhesive resin (B), a photopolymerizable compound (C), a photopolymerization initiator (D) and a solvent (E), wherein the colorant (A) contains C. I. pigment green 7, C. I. pigment yellow 185, and C. I. pigment yellow 129. The colored photosensitive resin composition has high contrast and brightness and excellent color intensity and patterning performance.

A imprint material is provided, and a film that is prepared from the material and to which the pattern is transferred. An imprint material including: (A), (B), (C) and (D) components; a ratio of the amount of the (B) component to a total amount of the (A) component and the (B) component of 100% by mass is 5% by mass or more and 25% by mass or less: (A) a silsesquioxane compound having a repeating unit of Formula (1) and having two or more polymerizable groups of X⁰ in Formula (1); (B) a silicone compound having a repeating unit of Formula (2) and having two polymerizable groups at ends thereof; (C) a photopolymerization initiator; and (D) a solvent

wherein the formulae, R¹ and R² are each independently a C_1-3 alkyl group; R⁰ is a C_1-3 alkylene group; and k is an integer of 0 to 3.