The invention discloses an 
MOSFET chip manufacturing process for improving grid characteristics, which comprises the following steps: removing an isolation 
oxide layer in a groove region, obtaining first lightly-doped 
polycrystalline silicon and second lightly-doped 
polycrystalline silicon on the 
peripheral side of a groove, heavily 
doping the lightly-doped 
polycrystalline silicon in the groove, obtaining first heavily-doped polycrystalline 
silicon, and removing the residual isolation 
oxide layer in a body forming region and a source region, close to the groove, of the epitaxial layer; carrying out heavy 
doping on part of the region of the first lightly-doped polycrystalline 
silicon, and obtaining second heavy-doped polycrystalline 
silicon; forming a 
dielectric layer upwards, wherein the type of the second heavy-doped polycrystalline silicon is opposite to that of the first lightly-doped polycrystalline silicon; and forming a 
diode by the first lightly doped polycrystalline silicon and the second heavily doped polycrystalline silicon, forming a 
resistor by two ends of the second lightly doped polycrystalline silicon, and connecting the 
diode with the 
resistor in parallel to be connected to the grid 
electrode in series. The polycrystalline silicon 
resistor and the polycrystalline silicon 
diode are integrated in the 
chip, so that the current flowing through the grid 
electrode is effectively limited, and the protection on the grid 
electrode is realized.