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10results about How to "Avoid overcutting" patented technology

Curvature-adaptive variable voltage amplitude-frequency water-conductance laser curve processing method and device

PendingCN122274406ARealize adaptive dynamic adjustmentFully match the response speed
This application discloses a method and apparatus for water-guided laser curve processing based on curvature adaptive variable voltage amplitude-frequency, relating to the field of water-guided laser processing technology. It includes: collecting curvature radius data at various points along the water-guided laser processing path; establishing a control mapping model between the curvature radius and deflection voltage parameters based on the curvature radius data; wherein the deflection voltage parameters include voltage amplitude and driving frequency; using the curvature radius of the current processing point as input, obtaining a target voltage amplitude and target driving frequency that match the curve characteristics corresponding to the current curvature radius through the control mapping model; converting the target voltage amplitude and target driving frequency into driving signals and outputting them to the deflection electrode array to dynamically adjust the deflection voltage parameters and control the water beam to complete deflection scanning processing along a preset curve trajectory. This solves the problems of mismatch between deflection response and curve geometry, large trajectory tracking errors, and poor surface quality consistency in existing curve processing technologies.
Owner:CHANGZHOU INST OF MECHATRONIC TECH +1

Process method for improving Pad opening of silicon-based OLED (Organic Light Emitting Diode)

PendingCN121793611AIncrease process windowReduce processing difficulty
The invention relates to the technical field of silicon-based OLED (Organic Light Emitting Diode) product preparation processes, and discloses a process method for improving Pad opening of a silicon-based OLED, which comprises the following steps of: treating an initial substrate; depositing an organic material; packaging with a thin film; coating a photoresist; etching the Pad region; and demolding the substrate. According to the invention, the evaporation mask is designed, during the evaporation process, the AA area and the Pad area are evaporated with the organic material at the same time, during film packaging of the Pad area, the organic layer material is located between the packaging layer and Pad metal, the organic layer material is relatively loose and plays a buffering role during dry etching, the process window of the dry etching process is enlarged, and the production efficiency of the dry etching process is improved. The problems of unclean dry etching and over etching are avoided, the process difficulty of the dry etching process is reduced, and the mass production yield and reliability of the device are improved.
Owner:安徽芯视佳半导体显示科技有限公司

Image sensor and manufacturing method

ActiveCN116779620Breduce crosstalkReduce optical crosstalkMetal interconnectEtching
The application relates to the technical field of image sensors, and provides an image sensor and a manufacturing method.The image sensor comprises a semiconductor substrate, a plurality of pixel regions, a metal interconnection layer and a blocking structure.The blocking structure is composed of an isolation structure arranged in the semiconductor substrate, a crosstalk modulation structure and a first contact hole structure which are sequentially arranged in a dielectric layer and correspond to the isolation structure.The blocking structure can form an effective light blocking wall structure on one hand, preventing light of one pixel region from being reflected by the metal interconnection layer and crosstalking into an adjacent pixel region; and on the other hand, the blocking structure can prevent over-etching of the isolation structure during processing of the first contact hole structure, thereby reducing the enrichment and diffusion of charges in the isolation structure, effectively improving the dark current performance of the device, and simultaneously reducing optical crosstalk and electrical crosstalk of the image sensor, which is conducive to improving the imaging quality of the image sensor.
Owner:SMARTSENS TECH (SHANGHAI) CO LTD

A simple clamp for metal processing

ActiveCN224273354UAchieve center alignment positioning effectReduced processing performanceChucksMetal machiningTitanium alloy
This utility model relates to a simple clamping fixture for metal processing, belonging to the technical field of metal processing equipment. The clamping module includes a first clamping block made of titanium alloy, which is a flat metal block with a semi-circular appearance. The first clamping block is guided and connected to a second clamping block via a limiting rod. The second clamping block is made of the same material and has the same appearance as the first clamping block. The second clamping block can maintain relative clamping with the first clamping block at different opening and closing angles on a three-jaw chuck via the limiting rod. This utility model provides a simple clamping fixture for metal processing with a convenient structure, simple and quick operation, and the ability to accurately align the center of block-shaped metal materials, reducing excessive cutting losses during processing.
Owner:SUZHOU XINHANYUAN SEMICONDUCTOR MATERIALS CO LTD

