2results about How to "Reduce deformation difference" patented technology

Embodiments of the present disclosure provide a redistribution layer structure. The redistribution layer structure includes a first metal layer, a first dielectric layer disposed on the first metal layer, a second metal layer disposed on the first dielectric layer, and a second dielectric layer disposed on the second metal layer. A coefficient of thermal expansion of the first dielectric layer is less than a coefficient of thermal expansion of the second dielectric layer.

The invention relates to the technical field of charged particle beam control, and discloses an electrostatic deflector for a focused ion beam and an assembly process thereof, the electrostatic deflector comprises an electrode assembly, a mounting flange, an insulation structure and a positioning structure; an upper electrode and a lower electrode of the electrode assembly are correspondingly arranged; part of the upper electrode is embedded into the mounting flange; the insulating structure is arranged on one side, far away from the upper electrode, of the mounting flange, and part of the lower electrode is embedded into the insulating structure; the positioning structure sleeves the lower electrode; the thermal expansion coefficient of the electrode assembly is A, the thermal expansion coefficient of the insulation structure is B, and 1 < = A / B < = 1.5. The proportional relation between the thermal expansion coefficients of the electrode assembly and the insulation structure is limited, the thermal expansion coefficients of the electrode assembly and the insulation structure are matched, the deformation quantity difference of the electrode assembly and the insulation structure under the extreme working condition is reduced, thermal stress cracking is avoided, and the assembly precision and structural integrity of the electrode assembly and the insulation structure are maintained; the electric field is distributed according to design, and distortion is avoided.