The invention relates to a method and equipment for forming optical films with various functions on a workpiece. A pulse plasma chemical vapor deposition method is adopted as the method. The method comprises the following steps that a, the workpiece is fixedly arranged in a sealed microwave cover, and the sealed microwave cover is vacuumized; b, oxygen is led into the sealed microwave cover, pulse microwaves are guided into the sealed microwave cover, and reaction is carried out for a certain time; c, gas containing film-forming component elements is led into the sealed microwave cover, the oxygen is continued to be led into the sealed microwave cover, the pulse microwaves are continued to be guided into the sealed microwave cover, reaction is carried out for a certain time, then, the gas is stopped from being led into the sealed microwave cover, and the pulse microwaves are stopped from being guided into the sealed microwave cover. The pulse plasma chemical vapor deposition method has the high deposition efficiency, the whole process only needs few minutes, and therefore the production efficiency is quite high; plasmas of the oxygen perform plasma cleaning and surface activation treatment on the surface of the workpiece before film forming, and therefore film adhesion is greatly improved; therefore, the product quality is improved.