55results about How to "Excellent pattern formation" patented technology

A pattern is formed through positive / negative reversal by coating a chemically amplified positive resist composition comprising an acid labile group-bearing resin, a photoacid generator, and an organic solvent onto a substrate, prebaking the resist composition, exposing the resist film to high-energy radiation, post-exposure heating, and developing the exposed resist film with an alkaline developer to form a positive pattern; irradiating or heating the positive pattern to facilitate elimination of acid labile groups and crosslinking for improving alkali solubility and imparting solvent resistance; coating a reversal film-forming composition thereon to form a reversal film; and applying an alkaline wet etchant thereto for dissolving away the positive pattern.

A highly reliable semiconductor device and a method for manufacturing the semiconductor device are provided. In a semiconductor device including a bottom-gate transistor in which an insulating layer functioning as a channel protective film is provided over an oxide semiconductor film, elements contained in an etching gas can be prevented from remaining as impurities on a surface of the oxide semiconductor film by performing impurity-removing process after formation of an insulating layer provided over and in contact with the oxide semiconductor film and / or formation of source and drain electrode layers. The impurity concentration in the surface of the oxide semiconductor film is lower than or equal to 5×1018 atoms / cm3, preferably lower than or equal to 1×1018 atoms / cm3.

A pattern forming method includes preparing a target object including silicon with an initial pattern formed thereon and having a first line width; performing a plasma oxidation process on the silicon surface inside a process chamber of a plasma processing apparatus and thereby forming a silicon oxide film on a surface of the initial pattern; and removing the silicon oxide film. The pattern forming method is arranged to repeatedly perform formation of the silicon oxide film and removal of the silicon oxide film so as to form an objective pattern having a second line width finer than the first line width on the target object.

In a phase shift mask blank comprising a transparent substrate and a phase shift film deposited thereon and having a phase shift of 150-200° with respect to sub-200 nm light, the phase shift film is composed of a silicon base material consisting of silicon, nitrogen and optionally oxygen, has a thickness of up to 70 nm, and provides a warpage change of up to 0.2 μm in a central region of a surface of the substrate before and after the deposition of the phase shift film on the substrate.

Provided is a negative-type photosensitive resin composition comprising a resin compound (A) having a weight-average molecular weight of at least 1000, a (meth)acryloyl compound (B), a silane-modified resin (C), a radical-generating photopolymerization initiator (D), and an epoxy group-containing crosslinking agent (E) which does not contain a silicon atom, wherein the resin compound (A) is provided with a resin compound (A1) having two or more (meth)acryloyl groups in each molecule and having a carboxyl group which reacts with the epoxy group, and the (meth)acryloyl compound (B) has a weight-average molecular weight less than 1000 and has two or more (meth)acryloyl groups in each molecule.

There is provided an imprint material from which a film having a high hardness can be formed. An imprint material comprising a component (A), a component (B) and a component (C), the component (A) being a compound having, in the molecule thereof, five or more polymerizable groups, the component (B) being a compound having, in the molecule thereof, two polymerizable groups, and the component (C) being a photo-radical generator.

In a halftone phase shift mask blank comprising a transparent substrate and a halftone phase shift film thereon, the halftone phase shift film is composed of a silicon base material consisting of silicon, nitrogen and 0-6 at % of oxygen, has a refractive index n of at least 2.4, an extinction coefficient k of 0.4-0.7, and a thickness of 40-67 nm. The halftone phase shift film is thin enough to be advantageous for photomask pattern formation, has chemical resistance against chemical cleaning, and maintains a necessary phase shift for phase shift function and a necessary transmittance for halftone function.

The invention relates to a positive radiation sensitive composition, an interlayer insulation film and a forming method thereof. The invention aims to provide a positive radiation sensitive composition, an interlayer insulation film formed by the composition and a method for forming the interlayer insulation film. The positive radiation sensitive composition has excellent radiation sensitivity. The obtained interlayer insulation film which has high light transmittance and a high voltage conservation rate further has good development and excellent pattern forming performance by which the interlayer insulation film can deal with forming condition changes of curing films. The invention relates to a positive radiation sensitive composition having a polymer (A) provided with a structural unit representing a group in formula (1) in the same or different polymer molecules and an epoxy radical structural unit, a light acid generation agent (B) and long alkyl group compound (C).

