46results about How to "Shorten interconnect length" patented technology

Various embodiments of a coherent receiver including a widely tunable local oscillator laser are described herein. In some embodiments, the coherent receiver can be integrated with waveguides, optical splitters and detectors to form a monolithic optical hetero/homodyne receiver. In some embodiments, the coherent receiver can demodulate the full phase information in two polarizations of a received optical signal over a range of optical wavelengths.

Transmission of electric and optical signal, realization of high-speed and high capacity of transmission of information signals. A base substrate section having an interconnect layer formed on an insulating substrate by a printed circuit process; a micro interconnect circuit section having a micro electrical interconnect layer which is finer than the interconnect layer of the base substrate section, formed on an insulating resin layer by a semiconductor process; and an optical interconnect circuit section adapted to transfer and/or receive an optical signal and provided with an optical wave-guide having an input section and an output section of a optical signal at opposite ends thereof; and at least a pair of optical elements composed of a light emitting device with a light emitting section thereof facing the input section and a photo detecting device with a photo detecting section thereof facing the output section are provided and the micro interconnect circuit section and the optical interconnect circuit section are mounted on the base substrate section.

A face-to-face semiconductor assembly is characterized in that first and second semiconductor devices are face-to-face mounted on two opposite sides of a first routing circuitry and is further electrically connected to an interconnect board through the first routing circuitry. The interconnect board has a heat spreader to provide thermal dissipation for the second semiconductor device, and a second routing circuitry formed on the heat spreader and electrically coupled to the first routing circuitry. The first routing circuitry provides primary fan-out routing for the first and second semiconductor devices, whereas the second routing circuitry provides further fan-out wiring structure for the first routing circuitry.

The invention belongs to the field of electromechanical servo driving, and specifically discloses a digital isolation type high-power three-phase brushless motor driving module. The signal output endof an optical coupling isolation unit and the signal output end of an overcurrent protection unit are both connected with the signal input end of a logic unit; the signal output end of the logic unitand the signal output end of the overcurrent protection unit are both connected with the signal input end of an H bridge driving control unit; the signal output end of the H bridge driving control unit is connected with the signal input end of a field effect transistor output unit; the signal output end of the field effect transistor output unit is connected with the signal input end of the overcurrent protection unit and external motor windings U, V and W separately; the optical coupling isolation unit, the logic unit and the H bridge driving control unit are all connected with a working power supply V<cc>; and the overcurrent protection unit and the field effect transistor output unit are both connected with a power power-supply V<s>. The driving module disclosed in the invention is highin reliability, integration, working current and power density, and short in production period.

The invention relates to a silicon-based cavity shielding filter, which is fabricated by a MEMS process. The silicon-based cavity shielding filter comprises a first substrate, a second substrate, an intermediate layer and a metal suspension circuit; the first substrate and the second substrate adopt a high resistance silicon substrate; the first substrate, the intermediate layer and the second substrate are sequentially stacked and combined into a silicon cavity structure; a microwave ground electrode is arranged on the intermediate layer; a metal shielding layer connected with the microwave grounding electrode is arranged on the outer surface of the silicon cavity structure; a first air cavity is formed between the first substrate and the intermediate layer, and/or a second air cavity isformed between the second substrate and the intermediate layer; the metal suspension circuit is disposed on a surface of the intermediate layer and suspended in the first air chamber or/and the secondair chamber. The silicon-based cavity shielding filter of the invention is fabricated by the silicon-based MEMS process, so that the final filter has the advantages of small size, high quality factors, excellent performance, good integration, batchization, etc., and can achieve higher integration and an integrated system with a smaller size.

According to one embodiment of the present invention, a microwave or millimeter wave module includes a dielectric layer having a pocket formed substantially through the dielectric layer. The dielectric is attached to a metal substrate. The pocket has substantially vertical sidewalls. An integrated circuit is disposed in the pocket. Opposing sides of the integrated circuit are substantially parallel to the sidewalls of the pocket. An interconnect electrically couples the integrated circuit to a bond pad disposed on the outer surface of the dielectric layer. The interconnect has a length that is minimized to result in reduced inductance of the semiconductor device.

