4results about How to "Prevent narrowing" patented technology

The utility model discloses a multi -way valve with high accuracy flow control structure relates to valve technical field, including valve body, the valve body includes the casing, one end of casing is fixedly connected with sealed positioning section, and the water inlet telescopic section is inserted to one end of sealed positioning section, and the inboard wall of sealed positioning section is equipped with the joint interface, and the taper filter is clamped, the cavity of casing is fixedly connected with valve seat through the mouth opening, the valve core is clamped in valve seat, and the top of casing is fixedly connected with main motor. The utility model provides valve body, on the basis of realizing the filtration and avoiding the influence precision, and at the same time, under the condition of not with the pipeline dismounting, the filtration assembly is convenient to take out and clean, so that the existing multi -way valve is led to the key component easy wear and tear, block and affect control precision because of lacking filtration assembly, and filtration assembly dismounting and cleaning need to dismount the valve as a whole, and the problem of complicated and laborious operation.

This invention discloses a sterically hindered hydrophilic nano-silica, its preparation method, and its applications, belonging to the field of shale oil and gas storage modification and production enhancement technology. The sterically hindered hydrophilic nano-silica is modified with ethylene oxide and aniline. The nano-silica has a particle size of 2-5 nm, the mass percentage of ethylene oxide to nano-silica is 1.5-3:1, and the mass percentage of aniline to nano-silica is 0.8-3:1. The prepared hydrophilic nano-silica can be used in the preparation of reagents to reduce fracturing fluid damage. This hydrophilic nano-silica competes with polymers for adsorption, reducing polymer adsorption blockage and thus reducing fracture damage.

The application discloses a temperature control method and device of a semiconductor device, equipment and a storage medium, and relates to the technical field of temperature control, and comprises the following steps: based on the slit cavity observation band brightness of the edge infrared observation annular area of a rapid thermal processing furnace and the surface emissivity of a wafer, the equivalent radiation temperature of the slit cavity observation band brightness is calculated; the equivalent temperature of the inner edge of a quartz bell jar is solved; based on the equivalent radiation temperature and the equivalent temperature of the inner edge of the quartz bell jar, the net radiation incident heat power transmitted from the annular slit radiation cavity of the rapid thermal processing furnace to the wafer edge band of the wafer is calculated; and based on the net radiation incident heat power, the target lamp area power replacement vector of the rapid thermal processing furnace is solved. The application can improve the initiative and accuracy of wafer edge temperature control.

This embodiment relates to a refrigerator with a light source in the storage compartment, providing a technical solution that provides a light source while avoiding a reduction in the volume of the storage compartment and a narrowing of the airflow path. The refrigerator of this embodiment includes: an airflow forming member disposed in the storage compartment to form an airflow path for cold air; a light source disposed in a region opposite to the airflow path on the storage compartment side surface of the airflow forming member; and a covering member installed in the region opposite to the airflow path on the storage compartment side surface of the airflow forming member, covering the light source from the storage compartment side.