Short-wave indium gallium arsenic infrared detector based on flexible substrate and preparation method thereof

PendingCN121815805ASolve the process difficulties of being unable to completely remove the substrateSolve process difficultiesIndiumContact layer
The invention provides a short-wave indium gallium arsenic infrared detector based on a flexible substrate and a preparation method thereof, and belongs to the technical field of short-wave infrared detectors. The problem that a traditional InP-based indium gallium arsenic short wave infrared detector is too high in rigidity and cannot be used in buckling and special-shaped environments is solved. The method comprises the following steps: growing an N-type sacrificial layer on a substrate, wherein the N-type sacrificial layer and the substrate have high selectivity; growing an N-type buffer layer on the surface of the sacrificial layer; growing an absorption layer of a short-wave channel on the surface of the buffer layer; growing a contact layer on the surface of the absorption layer; growing a cap layer on the surface of the contact layer; manufacturing an N groove; depositing a mask; forming a P-type diffusion doping region through a diffusion process; annealing treatment is carried out after diffusion; preparing and annealing a P electrode; preparing an N electrode; removing the sacrificial layer and transferring the rest of the epitaxial structure to a flexible target substrate; the invention is applied to the infrared detector.
Owner:ZHONGBEI UNIV

Dynamic reducing cutting device for pipeline repair and construction method

A dynamic variable-diameter cutting device for pipeline repair belongs to the technical field of pipeline repair and comprises a machine head and a variable-diameter structure arranged in the machine head and used for cutting a pipeline, and the variable-diameter structure comprises a rotating component and a variable-diameter component; therefore, the diameter of a circle formed by the four sets of second cutterheads is smoothly increased, it is ensured that the first cutterheads and the second cutterheads make contact with a to-be-cut pipeline-soil body mixture all the time, drill jamming or excessive cutting of undisturbed soil is avoided, meanwhile, through protection of a protective cover, a double-face tooth ring and a second motor are covered inside, and the working efficiency is improved. On this basis, dynamic adjustment of cutting parameters is achieved through the structure, irregular defects such as serious fluctuation and collapse of a pipeline can be precisely treated, precision adjustment is ensured through a driving gear, a first bevel gear and a double-face tooth ring transmission system, the adaptability is improved compared with a pipe cracking method, the system reliability is enhanced, and the service life of the system is prolonged. The maintenance time is shortened.
Owner:CCCC SHANGHAI DREDGING CO LTD

Controllable constant force floating unit and belt sander

ActiveCN224390728Uconstant support forceAvoid overcuttingBelt grinding machinesSanderConstant force
The utility model relates to a controllable constant force floating unit and abrasive belt machine belong to the field of polishing equipment, the utility model discloses a fixed frame, its structural characteristics lie in: still include the floating structure of installing on the fixed frame, the floating structure includes floating cylinder, floating swing arm and polishing wheel, the cylinder barrel of floating cylinder installs on the fixed frame, the piston rod of floating cylinder and the one end of floating swing arm contact, the polishing wheel installs on the other end of floating swing arm, the middle part rotation of floating swing arm installs on the fixed frame, the cylinder barrel of floating cylinder is equipped with the limiting frame for the limiting of one end of floating swing arm, the fixed frame includes support, support and branch, the support is fixed with support, the branch is fixed with support, the cylinder barrel of floating cylinder installs on the support, the middle part rotation of floating swing arm installs on the branch.
Owner:杭州龙砺智能科技有限公司

Regulator for regulating polyurethane polishing pad and chemical mechanical polishing system

