The invention provides a
radiation hardening
triode device and a manufacturing method thereof. Belongs to the technical field of semiconductors. The
radiation hardening
triode device comprises a substrate, a
buried oxide layer, a first N-type doped region, a second N-type doped region, a third N-type doped region, a first P-type doped region, a second P-type doped region, a first isolation shallow groove, a second isolation shallow groove, a third isolation shallow groove, a fourth isolation shallow groove, a linear
oxide layer,
polycrystalline silicon, a fourth N-type doped region, a fifth N-type doped region and a third P-type doped region. According to the invention, the polysilicon is filled in the isolation shallow groove, the thickness of the isolation
oxide layer is reduced, and the
total dose radiation resistance of the
triode device is improved. Under the condition that a
mask plate is not added, a second P-type doped region is formed on the side wall and the bottom of the base region isolation shallow groove in an injection mode, increase of
recombination current on the surface of the base region is prevented, degradation of a
common emitter current amplification coefficient of the device is restrained, the
total dose radiation resistance of the triode device is effectively improved, and the
process manufacturing cost is reduced.