41results about How to "Small defect" patented technology

A tempered glass substrate of the present invention is a tempered glass substrate, which has a compression stress layer on a surface thereof, and has a glass composition comprising, in terms of mass %, 40 to 71% of SiO2, 3 to 21% of Al2O3, 0 to 3.5% of Li2O, 7 to 20% of Na2O, and 0 to 15% of K2O.

A steel sheet for a hot stamping member contains, as a chemical composition, 0.10 mass % to 0.35 mass % of C; 0.01 mass % to 1.0 mass % of Si; 0.3 mass % to 2.3 mass % of Mn; 0.01 mass % to 0.5 mass % of Al; limited to 0.03 mass % or less of P; limited to 0.02 mass % or less of S; limited to 0.1 mass % or less of N; and a balance consisting of Fe and unavoidable impurities, in which a standard deviation of diameters of iron carbides which are contained in a region from a surface to a ¼ thickness position of the steel sheet is less than or equal to 0.8 μm.

An SOI wafer including: a supporting substrate 1; a BOX layer 2 provided above the supporting substrate 1, the BOX layer 2 being formed by a thermal oxidization; a gettering layer 3 provided immediately on the BOX layer 2 and mainly composed of a silicon which contains one or more of oxygen, carbon and nitrogen and contains at least oxygen; and an S layer 4 in which semiconductor devices are to be formed, the S layer 4 being mainly composed of a monocrystalline silicon.

An object of the present invention is to provide a silicon single crystal pulling method of accurately controlling the diameter of a silicon single crystal, thereby obtaining a high-quality silicon single crystal with little crystal defect.According to an aspect of the present invention, the pulling step includes: capturing an image of the silicon single crystal using an imaging device; measuring the brightness distribution of a fusing ring generated in the vicinity of a solid-liquid interface between the silicon melt and the silicon single crystal for each image scan line in the image captured by the imaging device; detecting the liquid level of the silicon melt and the position of the solid-liquid interface; and controlling the diameter of the silicon single crystal on the basis of a meniscus height, which is a difference between the liquid level and the position of the solid-liquid interface.

The present invention provides a photochromic film which is formed by curing a photochromic composition and includes a multifunctional (metha)acrylate-based monomer that has two or more functional groups, and a photochromic dye, a product including the same, and a method for producing the photochromic film.

A positive resist composition comprising (A) a resin which contains all of the repeating units represented by formulae (I) to (III), and becomes soluble in an alkali developer by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and a pattern forming method using the composition. A represents a group capable of decomposing and leaving by the action of an acid, each R1 independently represents hydrogen or a methyl group, R2 represents a phenyl group or a cyclohexyl group, m represents 1 or 2, and n represents an integer of 0 to 2. By virtue of this construction, a resist composition ensuring high resolution, good pattern profile, sufficient depth of focus, little defects after development, and sufficiently high plasma etching resistance is provided.

By preparing a polyimide film with a face at the support side and subjected to a surface treatment; subjecting at least one of a face of the support and the face of the polyimide film which are opposite to each other to a patterning treatment using a coupling agent to form a satisfactorily bondable part and an easily releasable part which differ in adhesion / peel strength; subsequently, superposing the support and the polyimide film to be subjected to a pressurizing / heating treatment and to be bonded to each other, subjecting the surface of the polyimide film to an organic alkali treatment; and then, applying a polyamic acid solution free from a slip agent ingredient, drying the coating film and imidizing the film, a layered product having a structure of at least three layers in which at least one layer contains a slip agent material and both surface layers have no slip agent material is produced.

A composition for forming a silica layer includes a silicon-containing polymer and a mixed solvent including at least two solvents, wherein the mixed solvent has a surface tension of about 5 mN / m to about 35 mN / m at a temperature of about 25° C.