The invention discloses an
infrared transparent window with an
electromagnetic shielding function. The
infrared transparent window is prepared from a
sapphire substrate and an ITO (
indium oxide) basedsemiconductor film lamination located above the
sapphire substrate with a
metal organic
chemical vapor deposition method, wherein a deviation angle of 0-2 degrees is formed between the surface of thesapphire substrate and the c
crystal face of
sapphire, and the
sapphire substrate is subjected to double-sided
polishing, and the thickness of the
sapphire substrate is 100-10000 mu m; the ITO basedsemiconductor film lamination is prepared from an unintentionally doped ITO buffer layer and an Sn-doped ITO
electromagnetic shielding main body layer by laminating; the thickness of the unintentionally doped ITO buffer layer is 10-1000 nm, and
electron mean concentration is not higher than 1*10<19>cm<-3>; the thickness of the
electromagnetic shielding main body layer is 0.2-200 mu m, and electronmean concentration is not higher than 5*10<19>cm<-3>. Square resistance of the
infrared transparent window is lower than 100
omega / sq, the
transmittance of the infrared transparent window in a
wavelength range of 0.78-2.5 mu m is higher than 70%, the
transmittance of the infrared transparent window in a
wavelength range of 2.5-5 mu m is higher than 50%,
electron mobility is higher than 70 cm<2> / Vs, and electromagnetic shielding efficiency in a frequency range of 1-18 GHz is higher than 12 dB.