The invention provides: a composition for forming a cured film, which forms a cured film having excellent photoreaction efficiency, solvent resistance, high adhesion and alignment uniformity; an alignment material for optical alignment; and a phase difference material which is formed using the alignment material. A composition for forming a cured film, which contains (A) a compound that has an optical alignment group and one substituent selected from among a hydroxy group, a carboxyl group and an amino group, (B) a hydrophilic polymer having one or more substituents selected from among a hydroxy group, a carboxyl group and an amino group, and (C) a polymer that is obtained by polymerizing a monomer containing an N-hydroxymethyl compound or an N-alkoxymethyl (meth)acrylamide compound. This composition for forming a cured film additionally contains, if necessary, (D) a crosslinking catalyst. An alignment material is produced by forming a cured film with use of this composition for forming a cured film, while utilizing an optical alignment technique. A phase difference material is obtained by applying a polymerizable liquid crystal over the alignment material and curing the polymerizable liquid crystal thereon.

A pattern 121 provided on a transparent substrate 100 as a mask pattern includes partial patterns 121A and 121B. Each of the partial patterns 121A and 121B has a mask enhancer structure including a phase shifter 102 for transmitting exposing light in an opposite phase with respect to a transparent portion and a shielding portion 101 surrounding the phase shifter 102. The partial pattern 121A is close to other patterns 122 and 123 at distances not larger than a given distance with the transparent portion sandwiched therebetween. The width of the phase shifter 102A of the partial pattern 121A is smaller than the width of the phase shifter 102B of the partial pattern 121B.

A positive photosensitive resin composition includes: (A) a polybenzoxazole precursor; (B) a photosensitive diazoquinone compound; (C) a silane compound; (D) a polyamic acid ester compound; and (E) a solvent. The positive photosensitive resin composition can reduce film shrinkage, can have high sensitivity, high resolution, and excellent residue removal properties, and can provide good pattern shapes.

Disclosed is a colored curable composition for color filters, which contains (1) at least one alkali-soluble resin selected from (meth)acrylic copolymers having an alicyclic (meth)acryloyl group in aside chain and copolymers having 0.001-0.20 eq / g of a (meth)acryloyl group and an acid value of 10-150, (2) a photopolymerization initiator, (3) a polymerizable monomer or oligomer having a partial structure selected from a urethane, an amide and a urea, and an ethylenically unsaturated double bond, and (4) a coloring agent. Also disclosed is a colored curable resin composition containing (a) a coloring agent, (b) a compound having at least one ethylenically unsaturated double bond, (c) a binder resin containing a (meth)acrylic copolymer having an alicyclic (meth)acryloyl group in a side chain, (d) a photopolymerization initiator, and (e) a compound having at least one ethylenically unsaturated double bond and a partial structure selected from a urethane, an amide and a urea in a molecule.

The fine pattern forming material comprises a water-soluble component which is cross-linkable by the presence of an acid, and water and / or a water-soluble organic solvent, wherein the water-soluble component is at least one selected from the group consisting of a water-soluble polymer, a water-soluble monomer, a water-soluble oligomer, a copolymer of a water-soluble monomer and salts of these. The fine pattern forming material is formed on a resist pattern 4 capable of supplying the acid and the water-soluble component causes a cross-linking reaction under the acid from the resist pattern 4 in parts in contact with the resist pattern 4 to form a water-or alkali-insoluble film 6.

Disclosed is a positive photosensitive resin composition that includes: (A) a polybenzoxazole precursor including a repeating unit represented by the Chemical Formula 1, a repeating unit represented by the Chemical Formula 2, or a combination thereof, and a thermally polymerizable functional group at least one terminal end of the polybenzoxazole precursor; (B) a photosensitive diazoquinone compound; (C) a silane compound; (D) a phenol compound including a cross-linking functional group; and (E) a solvent.

The invention relates to a colored photosensitive resin composition and a color filter manufactured by the same, and specifically relates to the colored photosensitive resin composition comprising a coloring agent, alkali-soluble resin, a photo-polymerization compound, and a photo-polymerization initiator and a solvent. By the use of the green pigment, first resin and second resin in the colored photosensitive resin composition, the color filter has a wide color representation range, is high in contrast ratio and brightness, and is excellent in tinting strength, image definition performance, developing performance, sensitivity and sealing performance, wherein the green pigment includes pigment green 7 and is included in the coloring agent, the first resin includes an epoxy group and is included in the alkali-soluble resin, the second resin includes an acid group capable of reacting with the epoxy group, and the acid value of the acid group is 170-300 mgKOH / g.