A manufacturing method of a thermopile sensor comprises the steps of: providing a thermopile structure plate and a substrate, and forming a thermopile structure on the thermopile structure plate; forming a first interconnection layer on the thermopile structure plate, wherein at least a first conductive interconnection structure electrically connected with the thermopile structure is formed in thefirst interconnection layer; forming a support structure on the substrate, forming a sacrificial structure in the support structure, and exposing the sacrificial structure from the top surface of thesupport structure; bonding the thermopile structure plate on the support structure, so that the first interconnection layer is positioned below the thermopile structure, and after bonding, the thermopile structure is arranged above the sacrificial structure; and after bonding, removing the sacrificial structure to form a first cavity. According to the invention, the process flow is simplified, the process cost is reduced, and the measurement precision of the thermopile sensor is improved.

The invention belongs to the technical field of chip packaging, and particularly relates to a multi-chip three-dimensional packaging structure and packaging method.The packaging method comprises the following steps that a carrier plate is provided, a preset circuit is manufactured on one side face in the thickness direction of the carrier plate, and the preset circuit is electrically led out towards the edge of the carrier plate; a plurality of elements are provided, the elements are one or more of chips, wafers, cooling fins or functional areas, and ports of the chips, the wafers and the functional areas are arranged on respective edges of the chips, the wafers and the functional areas; the method comprises the following steps: spatially overturning a plurality of elements in a vacuum environment to form a cubic structure, and hermetically connecting the edges of the cubic structure through an adhesive; connecting the port of the preset circuit of the carrier plate with the ports of the plurality of elements through a flexible conductive wire rod in a bonding manner; and wrapping the outer surface of the cubic structure with a plastic package material to form a plastic package layer. According to the invention, the interconnection among a plurality of chips is realized through the flexible conductive wire rod, the length of the interconnection wire can be obviously shortened, the influence on signal transmission is reduced, and the performance of the chip is improved.

An interposer includes a polycrystalline ceramic core disposed between a first surface and a second surface of the interposer, an adhesion layer encapsulating the polycrystalline ceramic core, a barrier layer encapsulating the adhesion layer, and one or more electrically conductive vias extending from the first surface to the second surface through the polycrystalline ceramic core, the adhesion layer, and the barrier layer.

A particular three-dimensional integrated circuit stack includes a first die including a first bonding interface and a first plurality of interconnect layers arranged according to a first Manhattan wiring scheme. The three-dimensional integrated circuit stack also includes a second die including a second bonding interface and a second plurality of interconnect layers arranged according to a second Manhattan wiring scheme. The first die and the second die stacked with the first bonding interface coupled to the second bonding interface such that the first Manhattan wiring scheme and the second Manhattan wiring scheme are non-Manhattan with respect to each other.

The embodiment of the invention provides a manufacturing method of a thermopile sensor, which comprises the following steps: providing a thermopile structure plate and a circuit substrate, wherein thethermopile structure plate comprises a thermal radiation induction area, a thermopile structure is formed in the thermal radiation induction area, and the circuit substrate comprises a thermal radiation isolation area; forming a supporting structure on the circuit substrate, forming a thermal radiation isolation plate and a sacrificial structure which are longitudinally stacked from bottom to topin the supporting structure, wherein the thermal radiation isolation plate and the sacrificial structure at least cover the thermal radiation isolation area; bonding the thermopile structure plate onthe surface of one side of the circuit substrate, which is provided with the support structure, so that the thermal radiation induction region vertically corresponds to the thermal radiation isolation area; and removing the sacrificial structure, and forming a first cavity between the thermopile structure plate and the circuit substrate. The manufacturing method of the thermopile sensor can improve the measurement precision of the thermopile sensor.

