The invention relates to a
semiconductor chip with double-sided grooves and a manufacturing method thereof. Belongs to the technical field of power
semiconductor devices. The problems that an existing single-groove
chip is low in production efficiency, high in cost and limited in forward and reverse blocking
voltage boosting are mainly solved. The device is mainly characterized in that the trenches are terminal double-sided trenches and are respectively and symmetrically arranged at P-N junction terminals of the N-type substrate, the
anode P layer and the
cathode P layer, and the inner surfaces of the trenches are provided with protective
layers; and
cathode P short-circuit points and
cathode P + short-circuit points embedded in the cathode P short-circuit points are uniformly arranged in the cathode N + region, so that a low-resistance conductive
current channel is formed. According to the invention, the design of a P-type punch-through ring structure is canceled, and the low-concentration P-type
doping and high-concentration P + design is adopted, so that the short-circuit punch-through resistance can be reduced, the through-current capability and the blocking
voltage of the
chip can be improved, and the method is mainly used for manufacturing medium-
voltage and high-voltage
power semiconductor device chips.