In a halftone phase shift mask blank comprising a transparent substrate and a halftone phase shift film thereon, the halftone phase shift film is composed of a silicon base material consisting of silicon, nitrogen and 0-6 at % of oxygen, has a refractive index n of at least 2.4, an extinction coefficient k of 0.4-0.7, and a thickness of 40-67 nm. The halftone phase shift film is thin enough to be advantageous for photomask pattern formation, has chemical resistance against chemical cleaning, and maintains a necessary phase shift for phase shift function and a necessary transmittance for halftone function.

An aim of the invention is to provide a cured-film formation composition for forming a cured film having photoreaction efficiency and solvent resistance, and high adhesiveness alignment uniformity, and an orientation material for photo-alignment, and a retardation material formed by use of the orientation material. A cured-film formation composition includes (A) a compound having a photo-aligning group and one substituent selected from a hydroxy group, a carboxy group, and an amino group; (B) a hydrophilic polymer having one or more substituents selected from a hydroxy group, a carboxy group, and an amino group; and (C) a polymer obtained by polymerizing a monomer including an N-hydroxymethyl compound or an N-alkoxymethyl (meth)acrylamide compound, and optionally further a cross-linking catalyst as a component (D). By use of the composition, a cured-film is formed and an orientation material is formed by utilizing photo-alignment technique. A retardation material is obtained by applying a polymerizable liquid crystal on the orientation material and curing it.

The invention provides a photo-curing color composition, comprising a photopolymerization initiator with a specific chemical structure; more than ore black dye selected from (A) carbon black with a specific surface area less than 110m2 and pH of 2-9, (B) carbon black coated by the silica, and (C) carbon black coated by the resin; and a composition including the ethylenically unsaturated groups which can be additively polymerized. Moreover, the invention provides a color filter having the color patterns formed by the photo-curing color composition.

The invention provides a photo-curing color composition and a color filter thereby. The photo-curing color composition includes: a photopolymerization initiator containing the heterocycle of the composition represented by the general formula (I)-(V); a scattered colouring pigment used for an alkaline soluble branched macromolecular compound with the poly(methyl)acrylic ester chain at the side chain; and a polymerized compound. The photopolymerization initiator comprises the compound of the general formula (IV), hydrogen atom, alkyl represented by R1, R2, and groups represented by the general formula (IV-A) or (IV-B); R3, R4 represent halogen atom and alkyl; X, T represent chlorine atom or bromine atom. m, n are integers of 0-3.

The invention provides a colored photosensitive resin composition, a color filter containing the same and a liquid crystal display device with the color filter. The colored photosensitive resin composition contains a colorant (A), adhesive resin (B), a photopolymerizable compound (C), a photopolymerization initiator (D) and a solvent (E), wherein the colorant (A) contains C. I. pigment green 7, C. I. pigment yellow 185, and C. I. pigment yellow 129. The colored photosensitive resin composition has high contrast and brightness and excellent color intensity and patterning performance.

A imprint material is provided, and a film that is prepared from the material and to which the pattern is transferred. An imprint material including: (A), (B), (C) and (D) components; a ratio of the amount of the (B) component to a total amount of the (A) component and the (B) component of 100% by mass is 5% by mass or more and 25% by mass or less: (A) a silsesquioxane compound having a repeating unit of Formula (1) and having two or more polymerizable groups of X0 in Formula (1); (B) a silicone compound having a repeating unit of Formula (2) and having two polymerizable groups at ends thereof; (C) a photopolymerization initiator; and (D) a solventwherein the formulae, R1 and R2 are each independently a C1-3 alkyl group; R0 is a C1-3 alkylene group; and k is an integer of 0 to 3.

Solving problems in the prior art, provided are a resist polymer which is small in lot-to-lot, reactor-to-reactor and scale-to-scale variations, and contains no high polymer, is excellent in solubility and storage stability, and is suitable for fine pattern formation, and a method for production thereof. The present invention provides the resist polymer at least having a repeating unit having a structure which is decomposed by an acid to become soluble in an alkali developer and a repeating unit having a polar group to enhance adhesion to a substrate, characterized in that a peak area of a high molecular weight component (high polymer) with molecular weight of 100,000 or more is 0.1% or less based on an entire peak area in a molecular weight distribution determined, by gel permeation chromatography (GPC).