This invention relates to the field of
polishing technology, and particularly to a
polishing device for special
ceramic products, comprising a working platform, a support frame, a primary
polishing mechanism, a secondary polishing mechanism, a loading and unloading mechanism, and an intermittent pressing mechanism. The primary polishing mechanism, secondary polishing mechanism, loading and unloading mechanism, and intermittent pressing mechanism of this invention work together. Multiple annular baffles and multiple circular
discharge ports can be alternately changed, cooperating with multiple retractable or expandable
barrel-shaped cover plates II, enabling simultaneous loading and unloading at multiple points. Furthermore, the
grinding disc II can drive the multiple annular baffles to rotate, dispersing and flattening multiple special
ceramic discs. Then, the upper and lower ends of the discs are polished simultaneously by the
grinding discs I and II rotating in opposite directions. During this process, the
grinding disc II can also rotate on its own axis while following the rotation of the support rod, effectively improving polishing efficiency and uniformity.