The invention provides a semiconductor packaging structure and a preparation method. The semiconductor package structure includes: a second redistribution structure; the voltage supply chip is inversely arranged on the second rewiring structure, and the first functional chip is positively arranged on one side, deviating from the second rewiring structure, of the voltage supply chip; the first plastic packaging layer is positioned on one side of the second rewiring structure and covers the first functional chip and the voltage supply chip; the first conductive connecting piece is positioned at the side parts of the first functional chip and the voltage supply chip; the first rewiring structure is located on the side, away from the second rewiring structure, of the first plastic packaging layer, the first rewiring structure is electrically connected with the front face of the first functional chip, and the first conductive connecting piece is electrically connected with the first rewiring structure and the second rewiring structure; and the second functional chip is inversely arranged on one side, deviating from the second rewiring structure, of the first rewiring structure and is electrically connected with the first rewiring structure. The semiconductor packaging structure is high in integration density and large in transmission bandwidth.

The invention discloses a ridge-shaped substrate integrated waveguide band-pass filter based on a TSV. The filter comprises a high-resistance silicon substrate, two rectangular metal grooves A are formed in the high-resistance silicon substrate; a plurality of pairs of diaphragms are arranged on the two sides in the metal groove A; the side walls of the diaphragm and the metal groove A are formedby arranging silicon through holes; the top surface insulating layer is arranged at the top of the high-resistance silicon substrate, the rectangular metal groove B is embedded into the top surface insulating layer, the ridge surface metal layer is arranged in the middle of the bottom of the top surface insulating layer, the adjacent side walls of the two rectangular metal grooves A are connectedthrough the ridge surface metal layer, and the other two side walls of the two rectangular metal grooves A are connected through the rectangular metal groove B. The manufacturing process of the ridge-shaped substrate integrated waveguide band-pass filter based on the TSV is compatible with the CMOS process, and the manufacturing cost is low; the size is small, the filter can be conveniently integrated in a miniaturized chip, stacked chip interconnection is realized, the length of an interconnection line is shortened, and the chip performance is greatly improved; and the filter is large in bandwidth and can be applied to the microwave/radio frequency field.

The present application discloses a semiconductor device and a method for fabricating the semiconductor device. The semiconductor device includes an active interposer including a programmable unit, a first memory die positioned above the active interposer and including a storage unit, and a first logic die positioned below the active interposer. The active interposer, the first memory die, and the first logic die are electrically coupled.

Natural gas liquefaction unit including at least one cryogenic cold box having at least one heat exchanger; a fixed assembly zone on its outer wall; at least one closed loop nitrogen refrigeration cycle; at least one device for equipment required for implementing the liquefaction of a natural gas stream from a hydrocarbon supply stream; at least one interconnection module comprising a pipe holder means and a set of pipes and valves, designed to connect said at least one cold box to at least one equipment device for the cycle for refrigerating and/or separating C6+ type hydrocarbon elements contained in the natural gas, wherein the interconnection module rests on a frame allowing it to be handled and is connected to the cold box and to the other method or equipment sub-assemblies located around said fixed assembly zone.

The invention discloses a nano-capacitor three-dimensional integrated structure and a manufacturing method thereof. The nano-capacitor three-dimensional integrated structure comprises a first nano-capacitor structure and a second nano-capacitor structure which are formed on the front surface and the back surface of an aluminum foil, the first top metal electrode layer of the first nano capacitor structure is electrically communicated with the second top metal electrode layer of the second nano capacitor structure through the first groove structure, the second groove structure, the aluminum through hole structure, the fourth groove structure and the fifth groove structure; and the first bottom metal electrode layer of the first nano capacitor structure is electrically communicated with thesecond bottom metal electrode layer of the second nano capacitor structure through the third groove structure, the aluminum foil and the sixth groove structure. According to the invention, the capacitance density can be obviously increased, the length of the interconnection line can be shortened, the interconnection resistance and energy loss can be reduced, the process steps can be reduced, the process complexity can be reduced, and the production cost can be effectively reduced.