3 results about "Oxygen diffusion coefficient" patented technology

A semiconductor device includes: an oxide semiconductor layer extending in a first direction; a gate electrode overlapping the oxide semiconductor layer in a second direction intersecting the first direction; a gate insulating film provided between the gate electrode and the oxide semiconductor layer; a first conductive layer provided on the oxide semiconductor layer in the first direction and containing a conductive oxide; a second conductive layer provided on the first conductive layer in the first direction and containing a metal element; a first protective film in contact with a side surface of the second conductive layer; and a second protective film in contact with at least a part of a side surface or an upper surface of the first conductive layer. The first protective film and the second protective film each contain a material having an oxygen diffusion coefficient smaller than that of the second conductive layer.

This application relates to the field of cable technology, and particularly to a method for correcting heat release test data of halogen-free, low-smoke, flame-retardant cables. The method includes: acquiring original heat release data and the diameter parameters of the binding wires of the halogen-free, low-smoke, flame-retardant cable; obtaining the binding strength index based on the diameter parameters of the binding wires; subsequently obtaining the equivalent porosity of the halogen-free, low-smoke, flame-retardant cable based on the binding strength index; obtaining the oxygen diffusion coefficient based on the equivalent porosity; substituting the oxygen diffusion coefficient into a combustion rate model to obtain a combustion correction factor; and finally adjusting the peak heat release rate, peak time, and total heat release amount according to the combustion correction factor to obtain accurate final corrected data. This method provides a unified physical benchmark for test data under different binding conditions, improving the scientific rigor and comparability of the data.

A CFD-based optimization method for a fermenter for amino acid fermentation according to an embodiment of the present invention includes: a first step of setting an objective variable, a constraint variable, and a design variable with respect to an optimization objective of at least one impeller fermenter; a second step of generating a three-dimensional shape for a flow region of the impeller fermenter for each condition of the constraint variable and the design variable according to the objective variable; a third step of calculating a primary value, which is at least one of oxygen diffusion coefficient, liquid density, liquid viscosity, gas hold-up, bubble diameter, energy dissipation rate, and torque, by computational fluid dynamics analysis for the flow region based on information about the three-dimensional shape; a fourth step of calculating secondary values, which are an oxygen transfer coefficient and a power consumption ratio (power ratio), using the primary value; and a fifth step of repeating the second, third, and fourth steps while varying the design variable of the first step in various ways, and finding an optimal point based on a comparison value obtained by comparing the secondary values before and after the variation.