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200results about How to "Improve bond reliability" patented technology

Optical-use pressure-sensitive adhesive sheet

The invention provides an optical-use adhesive sheet excellent in adhesiveness under bending, twisting or distorting stress. The optical-use adhesive sheet has an adhesive layer having a storage elastic modulus at 80 DEG C of at least 2.0X10 4 Pa and a loss elastic modulus at 80 DEG C of at least 1.0X10 4 Pa, the optical-use adhesive sheet is characterized in that the adhesive sheet has a peel force, as measured in the L-shape peel test, of at least 0.16 MPa, and has a peel distance, as measured in the constant-load peel test, of at most 50 mm. In the L-shape peel test, an L-shaped stainless steel clamp is adhered with an acrylicresin plate through the adhesive sheet, the acrylicresin plate and the stainless steel clamp are processed for 15 minutes at 50 DEG C under 5 atm, and then, the stainless steel clamp is drawn along a direction vertical to a surface of the acrylicresin plate so as to test the peel force. In the constant-load peel test, a double-faced adhesive sheet is adhered on the acrylicresin plate, then, the acrylicresin plate and the double-faced adhesive sheet are processed for 10 minutes at 50 DEG C under 5 atm, and then, a load of 100gf is applied along the direction vertical to the surface of the acrylicresin plate on a tail end in a length direction of the adhesive sheet so as to test the peel distance of the adhesive sheet after 3 hours.
Owner:NITTO DENKO CORP

High-temperature-resistant bismaleimide resin carrier structure adhesive film and preparation method thereof

The invention provides a high-temperature-resistant bismaleimide resin carrier structure adhesive film and a preparation method thereof, and relates to a high-temperature curing high-temperature-resistant structure adhesive. The invention aims to solve the problems that the conventional bismaleimide adhesive film does not have high temperature-resistant grade and high toughness. The adhesive film consists of bismaleimide resin, a technical modifier, a toughening modifier, a compatibilizer and a thixotropic agent. The preparation method comprises the following steps of: performing prepolymerization on the bismaleimide resin and the technical modifier to obtain a bismaleimide resin prepolymer; mixing the bismaleimide resin prepolymer, the toughening modifier, the compatibilizer and the thixotropic agent uniformly by a mechanical blending method to prepare an adhesive material; and preparing the adhesive by using a three-roller coating film-making machine under the film-forming assistance of the carrier. The adhesive has the characteristics of high-temperature resistance and high toughness, wherein the glass-transition temperature reaches above 280 DEG C and the honeycomb roller peeling strength reaches about 75.0 N.m / m. The adhesive is applied to adhesion of metal or composite material high-temperature-resistant structure members in the field of aerospace.
Owner:INST OF PETROCHEM HEILONGJIANG ACADEMY OF SCI

Heat-releasable pressure -sensitive adhesive tape or sheet

The present invention provides a pressure-sensitive adhesive tape or sheet exhibiting good adhesiveness to a variety of adherends and further having both characteristics of repelling resistance and easy peelability. The heat-releasable pressure-sensitive adhesive tape or sheet according to the present invention has a heat-releasable pressure-sensitive adhesive layer containing: as an essential component, an acrylic copolymer formed of a monomer mixture comprising the following monomer (ml) and monomer (m2), with a content of the monomer (m1) being from 40 to 97.5% by weight and a content of the monomer (m2) being from 0.5 to 20% by weight, relative to the whole of monomer components; and a thermal foaming agent:
(m1) an alkyl(meth)acrylate monomer having an alkyl group with a carbon number of from 1 to 12, represented by the following formula (1):
[Chem. 1]
CH2═C(R1)COOR2   (1)
(in the formula (1), R1 represents a hydrogen atom or a methyl group, and R2 represents an alkyl group with a carbon number of from 1 to 12); and
(m2) an N-hydroxyalkyl(meth)acrylamide monomer having a hydroxyalkyl group with a carbon number of from 1 to 4, represented by the following formula (2):
[Chem. 2]
CH2═C(R3)CONHR4   (2)
(in the formula (2), R3 represents a hydrogen atom or a methyl group, and R4 represents a hydroxyalkyl group with a carbon number of from 1 to 4).
Owner:NITTO DENKO CORP

Metal bonding method of three-dimensional chip structure and bonding structure

The invention relates to the field of semiconductor fabrication, in particular to a metal bonding method of a three-dimensional chip structure and a bonding structure. The method comprises that copper of a top chip is processed in a chemical machinery planarization mode, a silicon nitride layer is deposited on the surface after being processed in a chemical machinery planarization mode, the silicon nitride layer attached to the copper of the top chip is etched, a groove is formed, the bottom of the groove is the copper of the top chip, copper of a bottom chip is processed in a chemical machinery planarization mode, a bottom silica layer is etched, the copper is enabled to be protruded, activating treatment is carried out to the surface after etch of the copper of the bottom chip is achieved, the copper of the top chip and the copper of the bottom chip are aligned and bonded, and annealing treatment is carried out to the chips after being bonded. According to the metal bonding method of the three-dimensional chip structure and the bonding structure, silicon oxide and silicon nitride are used for being matched with metal and metal bonding, bonding quality is enabled to be better, a silicon nitride layer thin layer can prevent the metal from diffusing into around materials, and goals that a technology process is simplified, temperature needed by bonding is reduced, bonding reliability is improved, bonding efficiency is improved, and bonding cost is reduced can be achieved.
Owner:WUHAN XINXIN SEMICON MFG CO LTD
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