PendingCN121756238AAvoid uneven wearImprove grinding flatnessAbrasive surface conditioning devicesLapping toolsWaferingSlurry
The invention discloses a regulator for regulating a polyurethane polishing pad and a chemical mechanical polishing system, and belongs to the technical field of semiconductor manufacturing CMP. The regulator comprises a titanium alloy base material, and the working surface of the titanium alloy base material is divided into a coarse regulation area, a fine regulation area and a guide and discharge area which are arranged in a step shape in the radial direction to form a radial gradient pressure regulation structure. The coarse adjustment area is provided with an elastic buffer layer and coarse abrasive particles and is used for pressure equalizing and macroscopic finishing; fine abrasive particles are embedded in the fine adjustment area at a specific inclination angle to form a multidirectional cutting edge which is used for adapting to the elasticity of the pad and maintaining the microstructure; the guide and discharge area is provided with a spiral slurry guide groove and nano bulges on the inner wall of the groove to synergistically realize rapid slurry discharge and deep cleaning of pores; the surface of the regulator is covered with a temperature-sensitive self-adaptive coating, the hardness of the regulator changes along with the temperature to be matched with the temperature change characteristic of the polishing pad, and an active heat dissipation channel is integrated in the base material. According to the system, the problems of uneven abrasion, pore blockage, abrasive particle falling and thermal mismatch of the polyurethane pad are solved, the wafer grinding flatness is remarkably improved, the scratch rate is reduced, and the service life of the polishing pad and the service life of a regulator are prolonged.
Owner:SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI +1

Adjustable leather product polishing device

ActiveCN224212674UAvoid overcuttingAvoid missing areasLeather pressing/rollingSkins/hides/leather/fur manufacturing apparatusPolishingElectric machinery
The utility model discloses an adjustable leatherware polishing device, relates to polishing equipment technical field, including the work bench, the top end both sides of the work bench are provided with vertical plate, and the surface of vertical plate is provided with through groove, and the inside of through groove is slidingly provided with moving block, one side of moving block is rotatingly connected with the polishing roller, and the other side of moving block is rotatingly connected with the polishing roller. A first motor used for driving the grinding roller is installed on one side of the moving block, and the top end of the vertical plate is connected with a first air cylinder connected with the top end of the moving block. A transverse plate is arranged on one side of the vertical plate, a first support with the U-shaped section is arranged on one side of the transverse plate, and a second support is arranged at the bottom end of the first support in a sliding mode. According to the leather product polishing device, the pressing roller can be actively attached to the surface of a leather product through lifting adjustment, local protrusions such as edge warping and soft leather wrinkles caused by clamp deformation, material elasticity or machining errors are immediately flattened before polishing or in the polishing process, and excessive cutting or area omission caused by uneven contact force of the polishing head is avoided.
Owner:CHALING COUNTY YAPAI LEATHER PROD CO LTD

Self-adaptive compensation clamp

PendingCN121798399AAvoid uneven wall thicknessAvoid overcuttingPositioning apparatusMetal-working holdersMachining deformationClassical mechanics
According to the self-adaptive compensation clamp, an X-Y direction compensation module is formed by the first linear sliding rail and the second linear sliding rail which are perpendicular to each other in direction, displacement deviation, generated by stress release, of a workpiece in the horizontal plane is absorbed and compensated, rigid constraint of a traditional bolt pressing plate is replaced, and meanwhile the self-adaptive compensation clamp has the advantages of being simple in structure and convenient to use. A Z-direction height and angle self-adaptive mechanism is formed by matching a plurality of adjusting cylinders capable of independently and axially stretching out and drawing back at the bottom of the first self-adaptive unit with the connecting unit, and the Z-direction height and angle self-adaptive mechanism can actively fit workpiece bending and torsion caused by self-weight or stress release, so that self-weight deformation is effectively resisted; and finally, a clamping air cylinder and a clamping arm which are integrated in a connecting unit are used for locking an adjusting cylinder, and a locking device at the bottom is used for locking the position of an X-Y compensation module, so that stable support is provided for finish machining, the phenomena of non-uniform wall thickness and over-cutting of the web plate are avoided, multi-dimensional self-adaptive compensation and accurate locking of machining deformation of the large thin-wall part are realized, and the machining precision of the large thin-wall part is improved. And the size precision and the shape precision of final machining are also ensured.
Owner:NORTH CHINA INST OF AEROSPACE ENG